Abstract:
Disclosed is a composition containing phosphatidylserine as an effective ingredient, and more particularly to a composition containing phosphatidylserine as an effective ingredient for protecting and improving a skin, reinforcing a skin barrier function, suppressing and alleviating an inflammatory response, treating and improving an atopic skin, activating PPAR-a promoting a differentiation of the skin, protecting the skin and preventing and improving skin aging and wrinkle. Accordingly, it is possible to protect and improve the skin from the injury due to the ultraviolet or the external stimulating material such as chemical material and to reinforce and strengthen the skin barrier function using the composition, thereby improving a general skin state.
Abstract:
A method for fabricating a transistor of a semiconductor device includes: forming a gate pattern over a substrate; forming a junction region by performing an on implantation process onto the substrate at opposite sides of the gate pattern; performing a solid phase epitaxial (SPE) process on the junction region at a temperature approximately ranging from 770° C. to 850° C.; and performing a rapid thermal annealing (RTA) process on the junction region.
Abstract:
A doping method that forms a doped region at a desired location of a three-dimensional (3D) conductive structure, controls the doping depth and doping dose of the doped region relatively easily, has a shallow doping depth, and prevents a floating body effect. A semiconductor device is fabricated using the same doping method. The method includes, forming a conductive structure having a sidewall, exposing a portion of the sidewall of the conductive structure, and forming a doped region in the exposed portion of the sidewall by performing a plasma doping process.
Abstract:
A method of fabricating a semiconductor device facilitates the forming of a conductive pattern of features having different widths. A conductive layer is formed on a substrate, and a mask layer is formed on the conductive layer. First spaced apart patterns are formed on the mask layer and a second pattern including first and second parallel portion is formed beside the first patterns on the mask layer. First auxiliary masks are formed over ends of the first patterns, respectively, and a second auxiliary mask is formed over the second pattern as spanning the first and second portions of the second pattern. The mask layer is then etched to form first mask patterns below the first patterns and a second mask pattern below the second pattern. The first and second patterns and the first and second auxiliary masks are removed. The conductive layer is then etched using the first and second mask patterns as an etch mask.
Abstract:
A spacer grid for nuclear fuel rods includes a plurality of unit spacer grids stacked one on top of another. Each unit spacer grid includes a plurality of unit spacer grid straps disposed at regular intervals in a row, and a plurality of fixing grid straps connected to respective opposite ends of the unit spacer grid straps so as to fix the unit spacer grid straps. Each unit spacer grid strap has convexities alternating with each other on opposite sides thereof at regular intervals, and at least one of the convexities has a diameter greater than the others. The unit spacer grids are rotated in one direction by a 90 or 180 degree angle when being stacked.
Abstract:
A judder detection apparatus, a de-interlacing apparatus using the judder detection apparatus, and a de-interlacing method. The judder detection apparatus includes a judder detector to detect whether a detected pattern that is similar to a judder pattern occurs using predetermined pixel values of even and odd fields sequentially input, a pattern detector to detect whether an input image has a uniform pixel value in every other line of the even and odd fields and whether consecutive lines of the even and odd fields have a blind pattern having a difference from the uniform pixel that is greater than or equal to a threshold value, and a determiner to determine whether the detected pattern that is similar to the judder pattern is a judder based on whether the blind pattern is detected.
Abstract:
Disclosed herein is a liquid zoom lens. The liquid zoom lens comprises a cylindrical body including glass lenses respectively coupled at upper and lower openings to the body, an auto-focus lens part including a first liquid insulating layer and a first electrolyte layer stacked at a lower portion of the body to form an interface therebetween, and an optical zoom lens part including a second liquid insulating layer and a second electrolyte layer stacked on the first electrolyte layer to form an interface therebetween and a lens positioned in the second liquid insulating layer and fixed to the body with an outer peripheral surface of the lens closely contacting an inner peripheral surface of the body. The liquid zoom lens enables an auto-focus function and an optical zoom function to be performed simultaneously by means of a single liquid lens having a variable curvature.
Abstract:
A method for manufacturing a fin transistor includes forming a trench by etching a semiconductor substrate. A flowable insulation layer is filled in the trench to form a field insulation layer defining an active region. The portion of the flowable insulation layer coming into contact with a gate forming region is etched so as to protrude the gate forming region in the active region. A protective layer over the semiconductor substrate is formed to fill the portion of the etched flowable insulation layer. The portion of the protective layer formed over the active region is removed to expose the active region of the semiconductor substrate. The exposed active region of the semiconductor substrate is cleaned. The protective layer remaining on the portion of the etched flowable insulation layer is removed. Gates are formed over the protruded gate forming regions in the active region.
Abstract:
Disclosed are a contact plug of a semiconductor device and a method for fabricating the same. The semiconductor device includes: an epitaxial stack formed by inserting a heteroepitaxy layer between a pair of homoepitaxy layers; and a contact plug including a metal layer on the epitaxial stack. Accordingly, in accordance with the present invention, the contact plug is selectively doped in a high concentration, thereby reducing a contact resistance. Furthermore, the present invention also provides an effect of reducing degradation in a device property without decreasing yields of products by minimizing a thermal budget through using a SEG-silicon germanium layer capable of obtaining a high doping concentration and a high deposition speed.
Abstract:
A lens assembly of a camera module mounted in a small portable device includes a body receiving at least one lens and having a hole at one side, a screw member inserted in the hole in a direction substantially parallel to an optical axis, a support boss provided at the other side of the body and including a coupling hole formed in a direction substantially parallel to the optical axis, and a guide groove formed at one side of a side surface of the support boss, a shaft coupled with the coupling hole of the support boss and guiding a movement of the body, and a guide member having one side elastically and tightly attached to the screw member and moved by rotation of the screw member, and the other side coupled with the shaft to be movable along the guide groove and moving the body along the optical axis.