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    Process for the direct synthesis of trialkoxysilane
    132.
    发明授权
    Process for the direct synthesis of trialkoxysilane 有权
    直接合成三烷氧基硅烷的方法

    公开(公告)号：US07429672B2

    公开(公告)日：2008-09-30

    申请号：US11450538

    申请日：2006-06-09

    Applicant: Kenrick M. Lewis ,  Rudolph A. Cameron ,  Karen Ritscher, legal representative

    Inventor： James S. Ritscher

    IPC: C07F7/08 ,  C07F7/18

    CPC classification number: C07F7/025

    Abstract: This invention discloses a process to improve reaction stability in the Direct Synthesis of trialkoxysilanes. The process is particularly effective in the Direct Synthesis of triethoxysilane and its higher alkyl cognates providing improved triethoxysilane yields.

    Abstract translation: 本发明公开了一种提高直链合成三烷氧基硅烷反应稳定性的方法。 该方法在直接合成三乙氧基硅烷及其较高级的烷基同源物中提供改善的三乙氧基硅烷产率特别有效。

    Cosmetic compositions using polyether siloxane copolymer network compositions
    136.
    发明授权
    Cosmetic compositions using polyether siloxane copolymer network compositions 有权

    公开(公告)号：US07381769B2

    公开(公告)日：2008-06-03

    申请号：US11115683

    申请日：2005-04-27

    Applicant: Michael Joseph O'Brien

    Inventor： Michael Joseph O'Brien

    IPC: C08L83/04

    CPC classification number: A61K8/891 ,  A61K8/02 ,  A61K8/042 ,  A61K8/894 ,  A61K2800/54 ,  A61K2800/56 ,  A61Q1/02 ,  A61Q1/04 ,  A61Q1/06 ,  A61Q5/12 ,  A61Q15/00 ,  A61Q19/00

    Abstract: A composition comprising the reaction products of MaMHbMEcDdDHeDEfTgTHhTEiQj where M=R1R2R3SiO1/2; MH=R4R5HSiO1/2; ME=R6R7RESiO1/2; D=R8R9SiO2/2; DH=R10HSiO2/2; DE=R11RESiO2/2; T=R12SiO3/2; TH=HSiO3/2; TE=RESiO3/2; and Q=SiO4/2; where R1, R2, R3, R8, R9 and R12 are independently monovalent hydrocarbon radicals having from one to sixty carbon atoms; R4, R5 and R10 are independently monovalent hydrocarbon radicals having from one to sixty carbon atoms or hydrogen; R6, R7, R11 are independently monovalent hydrocarbon radicals having from one to sixty carbon atoms or RE; each RE is independently a monovalent hydrocarbon radical containing one or more oxirane moieties having from one to sixty carbon atoms; the stoichiometric subscripts a, b, c, d, e, f, g, h, i, and j are either zero or positive subject to the following limitations: a+b+c>1; b+e+h>1; c+f+i>1; b+e+h>c+f+i; and when d+e+f+g+h+i+j=0, a+b+c=2 wherein said reaction product is prepared in the presence of a surfactant. In a preferred embodiment the reaction product of the present invention is a polyether siloxane copolymer network. In another preferred embodiment the reaction product of the present invention is a polyether siloxane copolymer network swollen with a volatile low molecular weight silicon containing compound. These compositions are useful for a variety of personal care compositions.

    Process for the recovery of alkoxysilanes obtained from the direct reaction of silicon with alkanols
    137.
    发明授权
    Process for the recovery of alkoxysilanes obtained from the direct reaction of silicon with alkanols 有权
    由硅与烷醇的直接反应获得的烷氧基硅烷的回收方法

    公开(公告)号：US07365220B2

    公开(公告)日：2008-04-29

    申请号：US11238199

    申请日：2005-09-29

    Applicant: Kenrick Martin Lewis ,  Hua Wang

    Inventor： Kenrick Martin Lewis ,  Hua Wang

    IPC: C07F7/04

    CPC classification number: C07F7/025

    Abstract: A process is provided for separating a mixture of alkoxysilanes and alkanol, e.g., the crude product effluent of the Direct Reaction of silicon metal with alkanol, which comprises: a) introducing a mixture of alkoxysilane(s) and alkanol to a separation unit possessing a separation membrane having a first surface and an opposing second surface; b) contacting the mixture of alkoxysilane(s) and alkanol with the first surface of the separation membrane whereby one or more components of the mixture selectively absorb into the first surface and permeate therethrough to the second surface under the influence of a concentration gradient across the membrane thereby separating the mixture into an alkanol-enriched permeate fraction and an alkanol-deficient retentate fraction or an alkoxysilane-enriched permeate fraction and an alkoxysilane-deficient retentate fraction; and, c) recovering the permeate fraction.

    Abstract translation: 提供了一种用于分离烷氧基硅烷和链烷醇的混合物的方法，例如硅金属与烷醇的直接反应的粗产物流出物，其包括：a）将烷氧基硅烷和烷醇的混合物引入到具有 分离膜具有第一表面和相对的第二表面; b）使烷氧基硅烷和链烷醇的混合物与分离膜的第一表面接触，由此混合物中的一种或多种组分选择性地吸收到第一表面中并在跨越第一表面的浓度梯度的影响下渗透到第二表面 从而将混合物分离成富含链烷醇的渗透物馏分和链烷醇缺乏的滞留物部分或富含烷氧基硅烷的渗透物部分和烷氧基硅烷缺乏的滞留物部分; 和c）回收渗透部分。

    Wafer handling apparatus and method of manufacturing thereof
    138.
    发明授权
    Wafer handling apparatus and method of manufacturing thereof 失效
    晶片处理装置及其制造方法

    公开(公告)号：US07364624B2

    公开(公告)日：2008-04-29

    申请号：US10759582

    申请日：2004-01-16

    Applicant: John Thomas Mariner ,  Timothy J. Hejl ,  Douglas Alan Longworth ,  Jeffrey Lennartz ,  Ajit Sane ,  Andrew John Macey ,  Jon Leist ,  Thomas E. Devan

    Inventor： John Thomas Mariner ,  Timothy J. Hejl ,  Douglas Alan Longworth ,  Jeffrey Lennartz ,  Ajit Sane ,  Andrew John Macey ,  Jon Leist ,  Thomas E. Devan

    IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC classification number: H01L21/67109 ,  C23C16/4581 ,  H01L21/67103 ,  H01L21/6833 ,  H01L21/68757 ,  H05B3/143

    Abstract: A wafer processing device or apparatus, i.e., a heater or an electrostatic chuck, comprises a planar support platen, a support shaft having centrally located bore, and a pair of electrical conductors located in the shaft. In one embodiment, the electrical conductors are concentrically located within the bore of the shaft, with the first electrical lead being in the form of a pyrolytic graphite rod and separated from the outer second graphite electrical lead by means of a pyrolytic boron nitride (pBN) coating. In a second embodiment, the support platen and the support shaft are formed from a single unitary body of graphite. In yet another embodiment of the device of the invention, the connection posts comprise a carbon fiber composite and the exposed ends of the electrical connectors are coated with a protective ceramic paste for extended life in operations.

    Abstract translation: 晶片处理装置或装置，即加热器或静电卡盘，包括平面支撑压板，具有居中定位的孔的支撑轴和位于轴中的一对电导体。 在一个实施例中，电导体同心地位于轴的孔内，其中第一电引线为热解石墨棒的形式，并通过热解氮化硼（pBN）与外部第二石墨电引线分离， 涂层。 在第二实施例中，支撑台板和支撑轴由单一的石墨单体形成。 在本发明的装置的另一个实施例中，连接柱包括碳纤维复合材料，并且电连接器的暴露端涂覆有保护性陶瓷膏，以在使用中延长寿命。

    Nanosized copper catalyst precursors for the direct synthesis of trialkoxysilanes
    139.
    发明授权
    Nanosized copper catalyst precursors for the direct synthesis of trialkoxysilanes 有权

    公开(公告)号：US07339068B2

    公开(公告)日：2008-03-04

    申请号：US09974092

    申请日：2001-10-09

    Applicant: Kenrick M. Lewis ,  Regina Nelson Eng ,  Sabrina R. Cromer ,  Abellard T. Mereigh ,  Chi-Lin O'Young

    Inventor： Kenrick M. Lewis ,  Regina Nelson Eng ,  Sabrina R. Cromer ,  Abellard T. Mereigh ,  Chi-Lin O'Young

    IPC: C07F7/04

    CPC classification number: C07F7/025

    Abstract: The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)3 wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 600 nanometers, preferably from about 0.1 to about 500 nanometers, and most preferably from about 0.1 to about 100 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.

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