公开(公告)号：US20050185119A1

公开(公告)日：2005-08-25

申请号：US10858030

申请日：2004-06-01

Applicant: Ching-Yu Tsai ,  Chih-Ming Chang ,  Pin-Miao Liu

Inventor： Ching-Yu Tsai ,  Chih-Ming Chang ,  Pin-Miao Liu

IPC: G02F1/1335

CPC classification number: G02F1/133553 ,  G02F2201/122

Abstract: A method for arranging reflective patterns for a liquid display (LCD) device. A substrate having at least one first pixel region and one second pixel region is provided, in which the first and second pixel regions have a reflector thereon, respectively, and the first pixel region is adjacent to the second pixel region. A first pattern is formed on the reflector on the first pixel region. A second pattern is formed on the reflector on the second pixel region, in which the second pattern is formed by dividing the first pattern into at least two pattern regions according to a predetermined direction and rearranging the pattern regions.

Abstract translation: 一种用于布置液晶显示（LCD）装置的反射图案的方法。 提供具有至少一个第一像素区域和一个第二像素区域的衬底，其中第一和第二像素区域分别具有反射器，并且第一像素区域与第二像素区域相邻。 第一图案形成在第一像素区域上的反射器上。 第二图案形成在第二像素区域上的反射器上，其中通过根据预定方向将第一图案划分成至少两个图案区域而形成第二图案并重新排列图案区域。

公开(公告)号：US06887627B2

公开(公告)日：2005-05-03

申请号：US10132156

申请日：2002-04-26

Applicant: Henry Wei-Ming Chung ,  Chi-Yuan Hung ,  Ching-Yu Chang ,  I-Pien Wu

Inventor： Henry Wei-Ming Chung ,  Chi-Yuan Hung ,  Ching-Yu Chang ,  I-Pien Wu

IPC: G03F1/30 ,  G03F9/00

CPC classification number: G03F1/30

Abstract: A method of fabricating a phase shift mask (PSM) is described. A patterned photoresist layer is formed on an opaque layer over a transparent plate. A thin mask layer is formed on the sidewalls of the patterned photoresist layer. The exposed opaque layer and transparent plate thereunder are then removed while using the patterned photoresist layer and mask layer as a mask. A phase shift opening is formed in the transparent plate, and thereby a phase shift layer is formed at the place where the phase shift opening is located. The patterned photoresist layer and the opaque layer thereunder are then removed to expose the transparent plate. The opaque layer under the mask layer can precisely self-align the phase shift layer to prevent alignment deviation caused by multiple lithography processes. The precision of the phase shift mask can be increased, and mask manufacture cost can be lowered.

Abstract translation: 描述了制造相移掩模（PSM）的方法。 在透明板上的不透明层上形成图案化的光致抗蚀剂层。 在图案化的光致抗蚀剂层的侧壁上形成薄的掩模层。 然后在使用图案化的光致抗蚀剂层和掩模层作为掩模的同时除去其下的暴露的不透明层和透明板。 在透明板中形成相移开口，由此在相移开口所在的位置形成相移层。 然后去除图案化的光致抗蚀剂层和其下的不透明层以暴露透明板。 掩模层下面的不透明层可以精确地自对准相移层，以防止由多个光刻工艺引起的对准偏差。 可以提高相移掩模的精度，并且可以降低掩模制造成本。

公开(公告)号：US20050053131A1

公开(公告)日：2005-03-10

申请号：US10890509

申请日：2004-07-13

Applicant: Damon Domke ,  Youngjun Yoo ,  Deependra Talla ,  Ching-Yu Hung

Inventor： Damon Domke ,  Youngjun Yoo ,  Deependra Talla ,  Ching-Yu Hung

IPC: G10L19/00 ,  H04N7/26 ,  H04N7/12

CPC classification number: H04N19/42 ,  H04N19/436

Abstract: A digital video acquisition system including a plurality of image processors (30A; 30B) is disclosed. A CCD imager (22) presents video image data on a bus (video_in) in the form of digital video data, arranged in a sequence of frames. A master image processor (30A) captures and encodes a first group of frames, and instructs a slave image processor (30B) to capture and encode a second group of frames presented by the CCD imager (22) before the encoding of the first group of frames is completed by the master image processor. The master image processor (30A) completes its encoding, and is then available to capture and encode another group of frames in the sequence. Video frames that are encoded by the slave image processor (30B) are transferred to the master image processor (30A), which sequences and stores the transferred encoded frames and also those frames that it encodes in a memory (36A; 38). The parameters of the encoding operation can be dynamically adjusted, for example in response to the nature of the video sequences being captured.

Abstract translation: 公开了一种包括多个图像处理器（30A; 30B）的数字视频采集系统。 CCD成像器（22）以数字视频数据的形式在总线（video_in）上呈现以帧序列排列的视频图像数据。 主图像处理器（30A）捕获并编码第一组帧，并且指示从属图像处理器（30B）在第一组编码之前捕获并编码由CCD成像器（22）呈现的第二组帧 帧由主图像处理器完成。 主图像处理器（30A）完成其编码，然后可用于捕获并编码序列中的另一组帧。 由从属图像处理器（30B）编码的视频帧被传送到主图像处理器（30A），该主图像处理器将传送的编码帧和其编码的那些帧序列并存储在存储器（36A; 38）中。 编码操作的参数可以被动态地调整，例如响应被捕获的视频序列的性质。

公开(公告)号：US20050052463A1

公开(公告)日：2005-03-10

申请号：US10936342

申请日：2004-09-07

Applicant: Ching-Yu Hung

Inventor： Ching-Yu Hung

IPC: G06T1/60 ,  G09G5/39

CPC classification number: G06T1/60

Abstract: A method for managing image processing data buffers for processes having overlap input data between iterations includes loading a data buffer with an initial input data array and performing an image data array operation on the input data array. The method repeats the following steps for plural iterations including loading the data buffer with new input data forming a new input data array for a next iteration and performing the input data array operation on the new input data array. The overlap data consists of pixels at an end of each scan line. Loading new input data includes loading pixels following the overlap data for each scan line.

Abstract translation: 用于管理具有迭代之间的重叠输入数据的处理的图像处理数据缓冲器的方法包括：使用初始输入数据阵列加载数据缓冲器，并对输入数据阵列执行图像数据阵列操作。 该方法重复以下步骤进行多次迭代，包括使用新的输入数据加载数据缓冲器，形成新的输入数据阵列用于下一次迭代，并对新的输入数据阵列执行输入数据阵列操作。 重叠数据由每条扫描线末端的像素组成。 加载新的输入数据包括在每个扫描线的重叠数据之后加载像素。

公开(公告)号：US06864185B2

公开(公告)日：2005-03-08

申请号：US10643000

申请日：2003-08-18

Applicant: Ta-Hung Yang ,  Chin-Cheng Yang ,  Ching-Yu Chang

Inventor： Ta-Hung Yang ,  Chin-Cheng Yang ,  Ching-Yu Chang

IPC: G03F7/20 ,  G03F7/26 ,  H01L21/302 ,  H01L21/461

CPC classification number: G03F7/70466 ,  G03F7/203

Abstract: A method of forming a feature pattern in a photosensitive layer includes forming the photosensitive layer on a substrate, providing a first mask having a first opaque area thereon, and performing a first exposure process with a first dose to form a first unexposed image in the photosensitive layer. The method further includes performing a second exposure process with a second dose to expose sidewalls of the first unexposed image so that the sidewalls of the first unexposed image receive at least a portion of the second dose thus forming a second unexposed image in the photosensitive layer, and developing the photosensitive layer with a developing process to form the feature pattern and to create features having smaller widths than those which would result in developing the photosensitive layer of the first unexposed image.

Abstract translation: 在感光层中形成特征图案的方法包括在基底上形成感光层，提供其上具有第一不透明区域的第一掩模，并且以第一剂量进行第一曝光处理以在感光层中形成第一未曝光图像 层。 该方法还包括用第二剂量进行第二曝光处理以暴露第一未曝光图像的侧壁，使得第一未曝光图像的侧壁接收第二剂量的至少一部分，从而在感光层中形成第二未曝光图像， 并用显影工艺显影感光层以形成特征图案，并产生具有比导致显影第一未曝光图像的感光层的那些宽度小的特征。

公开(公告)号：US06861176B2

公开(公告)日：2005-03-01

申请号：US10065003

申请日：2002-09-09

Applicant: Tsung-Hsien Wu ,  Ching-Yu Chang ,  Tahorng Yang

Inventor： Tsung-Hsien Wu ,  Ching-Yu Chang ,  Tahorng Yang

IPC: G03C5/00 ,  G03F1/00 ,  G03F1/36 ,  G03F9/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/311 ,  H01L21/461 ,  H01L21/768

CPC classification number: G03F1/36 ,  H01L21/76802

Abstract: A method of forming holes in a layer through a cross-shape image exposure. The method includes removing a section from each corner of the rectangular patterns on a photomask to form cross-shape patterns so that circular or elliptical contact holes are formed on a photoresist layer after photo-exposure and development. Optical image contrast between contacts is increased by the cross-shape patterns on the photomask.

Abstract translation: 通过十字形图像曝光在层中形成孔的方法。 该方法包括从光掩模上的矩形图案的每个角落去除一部分以形成十字形图案，使得在曝光和显影之后在光致抗蚀剂层上形成圆形或椭圆形的接触孔。 通过光掩模上的交叉形状图案增加了触点之间的光学图像对比度。

公开(公告)号：US20040250383A1

公开(公告)日：2004-12-16

申请号：US10617374

申请日：2003-07-11

Applicant: Ching-Yu CHOU ,  Shiu-Yin CHENG

Inventor： Chao-Mu Chou

IPC: A44B017/00

CPC classification number: A44B18/0003 ,  Y10S24/39 ,  Y10S24/51 ,  Y10T24/2514 ,  Y10T24/2534 ,  Y10T24/44034 ,  Y10T24/44983 ,  Y10T24/44991 ,  Y10T24/45173 ,  Y10T24/45257

Abstract: An elongated shut apparatus includes a primary plate and a follower plate with the inner sides thereof facing to each other. Both the primary and the follower plate are made of soft high molecular material and have a concave shaped cross section with a thick central part getting thinner toward two lateral ends thereof.

Abstract translation: 细长的关闭装置包括主板和从动板，其内侧面对彼此。 主板和从动板均由软的高分子材料制成，并且具有凹形截面，厚的中心部分朝向其两个侧端变薄。

公开(公告)号：US06802322B2

公开(公告)日：2004-10-12

申请号：US10063129

申请日：2002-03-25

Applicant: Ching-Yu Chang

Inventor： Ching-Yu Chang

IPC: H01L21302

CPC classification number: H01L27/11521 ,  H01L27/115

Abstract: A stringer block is formed on the interface between a HDP silicon oxide layer and a silicon substrate. During an etching process for defining the profile of a floating gate, the stringer block functions to expose a bottom corner stringer. Following that, a polysilicon etching process effectively removes the bottom corner stringer. As a result, a stringerless flash memory cell is formed to prevent leakage currents, resulting from the bottom corner stringer, and improve both the reliability and data retention ability of the device.

Abstract translation: 在HDP氧化硅层和硅衬底之间的界面上形成纵梁块。 在用于限定浮动门的轮廓的蚀刻工艺期间，纵梁块用于暴露底部拐角桁条。 之后，多晶硅蚀刻工艺有效地去除了底角拐角。 结果，形成了一个无弯曲的快闪存储单元，以防止由底角拐角引起的漏电流，并提高设备的可靠性和数据保留能力。

公开(公告)号：US06719418B2

公开(公告)日：2004-04-13

申请号：US10201905

申请日：2002-07-25

Applicant: Ching-Yu Chou ,  Wen-Chung Chen ,  Chien-Ming Lin ,  Chuang-Hsien Chiu

Inventor： Ching-Yu Chou ,  Wen-Chung Chen ,  Chien-Ming Lin ,  Chuang-Hsien Chiu

IPC: B41J2175

CPC classification number: B41J2/17556 ,  B41J2/17513 ,  B41J2/17596

Abstract: An inkjet pen including an ink reservoir for storing ink and providing ink for jetting. A port, located on top of the ink reservoir, fluid-communicated with the ambient air, is used for adjusting the air pressure inside the reservoir. A valve, operated by a spring or a resilient element, normally seals the port, while occasionally opening the port to introduce air into the reservoir when the ink level is low and the underpressure rises. In other embodiments, an elastic bag is included in the reservoir that has an opening communicated with the ambient air through a second port formed on top of the reservoir. The elastic bag expands in response to the increasing underpressure generated in the reservoir when ink is being used. The bag expansion actuates the opening of the valve so as to regulate the underpressure.

Abstract translation: 一种喷墨笔，包括用于储存油墨并提供用于喷射的油墨的油墨储存器。 位于储墨器顶部的与环境空气流体连通的端口用于调节储存器内部的空气压力。 由弹簧或弹性元件操作的阀通常密封端口，而当油墨水平低并且负压升高时，偶尔打开端口将空气引入储存器。 在其他实施例中，弹性袋包括在储存器中，该开口具有通过形成在储存器顶部上的第二端口与环境空气连通的开口。 响应于当使用油墨时储存器中产生的负压增加，弹性袋膨胀。 袋膨胀致动阀的打开以调节负压。

公开(公告)号：US06689663B1

公开(公告)日：2004-02-10

申请号：US10218101

申请日：2002-08-12

Applicant: Ching-Yu Chang ,  Ta-Horng Yang

Inventor： Ching-Yu Chang ,  Ta-Horng Yang

IPC: H01L218246

CPC classification number: H01L27/1126 ,  H01L27/112

Abstract: A method of code programming a mask read only memory (ROM) is disclosed. According to the method, a first photoresist layer is formed over word lines and a gate oxide layer of a substrate already having implanted bit lines. The first photoresist layer is patterned to develop pre-code openings over all of the memory cells, which correspond to intersecting word and bit lines. The first photoresist layer is then hardened using either a treatment implant or a treatment plasma. Subsequently, a second photoresist layer is formed over the first photoresist layer and patterned to develop real-code openings over memory cells which are actually to be coded with a logic “0” value. Each memory cell to be coded is then implanted with implants passing through the pre-code openings and the real code openings and into the memory cell.