Exposure device
    101.
    依法登记的发明
    Exposure device 失效
    曝光装置

    公开(公告)号:USH711H

    公开(公告)日:1989-11-07

    申请号:US209417

    申请日:1988-06-20

    IPC分类号: G03B42/04

    CPC分类号: G03B42/047

    摘要: An exposure device for printing an image on a photographic material having a tabular-shaped light emitting means as a light source is disclosed. The exposure device has neither exposure unevenness nor can the light source be suddenly cut off in use and is suitable for printing an identification mark on medical films.

    Plate-like article holding device
    102.
    发明授权
    Plate-like article holding device 失效
    板状物品保持装置

    公开(公告)号:US4869481A

    公开(公告)日:1989-09-26

    申请号:US217974

    申请日:1988-07-12

    摘要: A plate-like article holding device particularly suitably usable in an exposure apparatus for printing a pattern of a reticle or mask on a semiconductor wafer, as a wafer holding device for holding the wafer at a pattern printing station, is disclosed. In an embodiment, the holding device includes a wafer chuck having a wafer attracting surface and a plurality of throughbores formed in relation to the attracting surface. Also, the device includes a plurality of support pillars provided in relation to the throughbores, respectively, and having end faces effective to support a wafer by attraction. There is provided a driving mechanism for moving the wafer chuck in a direction substantially perpendicular to the wafer attracting surface of the chuck so as to allow that the supporting end faces of the support pillars project outwardly beyond the wafer attracting surface of the wafer chuck or, alternatively, they are accommodated within the wafer chuck. A wafer having been conveyed to the device is first attracted to and supported by the supporting pillars as they are projected from the wafer attracting surface of the chuck. Thereafter, the wafer chuck is moved by the driving mechanism so that the wafer attracting surface thereof contacts the wafer.

    摘要翻译: 公开了一种特别适合用于在半导体晶片上印刷掩模版或掩模的图案的曝光装置中的板状物品保持装置,作为用于将晶片保持在图案印刷站的晶片保持装置。 在一个实施例中,保持装置包括具有晶片吸引表面的晶片卡盘和相对于吸引表面形成的多个通孔。 而且,该装置分别包括相对于贯通孔设置的多个支撑柱,并且具有有效地通过吸引来支撑晶片的端面。 提供了一种驱动机构,用于沿着基本上垂直于卡盘的晶片吸引表面的方向移动晶片卡盘,以允许支撑柱的支撑端面向外突出超过晶片卡盘的晶片吸引表面, 或者,它们被容纳在晶片卡盘内。 已经被输送到装置的晶片在它们从卡盘的晶片吸引表面突出时首先被支撑柱吸引并被支撑。 此后,晶片卡盘通过驱动机构移动,使得其晶片吸引表面接触晶片。

    Processing head for electrophotographic apparatus
    104.
    发明授权
    Processing head for electrophotographic apparatus 失效
    电子照相设备的加工头

    公开(公告)号:US4797644A

    公开(公告)日:1989-01-10

    申请号:US105785

    申请日:1987-10-08

    申请人: Kazuo Takahashi

    发明人: Kazuo Takahashi

    IPC分类号: G03G15/11 G03G15/10 G03G15/22

    CPC分类号: G03G15/10 G03G15/101

    摘要: A process head for use in an electrophotographic apparatus and adapted for conducting developing process with a developer on an electrophotographic film in a developing section of the electrophotographic apparatus. The developing section is surrounded by a seal section. An air pump is provided for supplying the seal section with a seal gas selectively at a low pressure higher than the pressure in the developing section and, hence, capable of preventing developer from leaking out of the developing section and a high pressure higher than the low pressure and high enough to drive the seal gas into the developing section. In consequence, leaking of developer out of the developing section is avoided and the seal gas under the high pressure comes into the developing section so as to ensure the complete removal of unnecessary portion of the developing agent.

    摘要翻译: 一种用于电子照相设备中的处理头,其适于在电子照相设备的显影部分中的电子照相胶片上用显影剂进行显影处理。 显影部分由密封部分包围。 提供了一种空气泵,用于向密封部分提供选择性地在比显影部分的压力高的低压下的密封气体,并且因此能够防止显影剂从显影部分泄漏出来并且高于低于 压力足够高以将密封气体驱动到显影部分中。 因此,避免了显影剂从显影部分泄漏出来,高压下的密封气体进入显影部分,以确保完全除去不需要的显影剂部分。

    Forceps for semiconductor silicon wafer
    105.
    发明授权
    Forceps for semiconductor silicon wafer 失效
    半导体硅晶片钳

    公开(公告)号:US4767142A

    公开(公告)日:1988-08-30

    申请号:US30061

    申请日:1987-03-25

    摘要: A vacuum-forceps is disclosed. A valve chamber is provided between a first suction passage communicating with an adsorptive member and a second suction passage connected through a suction tube to a vacuum source. A valve member linked to an operating push button is accomodated in the valve chamber. The adsorptive member is rotatable and swayable relative to a forceps body with the aid of a spherical member. A suction tube is connected through a double-coupling to the forceps body. A bypass is provided between the valve chamber and the first suction passage. A semiconductor silicon wafer is adsorbed on an adsorptive plate provided at the tip end of the adsorptive member by actuating the push button and is then moved to a desired position.

    摘要翻译: 公开了一种真空镊子。 阀室设置在与吸附构件连通的第一吸入通道和通过抽吸管连接到真空源的第二吸入通道之间。 连接到操作按钮的阀构件容纳在阀室中。 借助于球形构件,吸附构件相对于镊子体可旋转和摇摆。 吸管通过双联接器连接到镊子体。 在阀室和第一吸入通道之间设置旁路。 通过驱动按钮将半导体硅晶片吸附在设置在吸附构件的顶端的吸附板上,然后移动到期望的位置。

    Pattern exposure apparatus with distance measuring system
    106.
    发明授权
    Pattern exposure apparatus with distance measuring system 失效
    带距离测量系统的图案曝光装置

    公开(公告)号:US4659225A

    公开(公告)日:1987-04-21

    申请号:US722136

    申请日:1985-04-11

    申请人: Kazuo Takahashi

    发明人: Kazuo Takahashi

    摘要: An exposure apparatus wherein a semiconductor wafer is exposed to an IC circuit pattern formed on a mask through a reduction projection optical system, and then the wafer is stepped; and these operations are alternately repeated, thereby forming a plurality of patterns on the wafer. A distance measuring system utilizing the interference between laser beams, has a first mirror fixed relative to the mask and another mirror fixed relative to the wafer, so that the relative position between the mask and the wafer is determined by a single interferometer system.

    摘要翻译: 一种曝光装置,其中半导体晶片通过还原投影光学系统暴露于形成在掩模上的IC电路图案,然后晶片是阶梯状的; 并且这些操作被交替地重复,从而在晶片上形成多个图案。 使用激光束之间的干涉的距离测量系统具有相对于掩模固定的第一反射镜和相对于晶片固定的另一反射镜,使得掩模和晶片之间的相对位置由单个干涉仪系统确定。

    Guide mechanism
    107.
    发明授权
    Guide mechanism 失效
    指导机制

    公开(公告)号:US4648725A

    公开(公告)日:1987-03-10

    申请号:US771300

    申请日:1985-08-30

    申请人: Kazuo Takahashi

    发明人: Kazuo Takahashi

    摘要: A device for guiding movement of a stage, carrying thereon a semiconductor wafer, for printing in a reduced scale an integrated circuit pattern of a mask onto different portions of the semiconductor wafer through a reduction production lens, includes linear roller bearings for supporting the stage for movement in a predetermined direction, a slider and a roller for pressing a portion of the stage against the slider to thereby constrain the displacement of the stage in a direction perpendicular to the predetermined direction of movement, whereby higher accuracies of the stop position of the stage as well as higher speed of the stage movement are assured.

    摘要翻译: 引导用于引导半导体晶片的台架的移动的装置,用于通过缩小生产透镜以小范围的方式将掩模的集成电路图案印刷到半导体晶片的不同部分上,包括用于支撑台阶的直线滚柱轴承 在预定方向上的运动,滑块和用于将台架的一部分压向滑块的辊,从而限制舞台在与预定的运动方向垂直的方向上的位移,从而使舞台的停止位置的更高精度 以及舞台运动的更高速度得到保证。

    Silver halide photographic material and method of forming high contrast
silver images
    108.
    发明授权
    Silver halide photographic material and method of forming high contrast silver images 失效
    卤化银照相材料和形成高对比度银色图像的方法

    公开(公告)号:US4329417A

    公开(公告)日:1982-05-11

    申请号:US158226

    申请日:1980-06-10

    CPC分类号: G03C1/10 Y10S430/15

    摘要: A novel method of forming high contrast silver images is provided. The method comprises steps of (1) imagewisely exposing a light-sensitive silver halide photographic material, and (2) treating the exposed material with a developer having superadditivity. The method is characterized by the co-existence of an oxidizing agent, and a water-insoluble ion pair formed by a water-soluble cationic compound such as quaternary ammonium or tertiary sulfonium salt and a water-soluble anionic compound such as organic sulfate. The method realizes high contrast photographic images by using a developer having a good preservability, without contamination of the developer, within a short period of time for the development. There is also provided a light-sensitive silver halide photographic material herein.

    摘要翻译: 提供了形成高对比度银图像的新颖方法。 该方法包括以下步骤:(1)成像曝光感光卤化银照相材料,和(2)用具有超附加性的显影剂处理曝光的材料。 该方法的特征在于氧化剂的共存和由季铵或叔锍盐等水溶性阳离子化合物和有机硫酸盐等水溶性阴离子化合物形成的水不溶性离子对。 该方法通过在显影剂的短时间内使用具有良好保存性的显影剂而不污染显影剂来实现高对比度照相图像。 本文还提供了感光卤化银照相材料。

    Process for forming high-contrast silver images
    109.
    发明授权
    Process for forming high-contrast silver images 失效
    形成高对比度银色图像的过程

    公开(公告)号:US4169733A

    公开(公告)日:1979-10-02

    申请号:US871348

    申请日:1978-01-23

    摘要: Process for forming high-contrast silver images which comprises treating a light-sensitive silver halide photographic material provided with a hydrophilic colloidal layer containing a silver halide emulsion layer coated on a support and containing a tetrazolium compound, after imagewise exposure, with a developer and/or a processing solution prior to the developing, both of which contains at least a nitrogen-containing heterocyclic compound substituted with at least mercapto, thioketone or thioether group.

    摘要翻译: 用于形成高对比度银图像的方法,其包括在成像曝光后,用显影剂和/或成像曝光处理含有涂覆在载体上并含有四唑鎓化合物的含有卤化银乳剂层的亲水胶体层的感光卤化银照相材料和/ 或显影前的处理溶液,两者都至少包含被至少巯基,硫酮或硫醚基取代的含氮杂环化合物。