公开(公告)号：US06906782B2

公开(公告)日：2005-06-14

申请号：US10347688

申请日：2003-01-22

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03F7/20 ,  H01L21/68 ,  G03B27/42 ,  G03B27/58 ,  G03B27/76

CPC分类号： G03F7/70708 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70775 ,  H01L21/681

摘要： An exposure apparatus has a triangular shaped stage which is movable in a two-dimensional plane while holding a substrate. The stage has a reflecting surface provided on a side face of the stage so that the surface extends in a specific direction intersecting Y axis and X axis. An interferometer radiates a beam onto the reflecting surface to measure a position of the stage in a direction perpendicular to the specific direction. Using the measured position and an angle of the specific direction, a calculator can calculate the position of the stage on rectangular coordinate system defined by X and Y axes. The size and weight of the stage can be reduced, and the throughput of the exposure apparatus is improved.

摘要翻译： 曝光装置具有三角形台，其可以在保持基板的同时在二维平面中移动。 舞台具有设置在舞台的侧面上的反射面，使得表面沿与Y轴和X轴交叉的特定方向延伸。 干涉仪将光束辐射到反射表面上以在垂直于特定方向的方向上测量舞台的位置。 使用测量位置和特定方向的角度，计算器可以计算由X轴和Y轴定义的直角坐标系上的平台位置。 可以减小舞台的尺寸和重量，并且提高曝光装置的生产量。

公开(公告)号：US06870598B2

公开(公告)日：2005-03-22

申请号：US10378932

申请日：2003-03-05

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03F7/20 ,  G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70225 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70833 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70891 ,  G03F7/70925 ,  G03F7/70958

摘要： A projection optical system includes a first objective portion and an optical axis turn portion, each having an optical axis perpendicular to a reticle; an optical axis deflecting portion having an optical axis perpendicularly intersecting the above optical axis; and a second objective portion having an optical axis parallel to the above optical axis. An image-forming light beam from the reticle is returned toward the reticle by the first objective portion and a concave mirror provided in the optical axis turn portion to form a one-to-one image of the reticle. The returned image-forming light beam is led to the second objective portion through the optical axis deflecting portion to form a demagnified image on a wafer.

摘要翻译： 投影光学系统包括：第一物镜部分和光轴转向部分，每个具有垂直于光罩的光轴; 具有与上述光轴垂直相交的光轴的光轴偏转部; 以及具有平行于上述光轴的光轴的第二物镜部分。 来自光掩模的图像形成光束通过设置在光轴转向部分中的第一物镜部分和凹面镜返回到掩模版，以形成掩模版的一对一图像。 返回的图像形成光束通过光轴偏转部分被引导到第二物镜部分，以在晶片上形成缩小的图像。

公开(公告)号：US06864955B2

公开(公告)日：2005-03-08

申请号：US10361495

申请日：2003-02-11

申请人： Kenji Nishi ,  Toru Kiuchi

发明人： Kenji Nishi ,  Toru Kiuchi

IPC分类号： B23Q1/00 ,  B23Q1/26 ,  B23Q1/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  G03B27/42 ,  G03B27/60 ,  G03B27/64

CPC分类号： G03F7/70708 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70991 ,  H01L21/68

摘要： The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.

摘要翻译： 平台装置具有可移动的平台结构体，其保持待加工的基板并且能够在基体结构体上移动。 这种舞台装置包括设置在设置在所述舞台结构体的流体路径的至少一部分处的收据边缘孔口; 以及进给边缘孔口，其在所述接收边缘孔口处可拆卸地接合在基座结构体上的预定位置处，并且在所述进料边缘孔口与所述接收边缘孔口接合期间将预定流体提供或排出到接收边缘孔口。

公开(公告)号：US06765647B1

公开(公告)日：2004-07-20

申请号：US09856051

申请日：2001-05-17

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2752

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F9/7026 ,  G03F9/7034

摘要： An exposure method, wherein a defocus quantity on the surface of a substrate to be exposed with respect to an image plane of a projection optical system is detected highly accurately even during exposing without lowering throughput much and focusing is made with an automatic focusing method. A first oblique-incident AF sensor including an illumination slit unit (54a) through an optical member (63a) and a second oblique-incident AF sensor including an illumination slit unit (54b) through an optical member (63b) are used to apply slit images (F1f, F2f) onto common measuring points and focus positions are measured respectively. One half of the difference between the two measured values is regarded as a drift and the drift is corrected for values measured by the AF sensors; the first or second AF sensor is then used to perform a focusing by the automatic focusing method.

摘要翻译： 一种曝光方法，其中即使在曝光期间也能够高精度地检测相对于投影光学系统的像面而要曝光的基板的表面上的散焦量，而不会降低生产量，并且利用自动聚焦方法进行聚焦。 使用包括通过光学构件（63a）的照明狭缝单元（54a）和通过光学构件（63b）包括照明狭缝单元（54b）的第二倾斜入射AF传感器的第一倾斜入射AF传感器施加狭缝 分别测量图像（F1f，F2f）到公共测量点和对焦位置。 将两个测量值之间的差值的一半视为漂移，并且通过AF传感器测量的值校正漂移; 然后使用第一或第二AF传感器通过自动聚焦方法进行聚焦。

公开(公告)号：US06707536B2

公开(公告)日：2004-03-16

申请号：US10199324

申请日：2002-07-22

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2742

CPC分类号： G03F7/70066 ,  G03F7/70358 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/70691 ,  G03F7/70858 ,  G03F7/70883

摘要： In a scanning exposure apparatus and method, first and second interferometers of an interferometer system monitor first and second stages of a stage system, one of which holds a mask and the other of which holds a substrate. The first stage is moved at a first scanning speed during scanning exposure, and the second stage is moved at a second scanning speed during the scanning exposure, the speeds differing in accordance with a projecting magnification of a projection unit. The first stage is moved in accordance with a deviation, obtained by using the interferometer system, between the first stage and the second stage in a direction other than the scanning direction during the scanning exposure.

摘要翻译： 在扫描曝光装置和方法中，干涉仪系统的第一和第二干涉仪监视舞台系统的第一和第二阶段，其中一个保持掩模，另一个保持基板。 在扫描曝光期间，第一阶段以第一扫描速度移动，并且在扫描曝光期间第二阶段以第二扫描速度移动，速度根据投影单元的投影倍率而不同。 在扫描曝光期间，第一阶段根据通过使用干涉仪系统获得的在扫描方向以外的方向在第一阶段和第二阶段之间的偏差移动。

公开(公告)号：US06667796B1

公开(公告)日：2003-12-23

申请号：US09712843

申请日：2000-11-15

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2752

CPC分类号： G03F7/70225 ,  G03F7/2006 ,  G03F7/70833 ,  G03F7/70883 ,  G03F7/70891

摘要： A pattern of a reticle is irradiated with excimer laser light to expose an image of the pattern of the reticle onto a wafer through a projection optical system. Driving elements for driving optical elements in the projection optical system and a transfer mechanism for transferring a pupil filter into the projection optical system are covered by covers to isolate the inside of the projection optical system from its outside. During exposure, helium gas is supplied to the inside of the projection optical system with a purity and a temperature of the helium gas being continuously monitored and the purity and the temperature of the helium gas in the projection optical system being maintained within a predetermined tolerance range based upon the monitored results.

摘要翻译： 用准分子激光照射掩模版的图案，通过投影光学系统将掩模版的图案的图像曝光到晶片上。 用于驱动投影光学系统中的光学元件的驱动元件和用于将瞳孔滤光片传送到投影光学系统的传送机构被盖覆盖，以将投影光学系统的内部与其外部隔离。 在曝光期间，氦气被提供到投影光学系统的内部，其中氦气的纯度和温度被连续监测，并且投影光学系统中的氦气的纯度和温度保持在预定的公差范围内 基于监测结果。

公开(公告)号：US06654097B1

公开(公告)日：2003-11-25

申请号：US09672784

申请日：2000-09-29

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/70 ,  G03F9/7015

摘要： Provided is a position detector for use in a projection exposure apparatus to detect a position of a focused image plane at which a focused image of a mask pattern is formed by a radiation flux through a projection optical system having an optical axis. The position detector includes a plurality of reference marks disposed in a first direction with predetermined spacings at a position at which the mask pattern is to be placed, the radiation flux illuminating the plurality of reference marks, and thereafter entering the projection optical system to form images of the plurality of reference marks in the focused image plane, the images being arranged in a second direction substantially perpendicular to the optical axis of the projection optical system, and spacings of the images being determined by the predetermined spacings of reference marks; a radiation receiver having a receiving area movable relative to the images of the reference marks to scan the plurality of images successively, the radiation receiver outputting a reception signal indicating the amount of the radiation flux received at the receiving area, the receiving area being smaller than the spacings separating the images of reference marks adjacent in the first direction; a position detector outputting a position signal indicating the position of the receiving area; and a calculation unit processing the reception signal and the position signal to derive the positions of the images of the reference marks.

摘要翻译： 提供一种用于投影曝光装置的位置检测器，用于检测通过具有光轴的投影光学系统的辐射通量形成掩模图案的聚焦图像的聚焦图像平面的位置。 所述位置检测器包括多个参考标记，所述多个参考标记沿着第一方向设置，在要放置所述掩模图案的位置处具有预定间隔，所述辐射通量照射所述多个参考标记，然后进入所述投影光学系统以形成图像 在所述聚焦图像平面中的所述多个参考标记中，所述图像被布置在基本上垂直于所述投影光学系统的光轴的第二方向上，并且所述图像的间隔由参考标记的预定间隔确定; 辐射接收器具有相对于参考标记的图像可移动的接收区域，以连续扫描多个图像，辐射接收器输出指示在接收区域接收的辐射量的接收信号，接收区域小于 分离在第一方向上相邻的参考标记的图像的间隔; 位置检测器，输出指示接收区域的位置的位置信号; 以及计算单元，处理接收信号和位置信号以导出参考标记的图像的位置。

公开(公告)号：US06654095B1

公开(公告)日：2003-11-25

申请号：US09690729

申请日：2000-10-18

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2752

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

摘要： The apparatus comprises the first air conditioning room which includes the edge surface of the image plane side of the projection optical system and the substrate stage and its driving unit, the second air conditioning room which includes the edge surface of the object surface side of the projection optical system and the mask stage and its driving unit, the third air conditioning room which includes the projection optical system, and the fourth air conditioning room which includes the illumination optical system. It also comprises the first air conditioning control unit, which supplies helium gas of a moderate level to the first and second air conditioning rooms, and the second air conditioning control unit, which supplies helium gas with a high purity level to the third and fourth air conditioning rooms. Accordingly, the first and second air conditioning control units independently control the airflow and the contamination of the respective rooms by using gases for air conditioning corresponding to the performance required. Thus, various ideal controls can be performed independently.

摘要翻译： 该装置包括第一空调室，其包括投影光学系统的像面侧的边缘表面和基板台及其驱动单元，第二空调室包括投影物表面侧的边缘表面 光学系统和掩模台及其驱动单元，包括投影光学系统的第三空调室和包括照明光学系统的第四空调室。 它还包括向第一和第二空调室供应中等水平的氦气的第一空调控制单元和向第三和第四空气供应具有高纯度水平的氦气的第二空调控制单元 空调房间。 因此，第一和第二空调控制单元通过使用对应于所需性能的空气调节气体独立地控制各个房间的气流和污染。 因此，可以独立地执行各种理想控制。

公开(公告)号：US06653025B2

公开(公告)日：2003-11-25

申请号：US09736423

申请日：2000-12-15

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03F900

CPC分类号： G03F7/70733 ,  G03F7/70358 ,  G03F7/70475

摘要： A pattern region of a working reticle is divided into existing pattern portions and newly-forming pattern portions. With respect to the existing pattern portions, already-formed master reticle patterns are reduction-projected while stitching screens using an optical-type projection exposure apparatus. With respect to the newly-forming portions, enlarged patterns are formed by an electron beam drawing apparatus to form new master reticles, and reduced images of the newly formed master reticles are exposed while stitching screens using an optical-type projection exposure apparatus.

摘要翻译： 作业掩模版的图案区域被划分为现有图案部分和新形成图案部分。 对于现有的图案部分，已经形成的主掩模图案使用光学型投影曝光装置在缝合屏幕的同时进行缩小投影。 对于新形成部分，通过电子束描绘装置形成放大的图案，以形成新的主标线，并且使用光学型投影曝光装置在缝合屏幕的同时露出新形成的主标线的缩小的图像。

公开(公告)号：US06608665B1

公开(公告)日：2003-08-19

申请号：US09523304

申请日：2000-03-10

申请人： Kenji Nishi ,  Kazuaki Suzuki

发明人： Kenji Nishi ,  Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70433 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/701 ,  G03F7/702 ,  G03F7/70358 ,  G03F7/70558

摘要： In a projection exposure apparatus for transferring a pattern formed in a transfer area on a mask onto a photosensitive substrate by a scanning exposure system, provision is made of an illuminating optical system for applying illuminating light to the transfer area of the mask through a rectangular aperture in a field stop disposed apart from a plane conjugate with the pattern surface of the mask, and a light intercepting member having an aperture of which the width is variable in the direction of the relative scanning of the mask and the photosensitive substrate for shielding at least a part of an illumination area on the mask which is defined by the rectangular aperture in the field stop from the light, and provision is further made of a member for driving the light intercepting member so as to change the width of the aperture therein in operative association with a change in the position of the illumination area on the transfer area of the mask which is changed by the relative scanning.

摘要翻译： 在通过扫描曝光系统将形成在掩模上的转印区域中的图案转印到感光基板上的投影曝光装置中，提供照明光学系统，用于通过矩形孔将照明光施加到掩模的转印区域 在与掩模的图案表面共轭的平面上设置的场停止器中，以及具有孔径的遮光构件，该遮光构件的宽度在掩模和感光基板的相对扫描方向上可变，以至少屏蔽 由场中的矩形孔限定的掩模上的照明区域的一部分从光中停止，并且进一步设置用于驱动遮光构件的构件，以便在其中改变其中的孔的宽度 与通过相对扫描改变的掩模的转印区域上的照明区域的位置的变化相关联 ing。