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    Imaging system for a microlithographical projection light system
    1.
    发明授权
    Imaging system for a microlithographical projection light system 有权
    微光刻投影系统成像系统

    公开(公告)号：US07719658B2

    公开(公告)日：2010-05-18

    申请号：US10597776

    申请日：2005-01-13

    申请人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

    发明人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.

    摘要翻译： 一种具有投影物镜（200,300,500,600）的投影物镜（200,300,500,600）的成像系统，该投影物镜用于投影能够将物镜平面中的位置的掩模图像投影到感光涂层上，该光敏涂层可以 被设置在图像平面中的位置，并且具有用于将浸没液体（202,310,507a）填充到图像平面和最后光学元件（201,309,506）之间的间隙空间中的液体输送装置（205） ）在投影物镜的像平面侧; 其特征在于，所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看，所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时，所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件（201,309,506）布置在图像平面下方，使浸液（202,310,507,601） 至少部分地保持在图像平面侧的最后一个光学元件上的基本上为盆形的区域中。 此外，可以提供一种旋转器，其用于使承载感光涂层（401）的基板在其中感光涂层位于与重力方向相对的基板表面上的传送方向和曝光方向之间旋转， 感光涂层（401）位于面向重力方向的基板表面上。

    Imaging System for a Microlithographical Projection Light System
    2.
    发明申请
    Imaging System for a Microlithographical Projection Light System 有权
    微光刻投影光系统成像系统

    公开(公告)号：US20070285637A1

    公开(公告)日：2007-12-13

    申请号：US10597776

    申请日：2005-01-13

    申请人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

    发明人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Imaging system of a microlithographic projection exposure apparatus with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.

    摘要翻译： 具有投影物镜（200,300,500,600）的微光刻投影曝光装置的成像系统，其用于投射能够被设置在物平面内的掩模的图像到感光涂层上，该感光涂层可以是 设置在图像平面中的位置，以及用于将浸没液体（202,310,507）填充到图像平面和最后光学元件（201,309,506）之间的间隙空间中的液体输送装置（205） 在投影物镜的像平面侧; 其特征在于，所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看，所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时，所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件（201,309,506）布置在图像平面下方，使浸液（202,310,507,601） 至少部分地保持在图像平面侧上的最后一个光学元件上的大致桶形区域中。 此外，可以提供旋转器，其用于使承载感光涂层（401）的基板在传感方向之间旋转，其中感光涂层位于与重力方向相对的基板表面上，并且曝光取向 感光涂层（401）位于面向重力方向的基板表面上。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    4.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20080304033A1

    公开(公告)日：2008-12-11

    申请号：US12194229

    申请日：2008-08-19

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    5.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20110228246A1

    公开(公告)日：2011-09-22

    申请号：US13115741

    申请日：2011-05-25

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03F7/207 ,  G02B3/12 ,  G02B17/08 ,  G03B27/70

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。