VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD
    143.
    发明申请
    VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD 有权
    蒸气沉积装置和蒸气沉积方法

    公开(公告)号:US20130273746A1

    公开(公告)日:2013-10-17

    申请号:US13977645

    申请日:2011-12-28

    Abstract: A vapor deposition device (50) includes a mask (60) having periodic patterns, and only a region of the mask (60) where a one-period pattern is formed is exposed. A length of the mask base material along a direction perpendicular to a long-side direction of the mask base material is shorter than a length of a film formation substrate (200) along a direction of scanning of the film formation substrate (200). The mask (60) is provided so that the long-side direction of the mask base material is perpendicular to the direction of scanning and that the exposed region is allowed to move in a direction perpendicular to the direction of scanning by rotation of a wind-off roll (91) and a wind-up roll (92).

    Abstract translation: 气相沉积装置(50)包括具有周期性图案的掩模(60),并且仅露出形成有一个周期图案的掩模(60)的区域。 掩模基材沿着与掩模基材的长边方向垂直的方向的长度比成膜基板(200)沿着成膜基板(200)的扫描方向的长度短。 掩模(60)设置成使得掩模基材的长边方向垂直于扫描方向,并且允许暴露区域沿着与扫描方向垂直的方向移动, 卷筒(91)和卷绕辊(92)。

    VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
    144.
    发明申请
    VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE 有权
    蒸气沉积方法,蒸发沉积装置和有机EL显示装置

    公开(公告)号:US20130252353A1

    公开(公告)日:2013-09-26

    申请号:US13989053

    申请日:2011-12-13

    Abstract: A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space (82) between a plurality of limiting plates (81) of a limiting plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate while the substrate is moved relative to the vapor deposition mask in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. It is determined whether or not it is necessary to correct the position of at least one of the plurality of limiting plates in the X axis direction, and in the case where it is necessary to correct the position, the position of at least one of the plurality of limiting plates in the X axis direction is corrected. Accordingly, a coating film whose edge blur is suppressed can be stably formed at a desired position on a large-sized substrate.

    Abstract translation: 通过使从气相沉积源(60)的气相沉积源开口(61)排出的气相沉积颗粒(91)通过多个限制板(81)之间的空间(82)形成涂膜(90) )和气相沉积掩模的掩模开口(71),并且在衬底(10)的状态下,相对于气相沉积掩模移动衬底而粘附到衬底上, 并且气相沉积掩模(70)以固定的间隔间隔开。 确定是否需要校正多个限位板中的至少一个在X轴方向上的位置,并且在需要校正位置的情况下,至少一个限位板的位置 对X轴方向的多个限位板进行校正。 因此,可以在大尺寸基板的期望位置稳定地形成抑制边缘模糊的涂膜。

    THERAPEUTIC AGENT FOR NEUROLOGICAL DISEASES
    145.
    发明申请
    THERAPEUTIC AGENT FOR NEUROLOGICAL DISEASES 有权
    神经病变治疗药物

    公开(公告)号:US20130190363A1

    公开(公告)日:2013-07-25

    申请号:US13812726

    申请日:2011-07-15

    CPC classification number: C07D401/04 C07D233/88

    Abstract: An object of the present invention is to provide a pharmaceutical agent useful for treating and preventing neurological disease, having satisfactory solubility and oxidative stress-mediated cell death suppressive activity as well as capable of exhibiting excellent blood-brain barrier permeability. The present invention is directed to an acylaminoimidazole derivative represented by general formula (I) or a salt thereof, and a pharmaceutical and a therapeutic or preventive agent for neurological disease containing the same, as an active ingredient.

    Abstract translation: 本发明的目的是提供一种可用于治疗和预防神经疾病,具有令人满意的溶解性和氧化应激介导的细胞死亡抑制活性以及能够表现出优异的血脑屏障通透性的药剂。 本发明涉及由通式(I)表示的酰基氨基咪唑衍生物或其盐,以及含有该酰基氨基咪唑衍生物作为有效成分的药物及其神经病学治疗或预防剂。

    VAPOR DEPOSITION APPARATUS
    146.
    发明申请
    VAPOR DEPOSITION APPARATUS 有权
    蒸气沉积装置

    公开(公告)号:US20130186335A1

    公开(公告)日:2013-07-25

    申请号:US13876573

    申请日:2011-09-26

    Abstract: A vapor deposition apparatus (50) includes: a mask unit (54) including a vapor deposition source (70), a vapor deposition mask (60), and a mask holding member (80); a substrate holder (52); and at least either a mask unit moving mechanism (55) or a substrate moving mechanism (53), with a roller (83) provided in a surface of one of (A) the substrate holder (52) and (B) the mask holding member (80) which faces the other one of (A) the substrate holder (52) and (B) the mask holding member (80).

    Abstract translation: 气相沉积装置(50)包括:包括气相沉积源(70),气相沉积掩模(60)和掩模保持构件(80)的掩模单元(54); 衬底保持器(52); 以及至少一个掩模单元移动机构(55)或基板移动机构(53),其中设置在(A)基板保持器(52)和(B)中的一个的表面中的辊(83) (A)衬底保持器(52)和(B)掩模保持构件(80)中的另一个的构件(80)。

    VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
    147.
    发明申请
    VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE 有权
    蒸气沉积方法,蒸发沉积装置和有机EL显示装置

    公开(公告)号:US20130089941A1

    公开(公告)日:2013-04-11

    申请号:US13703873

    申请日:2011-08-17

    Abstract: A vapor deposition source (60), a plurality of control plates (80) and a vapor deposition mask (70) are disposed in this order. A substrate (10) is moved relative to the vapor deposition mask in a state in which the substrate and the vapor deposition mask are spaced apart at a fixed interval. Vapor deposition particles (91) discharged from a vapor deposition source opening (61) of the vapor deposition source pass through neighboring inter-control plate spaces (81) and mask openings (71) formed in the vapor deposition mask, and then adhere to the substrate to form a coating film (90). At least a part of the coating film is formed by the vapor deposition particles that have passed through two or more different inter-control plate spaces. It is thereby possible to form a coating film in which edge blur and variations in the thickness are suppressed.

    Abstract translation: 蒸镀源(60),多个控制板(80)和蒸镀掩模(70)依次配置。 在基板和气相沉积掩模以固定间隔间隔开的状态下,基板(10)相对于气相沉积掩模移动。 从气相沉积源的气相沉积源开口(61)排出的气相沉积颗粒(91)通过相邻的控制板间隙(81)和形成在气相沉积掩模中的掩模开口(71),然后粘附到 基板以形成涂膜(90)。 涂膜的至少一部分由已经通过两个或更多个不同的控制间隙的气相沉积颗粒形成。 由此,可以形成抑制边缘模糊和厚度变化的涂膜。

    Film Forming Method and Method for Manufacturing Film-Formation Substrate
    148.
    发明申请
    Film Forming Method and Method for Manufacturing Film-Formation Substrate 有权
    薄膜形成方法及薄膜形成基板的制造方法

    公开(公告)号:US20130022757A1

    公开(公告)日:2013-01-24

    申请号:US13635177

    申请日:2011-02-28

    Abstract: One embodiment of the present invention is a film forming method including the steps of forming an absorption layer 12 over one surface of a first substrate 11; forming a layer 16 containing a high molecular compound over the absorption layer; removing an impurity in the layer containing the high molecular compound by performing a first heat treatment on the layer 16; forming a material layer 18 containing a first film formation material and a second film formation material over the layer 16; performing a second heat treatment to form a mixed layer 19 in which the material layer and the layer 16 are mixed over the absorption layer; and performing third heat treatment to form a layer 19a containing the first film formation material and the second film formation material on a film-formation target surface of a second substrate.

    Abstract translation: 本发明的一个实施方案是一种成膜方法,包括以下步骤:在第一基底11的一个表面上形成吸收层12; 在吸收层上形成含有高分子化合物的层16; 通过在层16上进行第一热处理来除去含有高分子化合物的层中的杂质; 在层16上形成含有第一成膜材料和第二成膜材料的材料层18; 进行第二热处理以形成其中材料层和层16在吸收层上混合的混合层19; 并进行第三热处理,以在第二基板的成膜目标表面上形成含有第一成膜材料和第二成膜材料的层19a。

    DEPOSITION APPARATUS AND DEPOSITION METHOD
    149.
    发明申请
    DEPOSITION APPARATUS AND DEPOSITION METHOD 有权
    沉积装置和沉积方法

    公开(公告)号:US20130017320A1

    公开(公告)日:2013-01-17

    申请号:US13637627

    申请日:2011-02-10

    Abstract: A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.

    Abstract translation: 沉积装置50在用于有机EL显示器的基板10上以预定图案形成薄膜3。 第一校正板81和第二校正板82被放置在荫罩60和发射沉积颗粒的沉积源53之间。 每个校正板81,82具有多个叶片83和支撑多个叶片板83的框架84.叶片板83相对于荫罩60倾斜放置,并且延伸 在与沉积掩模60垂直的方向上观察时,在相邻的刮板83之间具有开口86,彼此平行。

    In-vehicle equipment control device and in-vehicle equipment setting method using the device
    150.
    发明授权
    In-vehicle equipment control device and in-vehicle equipment setting method using the device 有权
    车载设备控制装置和车载设备使用该设备的方法

    公开(公告)号:US08265822B2

    公开(公告)日:2012-09-11

    申请号:US12227239

    申请日:2007-06-26

    CPC classification number: B60H1/00985 B60K37/06

    Abstract: A disclosed in-vehicle equipment control device “S” includes input units 2 and 3 for increasing and decreasing a set value of in-vehicle equipment, and a set value increase/decrease halting unit 13 for stopping the increase/decrease of the set value when the set value reaches a prescribed value after being increased and decreased by the input units 2 and 3. Further, the in-vehicle equipment control device “S” may further include a set value increase/decrease resuming unit 14 for resuming increasing or decreasing the set value when an input of the input unit 2 or 3 is continued after the increase or decrease of the set value is stopped by the set value increase/decrease halting unit 13.

    Abstract translation: 所公开的车载设备控制装置“S”包括用于增加和减少车载设备的设定值的输入单元2和3,以及用于停止设定值的增减的设定值增减停止单元13 当设定值通过输入单元2和3增加和减小之后达到规定值时。此外,车载设备控制装置“S”还可以包括用于恢复增加或减少的设定值增加/减少恢复单元14 在设定值增加/减少停止单元13停止设定值的增减后继续输入单元2或3的输入时的设定值。

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