Abstract:
A method for fabricating an array substrate for a liquid crystal display (LCD) is provided. A semiconductor layer and a transparent lower electrode formed on a substrate is provided and covered by a first dielectric layer serving as a gate dielectric layer and a capacitor dielectric layer. A gate electrode and an upper electrode comprising a transparent electrode portion and a metal electrode portion are formed on the first dielectric layer and covered by a second dielectric layer. A source/drain electrode, a planarization layer, and a pixel electrode are sequentially formed on the second dielectric layer, in which the source/drain electrode is electrically connected to the semiconductor layer through the first and second dielectric layers and the pixel electrode is electrically connected to the source/drain electrode through the planarization layer. An array substrate for an LCD is also disclosed.
Abstract:
A modularized power supply switch control structure aims to control a main power system of a power supply. The main power system includes at least one high voltage output unit at a high voltage output end and one low voltage output unit at a rear low voltage output end. A control unit is connected to the high voltage output unit and the low voltage output unit to control start/stop time series of the high voltage output unit and the low voltage output unit so that the high voltage output unit and the low voltage output unit can be started asynchronously. Thus the power supply can output a start voltage at the start instant to meet load requirement. A plurality of power output modules deliver output asynchronously. Hence output current or voltage surge at the start instant can be improved.
Abstract:
A display panel including an active device array substrate, an opposite substrate and a display medium is provided. The active device array substrate includes a substrate, scan lines, data lines, pixel units, and data signal transmission lines. The scan lines and data lines define a plurality of pixel regions on the substrate. Each pixel unit is disposed within one of the pixel regions respectively, and each pixel unit includes a plurality of sub-pixel units. The sub-pixel units within the same pixel unit are electrically connected with the same data line, and each sub-pixel unit within the same pixel unit is electrically connected with one of the scan lines respectively. Each data signal transmission line is electrically connected with one of the data lines, and an extending direction of the data signal transmission line is substantially parallel with an extending direction of the scan lines.
Abstract:
This invention in one aspect relates to a pixel structure. In one embodiment, the pixel structure includes a scan line formed on a substrate and a data line formed over the substrate defining a pixel area, a switch formed inside the pixel area on the substrate, a shielding electrode formed over the switch, a plane organic layer formed over the date line and the pixel area and having no overlapping with the shielding electrode, and a pixel electrode having a first portion and a second portion extending from the first portion, and formed over the shielding electrode and the plane organic layer in the pixel area, wherein the first portion is overlapped with the shielding electrode so as to define a storage capacitor therebetween, and the second portion overlays the plane organic layer and has no overlapping with the data line.
Abstract:
A semiconductor structure and a method for manufacturing the same are provided. Compared to conventional structures of thin film transistors, the structure of the present invention uses a patterned first metal layer as a data line, and a patterned second metal layer as a gate line. In a thin film transistor, a gate is also located in the patterned first metal layer, and is electrically connected to the gate line located in the patterned second metal layer through a contact hole. A source and a drain of the thin film transistor are electrically connected to the data line through a contact hole. The structure of the present invention increases a storage capacitance and an aperture ratio.
Abstract:
A method for fabricating an active device array substrate is provided. First, a substrate having a display area and a sensing area is provided. Then, a first patterned conductor layer is formed on the display area of the substrate. A gate insulator is formed on the substrate. A patterned semiconductor layer, a second patterned conductor layer and a patterned photosensitive dielectric layer are formed on the gate insulator, wherein the second patterned conductor layer includes a source electrode, a drain electrode and a lower electrode, the patterned photosensitive dielectric layer covering the second patterned conductor layer includes an interface protection layer disposed on the source electrode and the drain electrode and a photo-sensing layer disposed on the lower electrode. A passivation layer is then formed on the substrate. After that, a third patterned conductor layer including a pixel electrode and an upper electrode is formed on the passivation layer.
Abstract:
A display device includes a substrate, gate lines, data lines, gate tracking lines, and dummy gate tracking lines. The gate lines and the data lines are arranged perpendicularly. Each gate tracking line is disposed between one parts of two adjacent data lines, and substantially parallel to the data lines. Each dummy gate tracking line is electrically disconnected to the gate lines, disposed between other parts of two adjacent data lines, and substantially parallel to the data lines.
Abstract:
The invention discloses a method for boosting the downlink transmission rate to a mobile station by a processing unit thereof, including the steps of requesting a base station for a bandwidth amount for transmission of at least one un-generated acknowledgement (ACK) packet, generating the ACK packet or packets, and instructing an RF module to transmit the ACK packet or packets to the base station following a notification from the base station indicating that the requested bandwidth amount has been allocated.
Abstract:
A forming method of the present invention includes forming a first patterned conductive layer, which includes a transparent conductive layer and a metal layer stacked together on a substrate, where the first patterned conductive layer functions as gate lines, gate electrodes, common lines and predetermined transparent pixel electrode structures; and forming a second patterned conductive layer on the substrate. The second patterned conductive layer includes data lines and reflective pixel electrodes, and be directly connected to doping regions, such as source regions/drain regions. According to the forming method of the present invention, pixel structures of a transflective liquid crystal display device can be formed through five mask processes. Therefore, the manufacturing process of the transflective liquid crystal display device is effectively simplified, so the product yield is improved and the cost can be reduced.
Abstract:
An active device array substrate including a substrate, a plurality of semiconductor patterns, a gate insulator layer, a first patterned conductive layer, a dielectric layer, a plurality of transparent electrodes, a passivation layer, and a second patterned conductive layer is provided. The semiconductor patterns are disposed on the substrate. The gate insulator layer is disposed on the substrate to cover the semiconductor patterns. The first patterned conductive layer disposed on the gate insulator layer includes a plurality of scan lines, a plurality of gate electrodes disposed on each semiconductor pattern and connected with the scan lines, and a plurality of common electrodes disposed between the scan lines. The dielectric layer is disposed on the gate insulator layer to cover the first patterned conductive layer. The transparent electrodes are disposed on the dielectric layer. The passivation layer is disposed on parts of the dielectric layer to expose the transparent electrodes.