摘要:
A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgaCu1-a; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 μm, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.
摘要:
A hard laminar coating having a first film and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (AlaCrbBc), while the second film is TiB2, the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1−b−c, 0.2≦b≦0.7, and 0
摘要翻译:一种硬层状涂层,其具有第一膜和第二膜,其具有各自不同的组成并且交替地层压在基底结构的表面上,其中所述第一膜为碳化物,氮化物,羧化物,氮氧化物,碳氮化物或碳 - (AlaCrbBc)的氮氧化物,而第二膜为TiB2时,硬质层状涂层被配置为包含第一膜中的原子比a,b和c,满足a = 1-bc,0.2 @ b @ 0.7和0
摘要:
According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, a second electrode, and a third electrode. Each of the second electrode and third electrode is configured to sandwich the dielectric body with the first electrode. The second electrode includes an electrode having a side that lies substantially orthogonal to an incident direction of a light beam, a side that is substantially parallel to the incident direction, and a side that intersects with the incident direction. The third electrode includes an electrode having a side that is aligned with the second electrode, a side that is substantially parallel to an incident direction of the light beam, and a side that intersects with the light beam, and that slopes in an opposite to that of the side of the second electrode that intersects with the light beam.
摘要:
According to one embodiment, a cured first ultraviolet-curing resin material layer having a first three-dimensional pattern is formed on a first principal surface of a magnetic recording medium having a central hole. A cured second ultraviolet-curing resin material layer having a second three-dimensional pattern is formed on a second principal surface opposite to the first principal surface of the magnetic recording.
摘要:
According to one embodiment, there is provided a magnetic recording medium having a data region in which a plurality of recording tracks, each including magnetic dots arrayed in a down-track direction with a pitch p, are formed in a cross-track direction, and a servo region including a preamble in which a plurality of lines of magnetic dots, which are arrayed in a cross-track direction with a pitch p, are formed at equal intervals in the down-track direction.
摘要:
A method for manufacturing a plate-like structure, the method including a step of transferring concave and convex patterns on a master to a surface of a transferred substrate by sandwiching the master provided with the concave and convex patterns and the transferred substrate, between a press surface of a hollow cylindrical upper and a press surface of a lower mold, and pressurizing central parts of the upper and lower molds to apply pressure to the master and the transferred substrate, wherein a compressive load imposed on inner peripheral portions of the upper and lower molds is blocked and distributed toward outer peripheries of the upper and lower molds.
摘要:
According to one embodiment, a resin imprint stamper formed of a resin material in an annular shape having a through-hole in a central part thereof, including a pattern area formed on a part of a surface thereof in which a plurality of lands and grooves are circumferentially arranged with a track pitch of 100 nm or less, and the pattern height of at most 100 nm, wherein no protrusion and step having a height exceeding 10 μm from a top surface of the pattern area are present in a region less than 3 mm from an end of the pattern area toward an inner periphery thereof.
摘要:
According to one embodiment, a magnetic recording media includes a substrate having recording tracks and separating regions separating the recording tracks, the separating regions having patterns of protrusions and recesses formed therein, and a recording film deposited on the substrate, in which a difference in height between a top of the recording track and a top of the separating region is 2 nm or more and 7 nm or less, and a difference in height between the top of the recording track and a bottom of the separating region is 10 nm or more.
摘要:
A magnetic recording media includes a servo region including a preamble region and a burst region and having marks of a magnetic film, and a data region having discrete tracks of the magnetic film. The burst region includes a signal section and a non-signal section, the signal section including rectangular marks of the magnetic film, in-plane geometry of which is a rectangle, formed in a periodic pattern in a track direction, and the non-signal section including marks of the magnetic film having a pattern different from the pattern of the rectangular marks in the signal section.
摘要:
It is made possible to reduce factors of instability caused on irradiation by a rotating system in an electron beam irradiating apparatus and obtain a desired pattern stably. An electron beam irradiating method includes: providing at least an OFF state of the electron beam exposure during exposing a region corresponding to a bit pattern at a point located at a distance of a radius r from a rotation center of the substrate to the electron beam so as to make the exposure equal to r/rout times that obtained when exposing a point located at a radius rout of an outermost circumference in an illustrating range serving as reference.
摘要翻译:可以减少电子束照射装置中的旋转系统的照射引起的不稳定因素,能够稳定地获得期望的图案。 电子束照射方法包括:在将位于半径r的距离处的位置处的位图曝光期间,至少提供电子束曝光的OFF状态,所述位置处于与基板的旋转中心相对的电子束的半径r的距离处,因此 以使曝光等于在作为基准的图示范围中露出位于最外周的半径r 1以外的点所获得的r / r sub>次。