公开(公告)号：US20080003441A1

公开(公告)日：2008-01-03

申请号：US11878976

申请日：2007-07-30

申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Nobukazu Ikeda ,  Eiji Ideta ,  Akihiro Morimoto ,  Tetsutaro Ogushi ,  Takehisa Konishi

发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Nobukazu Ikeda ,  Eiji Ideta ,  Akihiro Morimoto ,  Tetsutaro Ogushi ,  Takehisa Konishi

IPC分类号： B32B15/04

CPC分类号： C23C8/02 ,  C23C26/00 ,  Y10T428/24322 ,  Y10T428/24355 ,  Y10T428/31678

摘要： The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.5 μm

摘要翻译： 本发明的目的是在不含任何金属材料的其它金属的氧化物膜的情况下，形成耐腐蚀性优异的氧化铬膜。 能够廉价且短时间地形成不含有其他金属的氧化物膜的耐腐蚀性优异的氧化铬钝化膜，能够提供安全的腐蚀性难以供给流体的流体供给系统。 本发明包括以下步骤：在涂覆表面的表面粗糙度（Ra）不大于1.5μm的金属材料上涂覆铬之后，在氧化气氛中进行热处理，形成由氧化铬组成的钝化膜

公开(公告)号：US07103990B2

公开(公告)日：2006-09-12

申请号：US10498800

申请日：2003-09-11

申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

IPC分类号： F26B5/08

CPC分类号： H01L21/67034 ,  H01L21/02052

摘要： It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.

摘要翻译： 本发明的目的是提供一种旋转型硅晶片清洁装置，以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。 根据本发明，旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构，用于在后期化学清洗时用纯水清洗硅晶片，在外表面上进行干燥和氢终止处理 通过安装硅晶片干燥装置来执行硅晶片，所述硅晶片干燥装置包括附接到壳体的气体供应板，以供应氢气和含有大于0.05％的氢气的惰性气体的混合气体，混合气体供应 一端连接上述气体供给面板的气体混合器的管道，将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置， 在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基，从而喷出混合气体 在完成清洁之后，将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。

公开(公告)号：US20060071192A1

公开(公告)日：2006-04-06

申请号：US10545672

申请日：2004-02-09

申请人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Masafumi Kitano ,  Akhiro Morimoto

发明人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Masafumi Kitano ,  Akhiro Morimoto

IPC分类号： F16K1/00

CPC分类号： F16K7/14 ,  F16K27/003 ,  F16K51/02

摘要： The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas. Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.

公开(公告)号：US06273477B1

公开(公告)日：2001-08-14

申请号：US09253942

申请日：1999-02-22

申请人： Tadahiro Ohmi ,  Michio Yamaji ,  Tsutomu Shinohara ,  Nobukazu Ikeda ,  Akihiro Morimoto

发明人： Tadahiro Ohmi ,  Michio Yamaji ,  Tsutomu Shinohara ,  Nobukazu Ikeda ,  Akihiro Morimoto

IPC分类号： F16L2500

CPC分类号： C22C38/44 ,  F16L19/0212 ,  Y10S285/917

摘要： A pipe joint comprises a pair of tubular joint members, an annular gasket interposed between opposed end faces of the two joint members, and threaded means for joining the two joint members. Each of the joint members is prepared from a stainless steel having a surface with a Vickers hardness of at least 300. The gasket is prepared from a stainless steel comprising, in ratio by weight, 12.90 to 15.00% of Ni, 16.50 to 18.00% of Cr, 2.00 to 3.00% of Mo, up to 0.02% of C, up 0.30% of Si, up to 0.40% of Mn, up to 0.03% of P, up to 0.003% of S, up to 0.25% of Cu and up to 0.01% of Al, the gasket having a surface with a Vickers hardness of 90 to 160.

摘要翻译： 管接头包括一对管状接头构件，插入在两个接头构件的相对端面之间的环形垫圈，以及用于接合两个接头构件的螺纹装置。 每个接合构件由具有维氏硬度至少为300的表面的不锈钢制成。垫圈由不锈钢制成，其包含按重量计12.10％至15.00％的Ni，16.50至18.00％的 Cr，2.00〜3.00％的Mo，高达0.02％的C，0.30％的Si，至多0.40％的Mn，至多0.03％的P，至多0.003％的S，至多0.25的Cu和 高达0.01％的Al，垫圈具有维氏硬度为90至160的表面。

公开(公告)号：US6135155A

公开(公告)日：2000-10-24

申请号：US655022

申请日：1996-05-29

申请人： Tadahiro Ohmi ,  Michio Yamaji ,  Hiroshi Morokoshi ,  Shigeru Itoi ,  Nobukazu Ikeda ,  Tetsuya Kojima

发明人： Tadahiro Ohmi ,  Michio Yamaji ,  Hiroshi Morokoshi ,  Shigeru Itoi ,  Nobukazu Ikeda ,  Tetsuya Kojima

IPC分类号： F16K27/00 ,  G05D7/01 ,  G05D16/04 ,  F16K11/10

CPC分类号： F16K27/003 ,  G05D16/04 ,  G05D7/01 ,  Y10T137/87885

摘要： A regulator for regulating a flow rate is provided with an upper connector having a downwardly opened channel in communication with the regulator. An on-off valve connected to the regulator is provided with a lower connector having an upwardly opened channel in communication with the on-off valve. The upper connector is lapped over the lower connector and removably joined thereto with a screw so as to cause the downwardly opened channel to communicate with the upwardly opened channel. Accordingly, the regulator can be removed singly, for example, when malfunctioning.

摘要翻译： 用于调节流速的调节器设置有具有与调节器连通的向下打开的通道的上连接器。 连接到调节器的开关阀设置有具有与开关阀连通的向上开口的通道的下连接器。 上连接器在下连接器上被覆盖并且用螺钉可拆卸地连接到其上，以便使向下打开的通道与向上打开的通道连通。 因此，可以单独地去除调节器，例如当故障时。

公开(公告)号：US5904381A

公开(公告)日：1999-05-18

申请号：US949431

申请日：1997-10-14

申请人： Tadahiro Ohmi ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Keiji Hirao

发明人： Tadahiro Ohmi ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Keiji Hirao

IPC分类号： F16L23/032 ,  F16L23/16 ,  F16L23/18 ,  F16L25/00

CPC分类号： F16L23/032 ,  F16L23/16 ,  F16L23/18 ,  Y10S285/917

摘要： Each of two coupling members is formed in an abutting end lace thereof with a recessed portion for accommodating a gasket and a retainer therein, and the recessed portion has a retainer holding hollow cylindrical portion formed centrally on a bottom surface thereof and provided on an end face thereof with an annular projection for clamping the gasket. The gasket comprises a small portion and a large portion having a greater outside diameter than the small portion. The retainer is attached to the cylindrical portion of the coupling member with which the gasket small portion is in contact.

摘要翻译： 两个联接构件中的每一个形成为具有邻接端部花边的凹部，用于在其中容纳垫圈和保持器，凹部具有保持器保持件，中空圆柱形部分在其底表面上形成在中心并设置在端面上 具有用于夹持垫圈的环形突起。 垫圈包括小部分和大部分具有比小部分更大的外径。 保持器附接到与垫圈小部分接触的联接构件的圆柱形部分。

公开(公告)号：US5530283A

公开(公告)日：1996-06-25

申请号：US518529

申请日：1995-08-23

申请人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Tsutomu Shinohara ,  Akihiro Morimoto ,  Yasuyuki Shirai

发明人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Tsutomu Shinohara ,  Akihiro Morimoto ,  Yasuyuki Shirai

IPC分类号： H01L23/50 ,  H01L23/495

CPC分类号： H01L23/49582 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L24/45 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01019 ,  H01L2924/01028 ,  H01L2924/01322

摘要： An object of the present invention is to provide a lead frame and a material for lead frame which insure excellent bonding and enables substantial reduction of time for production because such processes as plating are not required and furthermore are excellent in abration resistance.The present invention is characterized in that a silver layer having a construction where amplitude of a refracted ray refracted on the (200) surface is 1/3 or more of the amplitude of refracted X ray refracted on the (111) surface comprises an outer lead section of the base material for the lead frame. The base material is preferably copper, copper-alloy, iron, or iron alloy. The silver layer is formed, for instance, by means of silver plating, and the thickness is preferably in a range from 8 m to 30 m. An intermediate layer may be provided between a surface of the base material and the silver layer.

摘要翻译： 本发明的目的是提供一种引线框架和引线框架材料，其确保良好的接合，并且能够显着缩短生产时间，因为不需要电镀等工艺，并且耐磨性也优异。 本发明的特征在于，具有在（200）表面折射的折射线的振幅为（111）面折射的折射X射线的振幅的1/3以上的结构的银层包括外引线 用于引线框架的基材的截面。 基材优选为铜，铜合金，铁或铁合金。 银层例如通过镀银形成，并且厚度优选在8μm至30μm的范围内。 可以在基材的表面和银层之间设置中间层。

公开(公告)号：US5482332A

公开(公告)日：1996-01-09

申请号：US329963

申请日：1994-10-27

申请人： Tadahiro Ohmi ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Kenji Yamamoto

发明人： Tadahiro Ohmi ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Kenji Yamamoto

IPC分类号： F16L19/02 ,  F16L19/03 ,  F16L27/08 ,  F16L25/00

CPC分类号： F16L27/0824 ,  F16L19/0212 ,  Y10S285/917

摘要： A pair of tubular joint members each have a gasket holding annular protuberance on an abutting end face thereof. The protuberance has an inner peripheral surface continuous with the inner peripheral surface of the joint member, and a sealing face adapted to intimately contact an end face of of a gasket at a position radially outward from the inner peripheral surface thereof. The sealing face is most protuberant at a position radially outward from an inner edge thereof. When the most protuberant end of the sealing face comes into contact with the gasket end face, a clearance is formed between the portion of the sealing face radially inward from the protuberant end and the radially inward portion of the gasket end face. The clearance is eliminated by the deformation of the gasket when the pipe joint is tightened up.

摘要翻译： 一对管状接头构件各自具有在其邻接端面上保持环形突起的垫圈。 突起具有与接合构件的内周面连续的内周面，以及密封面，其适于在其内周面的径向外侧的位置处与垫圈的端面紧密接触。 密封面在其内缘的径向外侧的位置处是最隆起的。 当密封面的最突起的端部与垫圈端面接触时，在密封面的从突出端部的径向向内部分和垫圈端面的径向向内部分之间形成间隙。 当管接头拧紧时，通过垫圈的变形消除间隙。

公开(公告)号：US08137787B1

公开(公告)日：2012-03-20

申请号：US09889269

申请日：2000-01-13

申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Nobukazu Ikeda ,  Eiji Ideta ,  Akihiro Morimoto ,  Tetsutaro Ogushi ,  Takehisa Konishi

发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Nobukazu Ikeda ,  Eiji Ideta ,  Akihiro Morimoto ,  Tetsutaro Ogushi ,  Takehisa Konishi

IPC分类号： B32B15/04 ,  B32B9/00 ,  B32B19/00

CPC分类号： C23C8/02 ,  C23C26/00 ,  Y10T428/24322 ,  Y10T428/24355 ,  Y10T428/31678

摘要： The object of the present invention is to form a chromium-oxide film, excellent in corrosion resistance, without containing an oxide film of other metal onto the metallic material. The chromium-oxide passivation film, excellent in corrosion resistance, without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for safely supplying fluid with hard corrosivity is able to be provided. One step of forming the passivation film consisting of a chromium oxide layer by giving heat treatment, in an oxidizing atmosphere, after coating chromium on the metallic material having a surface roughness (Ra) not more than 1.5 μm.

摘要翻译： 本发明的目的是形成耐腐蚀性优异的氧化铬膜，而不含金属材料上的其它金属的氧化膜。 可以廉价且短时间地形成不含有其它金属的氧化物膜的耐腐蚀性优异的氧化铬钝化膜，能够提供用于安全地供给具有硬腐蚀性的流体的流体供给系统。 在表面粗糙度（Ra）不大于1.5μm的金属材料上涂覆铬后，在氧化气氛中进行热处理，形成由氧化铬层构成的钝化膜的一个步骤。

公开(公告)号：US20060175573A1

公开(公告)日：2006-08-10

申请号：US10546032

申请日：2004-02-09

申请人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamajl ,  Masafumi Kitano ,  Akihiro Morimoto

发明人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamajl ,  Masafumi Kitano ,  Akihiro Morimoto

IPC分类号： F16K1/00

CPC分类号： F16K7/16 ,  F16K51/02

摘要： A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.

摘要翻译： 隔膜阀1设置有主体2，主体2具有形成在通道之间的流入通道6，流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4，以允许隔膜3搁置在阀座8上并远离阀座8，其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上 和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀，并且防止由所产生的物质引起的堵塞，并且当应用于真空排气系统时防止阀座泄漏 的半导体制造设施。