摘要:
Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process, and which minimize degeneracy between model parameters, and thus maximize pattern coverage for parameter calibration. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
摘要:
A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.
摘要:
A fingerprint sensor interface that connects to a standard camera interface and minimizes input and output signals to reduce sensor die area and cost. The sensor can connect to a standard camera interface of a cellular telephone baseband processor or other device intended to receive signals from a camera. Input and output pad are arranged on a single edge of the die. Circuitry between the pads and the sensor active array creates clearance from the array to the bond wires connected to the pads.
摘要:
A method of optimizing an illumination pupil shape for a lithographic process 1 comprises identifying a target pattern (206) to be imaged by said lithographic process. It further comprises identifying at least one optimization point (262) in said target pattern and identifying at least one design for manufacturing metric (270) per optimization point. Additionally it comprises selecting a set of illumination source points (274) based on the identified at least one design for manufacturing metric and determining the illumination pupil shape (284) based on the selected set of illumination source points.
摘要:
System and method for driving a cold-cathode fluorescent lamp. The system includes a control subsystem configured to generate one or more control signals, and a power supply subsystem configured to receive the one or more control signals and a DC input voltage, convert the DC input voltage to an AC output voltage, and send the AC output voltage to a cold-cathode fluorescent lamp. If the DC input voltage is lower than a predetermined threshold, the system for driving the cold-cathode fluorescent lamp is turned off in response to the one or more control signals.
摘要:
System and method for driving a cold-cathode fluorescent lamp. The system includes a control subsystem configured to generate one or more control signals, and a power supply subsystem configured to receive the one or more control signals and a DC input voltage, convert the DC input voltage to an AC output voltage, and send the AC output voltage to a cold-cathode fluorescent lamp. If the DC input voltage is lower than a predetermined threshold, the system for driving the cold-cathode fluorescent lamp is turned off in response to the one or more control signals.
摘要:
Switch-mode power conversion system and method thereof. The switch-mode power conversion system includes a primary winding configured to receive an input voltage, and a secondary winding coupled to the primary winding and configured to, with one or more other components, generate an output signal. Additionally, the switch-mode power conversion system includes a feedback component configured to receive the output signal and generate a feedback signal based on at least information associated with the output signal, and a voltage detector configured to receive the input voltage and output a detection signal. Moreover, the switch-mode power conversion system includes a mode controller configured to receive the detection signal and the feedback signal and generate a switch signal based on at least information associated with the detection signal and the feedback signal, and a switch configured to receive the switch signal and affect a first current flowing through the primary winding.
摘要:
System and method for providing frequency control to a power converter. The system includes a pseudorandom signal generator configured to generate a digital signal. The digital signal is associated with at least an N-bit datum, and N is a positive integer. Additionally, the system includes a digital-to-analog converter configured to receive the digital signal and generate a first control signal, an output signal generator configured to receive the first control signal and generate at least a first output signal associated with a frequency, and a pulse-width-modulation generator configured to receive at least the first output signal. The N-bit datum represents a pseudorandom number.
摘要:
A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.
摘要:
The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.