公开(公告)号：US20100290024A1

公开(公告)日：2010-11-18

申请号：US12836176

申请日：2010-07-14

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G03B27/32

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配有第一操纵器 （ml，Mn），用于使透镜主动变形，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜在 除了第一个镜头。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US20080310029A1

公开(公告)日：2008-12-18

申请号：US11915191

申请日：2006-05-24

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G02B17/08 ,  G02B27/18

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US09069263B2

公开(公告)日：2015-06-30

申请号：US12836176

申请日：2010-07-14

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G02B9/00 ,  G02B17/00 ,  G03F7/20

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中投影物镜在物平面和像平面之间具有多个透镜，多个透镜中的第一透镜被分配有第一操纵器（ ml，Mn），用于使透镜主动变形，第一透镜变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜另外变形 到第一个镜头。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US07777963B2

公开(公告)日：2010-08-17

申请号：US11915191

申请日：2006-05-24

申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC分类号： G02B9/00 ,  G02B17/00 ,  G03B27/68 ,  G03B27/52

CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

摘要翻译： 本发明涉及一种用于改善微光刻投射物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US20100128367A1

公开(公告)日：2010-05-27

申请号：US12403526

申请日：2009-03-13

申请人： Mariella Beckenbach ,  Klaus Rief ,  Andreas Bertele ,  Benjamin Sigel ,  Sascha Bleidistel ,  Wolfgang Hummel ,  Andreas Frommeyer ,  Toralf Gruner ,  Jochen Schwaer ,  Baerbel Schwaer ,  Thomas Schletterer ,  Artur Hoegele ,  Armin Schoeppach

发明人： Mariella Beckenbach ,  Klaus Rief ,  Andreas Bertele ,  Benjamin Sigel ,  Sascha Bleidistel ,  Wolfgang Hummel ,  Andreas Frommeyer ,  Toralf Gruner ,  Jochen Schwaer ,  Baerbel Schwaer ,  Thomas Schletterer ,  Artur Hoegele ,  Armin Schoeppach

IPC分类号： G02B7/02

CPC分类号： G03F7/70825 ,  G02B7/023 ,  G02B13/14 ,  G02B27/0068 ,  G03F7/70058 ,  G03F7/70266

摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.

摘要翻译： 提供了具有改善的成像特性的微光刻设备的投影物镜。 提供了一种用于投影物镜的操纵器。 提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。 提供了一种用于改善投影物镜的成像特性的方法。

公开(公告)号：US08319944B2

公开(公告)日：2012-11-27

申请号：US12825001

申请日：2010-06-28

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

公开(公告)号：US07782440B2

公开(公告)日：2010-08-24

申请号：US11719074

申请日：2005-11-17

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

公开(公告)号：US20080106711A1

公开(公告)日：2008-05-08

申请号：US11719074

申请日：2005-11-17

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

公开(公告)号：US20100265478A1

公开(公告)日：2010-10-21

申请号：US12825001

申请日：2010-06-28

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Bärbel Schwaer ,  Olaf Rogalsky ,  Arif Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Bärbel Schwaer ,  Olaf Rogalsky ,  Arif Kazi

IPC分类号： G03B27/68

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

公开(公告)号：US20090115986A1

公开(公告)日：2009-05-07

申请号：US11916162

申请日：2006-05-23

申请人： Heiko Feldmann ,  Daniel Kraehmer ,  Jean-Claude Perrin ,  Julian Kaller ,  Aurelian Dodoc ,  Vladimir Kamenov ,  Olaf Conradi ,  Toralf Gruner ,  Thomas Okon ,  Alexander Epple

发明人： Heiko Feldmann ,  Daniel Kraehmer ,  Jean-Claude Perrin ,  Julian Kaller ,  Aurelian Dodoc ,  Vladimir Kamenov ,  Olaf Conradi ,  Toralf Gruner ,  Thomas Okon ,  Alexander Epple

IPC分类号： G03F7/20 ,  G02B17/08

CPC分类号： G03F7/70225 ,  G02B17/08 ,  G03F7/702 ,  G03F7/70283 ,  G03F7/70941

摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

摘要翻译： 关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。