公开(公告)号：US20100290024A1

公开(公告)日：2010-11-18

申请号：US12836176

申请日：2010-07-14

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G03B27/32

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配有第一操纵器 （ml，Mn），用于使透镜主动变形，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜在 除了第一个镜头。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US20100208225A1

公开(公告)日：2010-08-19

申请号：US12723456

申请日：2010-03-12

申请人： Daniel Kraehmer ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  Toralf Gruner

发明人： Daniel Kraehmer ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  Toralf Gruner

IPC分类号： G03B27/54 ,  G02B9/00

CPC分类号： G02B5/003 ,  G02B5/005 ,  G02B17/0657 ,  G02B27/0018 ,  G03F7/70233

摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

摘要翻译： 具有用于微光刻的遮蔽光瞳的投影物镜具有第一光学表面，其具有提供用于施加有用光的第一区域和至少一个第二光学表面，该第二光学表面具有用于施加有用光的第二区域。 有用光的束包络在第一区域和第二区域之间延伸。 在光传播方向上的至少一个在输入侧和输出侧开口的管切断以屏蔽散射光。 所述至少一个管在所述第一光学表面和所述第二光学表面之间。 管的壁在有用光的波长范围内是不透明的。 管在有用光的传播方向上延伸到束包络的至少一部分长度上并且周向地包围光束包络。

公开(公告)号：US07719658B2

公开(公告)日：2010-05-18

申请号：US10597776

申请日：2005-01-13

申请人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

发明人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.

摘要翻译： 一种具有投影物镜（200,300,500,600）的投影物镜（200,300,500,600）的成像系统，该投影物镜用于投影能够将物镜平面中的位置的掩模图像投影到感光涂层上，该光敏涂层可以 被设置在图像平面中的位置，并且具有用于将浸没液体（202,310,507a）填充到图像平面和最后光学元件（201,309,506）之间的间隙空间中的液体输送装置（205） ）在投影物镜的像平面侧; 其特征在于，所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看，所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时，所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件（201,309,506）布置在图像平面下方，使浸液（202,310,507,601） 至少部分地保持在图像平面侧的最后一个光学元件上的基本上为盆形的区域中。 此外，可以提供一种旋转器，其用于使承载感光涂层（401）的基板在其中感光涂层位于与重力方向相对的基板表面上的传送方向和曝光方向之间旋转， 感光涂层（401）位于面向重力方向的基板表面上。

公开(公告)号：US20090323042A1

公开(公告)日：2009-12-31

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B27/28

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

公开(公告)号：US07551263B2

公开(公告)日：2009-06-23

申请号：US11409387

申请日：2006-04-13

申请人： Toralf Gruner ,  Markus Deguenther

发明人： Toralf Gruner ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70558

摘要： A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.

摘要翻译： 用于调节微光刻投影曝光装置中的感光层上的照射剂量的装置具有多个在与装置的扫描方向垂直的方向上彼此相邻布置的止动元件。 每个停止元件具有吸收基本上所有投射在其上的投射光的外表面和基本上矩形的圆周。 每个止动元件还在其圆周上具有至少一个凹部或至少一个允许投射光通过的开口。 驱动单元将停止元件沿着扫描方向单独移位成光场。

公开(公告)号：US20080310029A1

公开(公告)日：2008-12-18

申请号：US11915191

申请日：2006-05-24

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G02B17/08 ,  G02B27/18

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US20080273248A1

公开(公告)日：2008-11-06

申请号：US11420103

申请日：2006-05-24

申请人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

发明人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

IPC分类号： G02B3/12

CPC分类号： G02B13/143 ,  G03F7/70341

摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

公开(公告)号：US07405808B2

公开(公告)日：2008-07-29

申请号：US11014199

申请日：2004-12-16

申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B5/08

CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

公开(公告)号：US07382536B2

公开(公告)日：2008-06-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B5/30

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US07256932B2

公开(公告)日：2007-08-14

申请号：US11252598

申请日：2005-10-19

申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

IPC分类号： G02B13/14 ,  G02B1/06

CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。