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329 条记录 (耗时 0.031 秒)

    Metal compound solution and thin film formation using the same
    121.
    发明授权
    Metal compound solution and thin film formation using the same 失效
    金属化合物溶液和使用其的薄膜形成

    公开(公告)号：US06547863B2

    公开(公告)日：2003-04-15

    申请号：US09784191

    申请日：2001-02-16

    申请人： Kazuhisa Onozawa ,  Naoki Yamada

    发明人： Kazuhisa Onozawa ,  Naoki Yamada

    IPC分类号： C23C1640

    CPC分类号： C23C16/409

    摘要： A metal compound solution of a metal compound represented by formula (I): wherein R1, R2, and R3 are each a halogen-substituted or unsubstituted alkyl group having 1 to 8 carbon atoms which may contain an oxygen atom in its carbon chain; R4 is a straight-chain or branched alkylene group having 2 to 18 carbon atoms; M is lead, titanium or zirconium: when M is lead, l, m and n represent 0, 2 and 0, respectively; when M is titanium or zirconium, n represents 0 or 1, and l and m each represent an integer of 0 to 4 satisfying equation: 1+m+2n=4, in a cyclohexane compound represented by formula (II): wherein R5 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and p represents 1 or 2.

    摘要翻译： 由式（I）表示的金属化合物的金属化合物溶液：其中R 1，R 2和R 3各自为可以在其碳链中含有氧原子的具有1至8个碳原子的卤素取代或未取代的烷基; R4是具有2至18个碳原子的直链或支链亚烷基; M是铅，钛或锆：当M为铅时，l，m和n分别表示0,2和0; 当M是钛或锆时，n表示0或1，并且在由式（II）表示的环己烷化合物中，l和m各自表示0至4的整数，满足式1 + m + 2n = 4）其中R5表示 氢原子或碳原子数为1〜4的烷基; p表示1或2。

    Sputtering device
    122.
    发明授权
    Sputtering device 有权

    公开(公告)号：US06461484B2

    公开(公告)日：2002-10-08

    申请号：US09931852

    申请日：2001-08-20

    申请人： Kamikura Yo ,  Naoki Yamada ,  Terushige Takeyama ,  Shuji Kumagai

    发明人： Kamikura Yo ,  Naoki Yamada ,  Terushige Takeyama ,  Shuji Kumagai

    IPC分类号： C23C1434

    CPC分类号： C23C14/225 ,  C23C14/352 ,  H01J37/3405

    摘要： A sputtering device is provided in which at least one target is sputtered by sputtering discharge to produce a film of target material on at least the first surface of a substrate. The sputtering device has a principal rotating mechanism that rotates the at least one target about an axis of revolution coaxial with the central axis of the substrate. The target is positioned offset from and circumferential to the central axis of the substrate coaxial with the axis of revolution. A magnet mechanism for magnetron discharge of the sputtering discharge forms a magnetic field asymmetrical to a central axis of the target and is rotated by an auxiliary rotating mechanism. The principal rotating mechanism integrates rotation of the targets with the magnet mechanism.

    Assembly of electrostatic rotary sprayers
    123.
    发明授权
    Assembly of electrostatic rotary sprayers 失效
    静电旋转喷雾器的组装

    公开(公告)号：US4909180A

    公开(公告)日：1990-03-20

    申请号：US136935

    申请日：1987-12-23

    申请人： Shogo Oishi ,  Iwao Nomura ,  Kouji Ohta ,  Naoki Yamada ,  Hitoshi Takeuchi

    发明人： Shogo Oishi ,  Iwao Nomura ,  Kouji Ohta ,  Naoki Yamada ,  Hitoshi Takeuchi

    IPC分类号： B05B5/04 ,  B05B5/08

    CPC分类号： B05B5/04 ,  B05B5/08

    摘要： A rotary type electrostatic spray coating device comprising two or more side spray coating units having two or more spray heads separated from each other at a distance larger than a width of the coating pattern of each spray head, and the same negative high voltage is simultaneously applied to all of the spray heads during a spray coating operation; thus enabling a shortening of the length of the spray coating booth, improving a flatness of the paint coating on the work pieces, and completely preventing an undesirable deposition of paint mist on the spray heads.

    摘要翻译： 一种旋转型静电喷涂装置，其包括两个或更多个具有两个或更多个喷雾头的侧喷涂单元，所述两个或更多个喷头彼此间隔大于每个喷头的涂布图案的宽度，同时施加相同的负高压 在喷涂操作期间到所有喷头; 从而能够缩短喷涂室的长度，提高工件上的涂料的平坦度，并且完全防止喷雾头上不期望的油漆雾沉积。