公开(公告)号：US20230096368A1

公开(公告)日：2023-03-30

申请号：US17485243

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Aleksandar Aleksov ,  Adel Elsherbini ,  Johanna Swan ,  Feras Eid ,  Thomas L. Sounart ,  Henning Braunisch ,  Beomseok Choi ,  Krishna Bharath ,  Kaladhar Radhakrishnan ,  William J. Lambert

IPC: H01L49/02 ,  H01F27/255 ,  H01F27/28 ,  H01F41/04 ,  H01F41/02 ,  H01L23/498 ,  H01L23/64 ,  H01L21/48

Abstract: An inductor structure, a package substrate, an integrated circuit device, an integrated circuit device assembly and a method of fabricating the inductor structure. The inductor structure includes: an electrically conductive body; and a magnetic structure including a non-electrically-conductive magnetic material, wherein: one of the magnetic structure or the electrically conductive body wraps around another one of the magnetic structure or the electrically conductive body to form the inductor structure therewith; and at least one of the electrically conductive body or the magnetic structure has a granular microstructure including randomly distributed particles presenting substantially non-linear particle-to-particle boundaries with one another.

公开(公告)号：US20230095063A1

公开(公告)日：2023-03-30

申请号：US17484286

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Beomseok Choi ,  William J. Lambert ,  Krishna Bharath ,  Kaladhar Radhakrishnan ,  Adel Elsherbini ,  Henning Braunisch ,  Stephen Morein ,  Aleksandar Aleksov ,  Feras Eid

IPC: G05F1/44 ,  H01L23/50 ,  H01L25/065

Abstract: In one embodiment, an apparatus includes a first die with voltage regulator circuitry and a second die with logic circuitry. The apparatus further includes an inductor, a capacitor, and a conformal power delivery structure on the top side of the apparatus, where the voltage regulator circuitry is connected to the logic circuitry through the inductor, the capacitor, and the conformal power delivery structure. The conformal power delivery structure includes a first electrically conductive layer defining one or more recesses, a second electrically conductive layer at least partially within the recesses of the first electrically conductive layer and having a lower surface that generally conforms with the upper surface of the first electrically conductive layer, and a dielectric material between the surfaces of the first electrically conductive layer and the second electrically conductive layer that conform with one another.

公开(公告)号：US11615998B2

公开(公告)日：2023-03-28

申请号：US16129243

申请日：2018-09-12

Applicant: Intel Corporation

Inventor： Johanna Swan ,  Feras Eid ,  Adel Elsherbini

IPC: H01L23/367 ,  H01L23/498 ,  H01L23/42 ,  H01L23/00 ,  H01L21/48

Abstract: An integrated circuit structure may be formed having a substrate, at least one integrated circuit device embedded in and electrically attached to the substrate, and a heat dissipation device in thermal contact with the integrated circuit device, wherein a first portion of the heat dissipation device extends into the substrate and wherein a second portion of the heat dissipation device extends over the substrate. In one embodiment, the heat dissipation device may comprise the first portion of the heat dissipation device formed from metallization within the substrate.

公开(公告)号：US20220416393A1

公开(公告)日：2022-12-29

申请号：US17359138

申请日：2021-06-25

Applicant: Intel Corporation

Inventor： Georgios Dogiamis ,  Johanna Swan ,  Adel Elsherbini ,  Shawna Liff ,  Beomseok Choi ,  Qiang Yu

IPC: H01P3/16 ,  H01L25/065 ,  H01P1/208 ,  H01L23/538 ,  H01P5/107 ,  H01L23/66

Abstract: Waveguide interconnects for semiconductor packages are disclosed. An example semiconductor package includes a first semiconductor die, a second semiconductor die, and a substrate positioned between the first and second dies. The substrate includes a waveguide interconnect to provide a communication channel to carry an electromagnetic signal. The waveguide interconnect is defined by a plurality of through substrate vias (TSVs). The TSVs in a pattern around the at least the portion of the substrate to define a boundary of the communication channel.

公开(公告)号：US20220415853A1

公开(公告)日：2022-12-29

申请号：US17358948

申请日：2021-06-25

Applicant: Intel Corporation

Inventor： Aleksandar Aleksov ,  Johanna Swan ,  Shawna Liff ,  Feras Eid ,  Adel Elsherbini ,  Julien Sebot

IPC: H01L25/065 ,  H01L25/18 ,  H01L23/00 ,  H01L25/00

Abstract: A composite integrated circuit (IC) structure includes at least a first IC die in a stack with a second IC die. Each die has a device layer and metallization layers interconnected to transistors of the device layer and terminating at features. First features of the first IC die are primarily of a first composition with a first microstructure. Second features of the second IC die are primarily of a second composition or a second microstructure. A first one of the second features is in direct contact with one of the first features. The second composition has a thermal conductivity at least an order of magnitude lower than that of the first composition and first microstructure. The first composition may have a thermal conductivity at least 40 times that of the second composition or second microstructure.

公开(公告)号：US20220084949A1

公开(公告)日：2022-03-17

申请号：US17536804

申请日：2021-11-29

Applicant: INTEL CORPORATION

Inventor： Adel Elsherbini ,  Shawna Liff ,  Johanna Swan ,  Gerald Pasdast

IPC: H01L23/538 ,  H01L21/304 ,  H01L21/48 ,  H01L23/00

Abstract: Techniques and mechanisms for high interconnect density communication with an interposer. In some embodiments, an interposer comprises a substrate and portions disposed thereon, wherein respective inorganic dielectrics of said portions adjoin each other at a material interface, which extends to each of the substrate and a first side of the interposer. A first hardware interface of the interposer spans the material interface at the first side, wherein a first one of said portions comprises first interconnects which couple the first hardware interface to a second hardware interface at the first side. A second one of said portions includes second interconnects which couple one of first hardware interface or the second hardware interface to a third hardware interface at another side of the interposer. In another embodiment, a metallization pitch feature of the first hardware interface is smaller than a corresponding metallization pitch feature of the second hardware interface.

公开(公告)号：US11234343B2

公开(公告)日：2022-01-25

申请号：US15970420

申请日：2018-05-03

Applicant: Intel Corporation

Inventor： Feras Eid ,  Adel Elsherbini ,  Johanna Swan

IPC: H05K7/20 ,  H01L25/065 ,  H01L23/427 ,  H01L23/367 ,  H01L23/00

Abstract: An integrated circuit structure may be formed having a first integrated circuit device, a second integrated circuit device electrically coupled to the first integrated circuit device, and at least one unidirectional heat transfer device between the first integrated circuit device and the second integrated circuit device. In one embodiment, the unidirectional heat transfer device may be oriented such that it has a higher conductivity in the direction of heat transfer from the first integrated circuit device to the second integrated circuit device than it does in the opposite direction. When the temperature of the second integrated circuit device rises above the temperature of the first integrated circuit device, the unidirectional heat transfer device will act as a thermal insulator, and when the temperature of the first integrated circuit device rises above the temperature of the second integrated circuit device, the unidirectional heat transfer device will act as a thermal conductor.

公开(公告)号：US20210407903A1

公开(公告)日：2021-12-30

申请号：US16914062

申请日：2020-06-26

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Feras Eid ,  Georgios Dogiamis ,  Henning Braunisch ,  Beomseok Choi ,  William J. Lambert ,  Stephen Morein ,  Ahmed Abou-Alfotouh ,  Johanna Swan

IPC: H01L23/522 ,  H01L23/532 ,  H05K1/11 ,  H05K3/14 ,  H01L21/768

Abstract: An integrated circuit (IC) die package substrate comprises a first trace upon, or embedded within, a dielectric material. The first trace comprises a first metal and a first via coupled to the first trace. The first via comprises the first metal and a second trace upon, or embedded within, the dielectric material. A second via is coupled to the second trace, and at least one of the second trace or the second via comprises a second metal with a different microstructure or composition than the first metal.

公开(公告)号：US20210407888A1

公开(公告)日：2021-12-30

申请号：US16914066

申请日：2020-06-26

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Stephen Morein ,  Feras Eid ,  Georgios Dogiamis

IPC: H01L23/467 ,  B01F13/00 ,  C23C24/04 ,  H01L23/473

Abstract: A microfluidic device having a channel within a first material to thermally couple with an IC die. The channel defines an initial fluid path between a fluid inlet port and a fluid outlet port. A second material is within a portion of the channel. The second material supplements the first material to modify the initial fluid path into a final fluid path between the fluid inlet port and the fluid outlet port. The second material may have a different composition and/or microstructure than the first material.

公开(公告)号：US20210398715A1

公开(公告)日：2021-12-23

申请号：US16909264

申请日：2020-06-23

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Feras Eid ,  Johanna Swan ,  Georgios Dogiamis

IPC: H01B13/00 ,  H01B13/22 ,  H01L21/768 ,  H01B7/00 ,  H01B7/18

Abstract: Cables, cable connectors, and support structures for cantilever package and/or cable attachment may be fabricated using additive processes, such as a coldspray technique, for integrated circuit assemblies. In one embodiment, cable connectors may be additively fabricated directly on an electronic substrate. In another embodiment, seam lines of cables and/or between cables and cable connectors may be additively fused. In a further embodiment, integrated circuit assembly attachment and/or cable attachment support structures may be additively formed on an integrated circuit assembly.