公开(公告)号：US06766624B2

公开(公告)日：2004-07-27

申请号：US10003367

申请日：2001-11-15

申请人： Tokio Shibazaki ,  Yosikatsu Aizawa ,  Mitsuru Sato ,  Kenichi Enda

发明人： Tokio Shibazaki ,  Yosikatsu Aizawa ,  Mitsuru Sato ,  Kenichi Enda

IPC分类号： B65B5700

CPC分类号： B65B13/32 ,  B65B13/18

摘要： A controller in a banding packing machine which can easily correct a shift from the predetermined timing cycle. The controller includes a cam shaft having a plurality of cams, a timing plate which includes a plurality of holes corresponding to rotation positions of the cam shaft, and a detecting means. An inching mode is also disclosed which provides for the manual adjustment of presser members following a step in the rotation of the cam shaft.

摘要翻译： 一种捆扎包装机中的控制器，其可以容易地从预定的定时周期校正偏移。 控制器包括具有多个凸轮的凸轮轴，包括对应于凸轮轴的旋转位置的多个孔的定时板以及检测装置。 还公开了一种微动模式，其提供在凸轮轴的旋转中的步骤之后的按压构件的手动调节。

公开(公告)号：US6015467A

公开(公告)日：2000-01-18

申请号：US859926

申请日：1997-05-21

申请人： Koichi Nagasawa ,  Naomi Kawaguchi ,  Futoshi Shimai ,  Mitsuru Sato ,  Kouji Harada ,  Jun Koshiyama

发明人： Koichi Nagasawa ,  Naomi Kawaguchi ,  Futoshi Shimai ,  Mitsuru Sato ,  Kouji Harada ,  Jun Koshiyama

IPC分类号： B08B3/10 ,  B08B3/12 ,  C11D7/06 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  G03F7/16 ,  G03F7/42 ,  H01L21/00 ,  B08B1/02 ,  B08B3/08

CPC分类号： C11D7/261 ,  B08B3/10 ,  B08B3/12 ,  C11D7/06 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/5022 ,  G03F7/162 ,  G03F7/425 ,  H01L21/6708 ,  C11D7/263

摘要： In a method of removing a coating from an edge of a substrate a solvent reservoir is filled with a solvent to dissolve and remove a photoresist film, the solvent includes one of dipropylene glycol monoalkyl ether, a mixture of this ether and an easily volatile organic solvent (boiling point of 75-130.degree. C., vapor pressure of 5-75 mmHg at 20.degree. C.), and an alkaline aqueous solution, an edge of a substrate W is horizontally inserted in the reservoir, and thereafter, the edge of the substrate W is immersed in the solvent for a period of time, so as to dissolve and remove a coating such as photoresist from the edge of the substrate. The solvent may be filled into the solvent reservoir either before or after the edge of the substrate is inserted therein, and the method may further involve aspirating the solvent from the reservoir after the substrate edge has been inserted therein.

摘要翻译： 在从基材的边缘去除涂层的方法中，溶剂储存器填充有溶剂以溶解并除去光致抗蚀剂膜，溶剂包括二丙二醇单烷基醚，该醚和易挥发的有机溶剂的混合物 （沸点75-130℃，20℃蒸气压5-75mmHg）和碱性水溶液，将基材W的边缘水平地插入储存器中，然后将边缘 将衬底W浸入溶剂中一段时间​​，从而从衬底的边缘溶解并除去诸如光致抗蚀剂的涂层。 在将基材的边缘插入其中之前或之后，可以将溶剂填充到溶剂容器中，并且该方法还可以包括在衬底边缘已插入其中之后从储存器吸出溶剂。

公开(公告)号：US5976760A

公开(公告)日：1999-11-02

申请号：US898105

申请日：1997-07-22

申请人： Katsumi Oomori ,  Hideo Hada ,  Fumitake Kaneko ,  Mitsuru Sato ,  Kazufumi Sato ,  Toshimasa Nakayama

发明人： Katsumi Oomori ,  Hideo Hada ,  Fumitake Kaneko ,  Mitsuru Sato ,  Kazufumi Sato ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492

CPC分类号： G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： Proposed is a novel chemical-sensitization resist composition capable of giving a positively or negatively patterned resist layer of excellent pattern resolution and cross sectional profile of the patterned resist layer with high sensitivity. Characteristically, the resist composition is formulated, as combined with a resinous ingredient which is subject to changes in the solubility behavior in an alkaline developer solution by interaction with an acid, with a specific oximesulfonate compound as the radiation-sensitive acid-generating agent represented by the general formulaR.sup.1 --C(CN).dbd.N--O--SO.sub.2 --R.sup.2,in which R.sup.1 is an inert organic group and R.sup.2 is an unsubstituted or substituted polycyclic monovalent hydrocarbon group selected from the group consisting of polycyclic aromatic hydrocarbon groups such as naphthyl and polycyclic non-aromatic hydrocarbon groups such as a terpene or camphor residue.

摘要翻译： 提出了一种能够以高灵敏度赋予图案化抗蚀剂层优异图案分辨率和截面轮廓的正或负图案化抗蚀剂层的新型化学增感抗蚀剂组合物。 特别地，将抗蚀剂组合物配制成与通过与酸相互作用而在碱性显影剂溶液中溶解度行为发生变化的树脂成分与特定的肟磺酸酯化合物作为辐射敏感性产酸剂， 通式为R1-C（CN）= NO-SO2-R2，其中R1为惰性有机基团，R2为未取代或取代的多环一价烃基，选自多环芳烃基如萘基和多环 非芳族烃基如萜烯或樟脑残基。

公开(公告)号：US5955241A

公开(公告)日：1999-09-21

申请号：US956792

申请日：1997-10-23

申请人： Mitsuru Sato ,  Kiyoshi Ishikawa ,  Hiroyuki Yamazaki ,  Yoshiki Sugeta ,  Toshimasa Nakayama

发明人： Mitsuru Sato ,  Kiyoshi Ishikawa ,  Hiroyuki Yamazaki ,  Yoshiki Sugeta ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03C1/492

CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： The present invention provides a chemical-amplification-type negative resist composition and a method for forming a negative resist pattern using the same. The chemical-amplification-type negative resist composition comprises (A) an alkali-soluble resin, (B) an acid-generating agent, and (C) a compound capable of causing crosslinking reaction in the presence of an acid, wherein the ingredient (A) is a mixture comprising (i) a copolymer which comprises constitutional repeating units of a hydroxystyrene type, has a weight average molecular weight of 2,000 to 4,000, and has a ratio of the weight average molecular weight to the number average molecular weight falling within 1.0 to 2.0; and (ii) a hydroxystyrene homopolymer, and wherein the dissolution rate of the ingredient (A) at 23.degree. C. in a 2.38% by weight tetramethylammonium hydroxide aqueous solution falls within 80 to 300 nm/s.

摘要翻译： 本发明提供化学放大型负光刻胶组合物和使用其形成负光刻胶图案的方法。 化学增幅型负性抗蚀剂组合物包含（A）碱溶性树脂，（B）酸产生剂和（C）在酸存在下能够引起交联反应的化合物，其中成分（ A）是包含（i）包含羟基苯乙烯型结构重复单元的共聚物，其重均分子量为2,000至4,000的共聚物，并且其重均分子量与数均分子量的比率 1.0〜2.0; 和（ii）羟基苯乙烯均聚物，并且其中成分（A）在23℃在2.38重量％四甲基氢氧化铵水溶液中的溶解速率为80-300nm / s。

公开(公告)号：US5939510A

公开(公告)日：1999-08-17

申请号：US845358

申请日：1997-04-24

申请人： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko

发明人： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko

IPC分类号： G03F7/11 ,  C09K3/00 ,  G03F7/09 ,  H01L21/027 ,  C08G8/02 ,  C08G12/00

CPC分类号： G03F7/091

摘要： Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photoresist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.

摘要翻译： 提出了一种新颖的底涂层组合物，用于形成底涂层和介于光致抗蚀剂层之间的底涂层，目的在于降低光致抗蚀剂层的图案曝光中光的反射对基板表面的不利影响 在干蚀刻处理中，在图案化的抗蚀剂层和底涂层之间的蚀刻速率方面，没有不希望的层之间的混合现象和开槽以及大的选择比。 底涂层组合物包含（A）紫外线吸收剂，其为在芳基上具有至少一个未取代或烷基取代的氨基的二苯甲酮化合物或芳族偶氮甲碱化合物，（B）优选三聚氰胺化合物的交联剂，其具有 至少两个羟甲基或分子中的氮原子以重量比（A）：（B））键合在1：1至1:10范围内的烷氧基甲基。

公开(公告)号：US5925495A

公开(公告)日：1999-07-20

申请号：US924260

申请日：1997-09-05

申请人： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Toshimasa Nakayama

发明人： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  G03C1/492

CPC分类号： G03F7/091 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus, patterning is conducted on a photoresist laminate comprising (a) a substrate; (b) a specific anti-reflection coating layer formed on one surface of the substrate; and (c) a photoresist layer formed on the anti-reflection coating layer from a specific negative-working chemical-sensitization photoresist composition comprising an oxime sulfonate acid generating agent. The patterning procedure comprises the steps of: (A) exposing, pattern-wise to actinic rays, the photoresist layer of the photoresist laminate; (B) subjecting the photoresist layer to a heat treatment; (C) subjecting the photoresist layer to a development treatment to dissolve away the photoresist layer in the areas unexposed to actinic rays in step (A) so as to expose bare the anti-reflection coating layer in the areas unexposed to the actinic rays leaving a patterned resist layer in the areas exposed to the actinic rays; and (D) removing the pattern-wise exposed anti-reflection coating layer by dry etching with the patterned photoresist layer as a mask.

摘要翻译： 提出了在基板上的图案化抗蚀剂层的光刻形成，而不会由于基板表面上的曝光光的反射而引起的问题。 因此，在包含（a）基底的光致抗蚀剂层压件上进行图案化; （b）形成在所述基板的一个表面上的特定抗反射涂层; 以及（c）由抗反酸涂层形成的抗氧化剂层，其特征在于包含肟磺酸生成剂的特定负性化学增感光致抗蚀剂组合物。 图案化步骤包括以下步骤：（A）以光致抗蚀剂层压板的光致抗蚀剂层将光致抗蚀剂层以图形方式曝光于光化射线; （B）对光致抗蚀剂层进行热处理; （C）在步骤（A）中对光致抗蚀剂层进行显影处理以将光致抗蚀剂层溶解在未暴露于光化射线的区域中，以便露出未暴露于光化离子的区域中的防反射涂层 在暴露于光化射线的区域中的图案化抗蚀剂层; 和（D）通过用图案化的光致抗蚀剂层作为掩模的干蚀刻去除图案化的曝光的抗反射涂层。

公开(公告)号：US5914495A

公开(公告)日：1999-06-22

申请号：US823415

申请日：1997-03-25

申请人： Shigeki Ishizuka ,  Koichi Sato ,  Akira Nikami ,  Mitsuru Sato ,  Yoshitake Yanagisawa

发明人： Shigeki Ishizuka ,  Koichi Sato ,  Akira Nikami ,  Mitsuru Sato ,  Yoshitake Yanagisawa

IPC分类号： G01N21/88 ,  G01N21/89 ,  G01N21/95 ,  G11B7/26 ,  G01N21/86

CPC分类号： G01N21/9506

摘要： A disc defect inspection apparatus which can detect a defect of a disc, such as an optical disc, with high accuracy. A disc defect inspection apparatus includes a rotating portion for rotating a disc, laser radiating optical portion for radiating laser lights on the disc rotated by the rotating portion under predetermined scanning conditions, sensors for detecting reflected laser lights from the disc, and a memory in which output signals of the sensors are stored together with address data generated in unison with the scanning of laser lights. Sensor outputs indicative of address positions of the disc are stored in the memory and sensor outputs near the address positions are read out and a defect of the disc is detected on the basis of a spatial difference among the nearby sensor outputs and the sensor output of the center address position.

摘要翻译： 可以高精度地检测光盘等光盘的缺陷的光盘缺陷检查装置。 盘缺陷检查装置包括用于旋转盘的旋转部分，用于在预定扫描条件下由旋转部旋转的盘上的激光照射激光辐射光学部分，用于检测来自盘的反射激光的传感器，以及存储器，其中 传感器的输出信号与激光扫描一致生成的地址数据一起存储。 表示盘的地址位置的传感器输出被存储在存储器中，并且读出地址位置附近的传感器输出，并且基于附近的传感器输出和传感器输出之间的空间差来检测盘的缺陷 中心地址位置。

公开(公告)号：US5800964A

公开(公告)日：1998-09-01

申请号：US717779

申请日：1996-09-24

申请人： Mitsuru Sato ,  Kazuyuki Nitta ,  Hideo Hada ,  Tatsuya Hashiguchi ,  Hiroshi Komano ,  Toshimasa Nakayama

发明人： Mitsuru Sato ,  Kazuyuki Nitta ,  Hideo Hada ,  Tatsuya Hashiguchi ,  Hiroshi Komano ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： Disclosed is a novel and improved photoresist composition which comprises: (A) a film-forming resinous compound which is, in the presence of an acid, subject to a change in the solubility in an alkaline solution; and (B) an acid-generating agent capable of releasing an acid by the exposure to actinic rays which is an oxime sulfonate compound represented by the general formula NC--CR.sup.1 .dbd.N--O--SO.sub.2 --R.sup.2, in which R.sup.1 and R.sup.2 are, each independently from the other, an unsubstituted or halogen-substituted monovalent aliphatic hydrocarbon group, e.g., alkyl, cycloalkyl, alkenyl and cycloalkenyl groups. By virtue of the non-aromatic nature of the component (B) as well as good solubility thereof in organic solvents and high acid strength of the acid released therefrom, the composition is highly transparent to deep ultraviolet light even when the content of the component (B) is relatively large and the photosensitivity of the composition is very high so that the photoresist composition is capable of giving a patterned resist layer having excellent characteristics.

摘要翻译： 公开了一种新颖且改进的光致抗蚀剂组合物，其包含：（A）在酸存在下，在碱溶液中溶解度变化的成膜树脂化合物; 和（B）能够通过暴露于由通式NC-CR1 = NO-SO2-R2表示的肟磺酸盐化合物的光化射线释放酸的酸产生剂，其中R 1和R 2各自独立地为 另一个，未取代或卤素取代的一价脂族烃基，例如烷基，环烷基，烯基和环烯基。 由于组分（B）的非芳香性质以及其在有机溶剂中的良好溶解性和从其释放的酸的高酸强度，组合物对于深紫外光是高度透明的，即使组分（ B）相对较大并且组合物的光敏性非常高，使得光致抗蚀剂组合物能够提供具有优异特性的图案化抗蚀剂层。

公开(公告)号：US5778285A

公开(公告)日：1998-07-07

申请号：US874714

申请日：1997-06-13

申请人： Akira Nagahara ,  Sachio Sasaki ,  Mitsuhito Furukawa ,  Shigenobu Utaka ,  Yoshio Yamaguchi ,  Mitsuru Sato ,  Nobuo Kuwabara ,  Haruyasu Watanabe ,  Takefumi Takahashi

发明人： Akira Nagahara ,  Sachio Sasaki ,  Mitsuhito Furukawa ,  Shigenobu Utaka ,  Yoshio Yamaguchi ,  Mitsuru Sato ,  Nobuo Kuwabara ,  Haruyasu Watanabe ,  Takefumi Takahashi

IPC分类号： G03G21/10 ,  G03G15/08 ,  G03G21/00 ,  G03G21/06 ,  G03G15/24

CPC分类号： G03G21/0005 ,  G03G21/0064 ,  G03G2215/0609 ,  G03G2221/0005 ,  G03G2221/0042 ,  G03G2221/0063 ,  G03G2221/0089

摘要： An image forming apparatus which collects residual toners on a latent image carrier in a developing unit. The image forming apparatus have a rotary endless latent image carrier; an image forming unit for forming an electrostatic latent image on the latent image carrier; a developing unit for developing the electrostatic latent image on the latent image carrier with a powdery developer and collecting residual toners on the latent image carrier at a same time; a transfer unit for transferring the developed image on the latent image carrier onto a sheet; a distribution member for distributing residual toners on the latent image carrier when in contact with the latent image carrier after image transfer; and a voltage supplying unit for supplying an AC voltage to the distribution member. An image forming apparatus according to another aspect have a rotary endless latent image carrier; an image forming unit for forming an electrostatic latent image on the latent image carrier; a developing unit for developing the electrostatic latent image on the latent image carrier with a powdery developer and collecting residual toners on the latent image carrier at a same time; a transfer unit for transferring the developed image on the latent image carrier onto a sheet; and a distribution roller for distributing residual toners on the latent image carrier when in contact with the latent image carrier after image transfer.

摘要翻译： 一种在显影单元中的潜像载体上收集残留调色剂的图像形成装置。 图像形成装置具有旋转式无端潜像载体; 用于在潜像载体上形成静电潜像的图像形成单元; 显影单元，用于用粉末显影剂在潜像载体上显影静电潜像，同时在潜像载体上收集残留的调色剂; 转印单元，用于将潜像载体上的显影图像转印到纸上; 分配构件，用于在图像转印之后与潜像载体接触时将残留调色剂分配在潜像载体上; 以及用于向分配构件提供AC电压的电压提供单元。 根据另一方面的图像形成装置具有旋转环形潜像载体; 用于在潜像载体上形成静电潜像的图像形成单元; 显影单元，用于用粉末显影剂在潜像载体上显影静电潜像，同时在潜像载体上收集残留的调色剂; 转印单元，用于将潜像载体上的显影图像转印到纸上; 以及分配辊，用于在图像转印之后与潜像载体接触时将残留调色剂分配在潜像载体上。

公开(公告)号：US5658681A

公开(公告)日：1997-08-19

申请号：US534583

申请日：1995-09-27

申请人： Mitsuru Sato ,  Koichi Shiraishi

发明人： Mitsuru Sato ,  Koichi Shiraishi

IPC分类号： H01M8/10 ,  B60K1/04 ,  C01B3/48 ,  C01B3/58 ,  H01M8/04 ,  H01M8/06

CPC分类号： H01M8/0668 ,  B60K1/04 ,  C01B3/48 ,  C01B3/583 ,  H01M8/04373 ,  H01M8/04425 ,  H01M8/04619 ,  H01M8/04776 ,  H01M8/0494 ,  H01M8/0612 ,  C01B2203/0233 ,  C01B2203/0283 ,  C01B2203/044 ,  C01B2203/047 ,  C01B2203/0495 ,  C01B2203/066 ,  C01B2203/0811 ,  C01B2203/0822 ,  C01B2203/0883 ,  C01B2203/1076 ,  C01B2203/1223 ,  C01B2203/1288 ,  C01B2203/145 ,  C01B2203/146 ,  C01B2203/16 ,  C01B2203/1619 ,  C01B2203/1685 ,  C01B2203/82 ,  H01M2300/0082 ,  H01M8/04089 ,  H01M8/04753 ,  Y02P20/128

摘要： A fuel cell power generation system including a reforming reactor for reacting a fuel with water to produce a hydrogen-rich reformed gas including carbon monoxide; a CO shift reactor for carrying out a CO shift reaction to decrease the concentration of carbon monoxide in the reformed gas; a CO removal reactor for oxidizing carbon monoxide in the reformed gas to carbon dioxide; and a fuel cell for generating electric power by reaction of the reformed gas with a gaseous oxidizing agent. Processors determine output required of the fuel cell and a proper space velocity for reformed gas entering the CO removal means, based on input values for the amount of the reformed gas fed to the CO removal means and the determined output required of the fuel cell.

摘要翻译： 一种燃料电池发电系统，包括用于使燃料与水反应以产生包含一氧化碳的富氢重整气体的重整反应器; CO转化反应器，用于进行CO转化反应以降低重整气体中一氧化碳的浓度; 用于将重整气体中的一氧化碳氧化成二氧化碳的CO去除反应器; 以及燃料电池，用于通过重整气与气态氧化剂的反应发电。 基于输入到CO去除装置的重整气体的量的输入值和燃料电池所需的确定的输出，处理器确定燃料电池所需的输出和进入CO去除装置的重整气体的适当空间速度。