公开(公告)号：US07429334B2

公开(公告)日：2008-09-30

申请号：US11090778

申请日：2005-03-25

Applicant: Ming-Hau Tung ,  Manish Kothari ,  William J. Cummings

Inventor： Ming-Hau Tung ,  Manish Kothari ,  William J. Cummings

IPC: B29D11/00

CPC classification number: B81C1/00174 ,  B81B2201/047 ,  B81B2203/0181 ,  B81C1/00182 ,  B81C2201/0109 ,  G02B26/001

Abstract: Methods for making MEMS devices such as interferometric modulators involve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators.

Abstract translation: 用于制造诸如干涉式调制器的MEMS器件的方法包括选择性地去除材料的牺牲部分以形成内部空腔，留下材料的剩余部分以形成柱状结构。 该材料可以被毯式沉积并选择性地改变以限定相对于其余部分可选择性地移除的牺牲部分。 或者，材料层可以横向凹入远离覆盖层中的开口。 这些方法可用于制造未释放和释放的干涉式调制器。

公开(公告)号：US07424198B2

公开(公告)日：2008-09-09

申请号：US11045738

申请日：2005-01-28

Applicant: Lauren Palmateer ,  William J. Cummings ,  Brian Gally ,  Mark Miles ,  Jeffrey B. Sampsell ,  Clarence Chui ,  Manish Kothari

Inventor： Lauren Palmateer ,  William J. Cummings ,  Brian Gally ,  Mark Miles ,  Jeffrey B. Sampsell ,  Clarence Chui ,  Manish Kothari

IPC: G02B6/00

CPC classification number: G02B26/007 ,  B81B2201/047 ,  B81C1/00285 ,  B81C1/00333 ,  B81C2203/0136 ,  B81C2203/0145 ,  G02B26/001 ,  G02B26/0825 ,  G02B26/0833

Abstract: A package structure and method of packaging for an interferometric modulator. A thin film material is deposited over an interferometric modulator and transparent substrate to encapsulate the interferometric modulator. A gap or cavity between the interferometric modulator and the thin film provides a space in which mechanical parts of the interferometric modulator may move. The gap is created by removal of a sacrificial layer that is deposited over the interferometric modulator.

Abstract translation: 用于干涉式调制器的封装结构和封装方法。 在干涉式调制器和透明衬底上沉积薄膜材料以封装干涉式调制器。 干涉式调制器和薄膜之间的间隙或腔提供干涉式调制器的机械部分可以移动的空间。 通过去除沉积在干涉式调制器上的牺牲层产生间隙。

公开(公告)号：US07420725B2

公开(公告)日：2008-09-02

申请号：US11119432

申请日：2005-04-29

Applicant: Manish Kothari

Inventor： Manish Kothari

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/00 ,  G02B26/001 ,  G02B26/0841 ,  Y10T29/49117

Abstract: A system and method for an optical component that masks non-active portions of a display and provides an electrical path for one or more display circuits. In one embodiment an optical device includes a substrate, a plurality of optical elements on the substrate, each optical element having an optical characteristic which changes in response to a voltage applied to the optical element, and a light-absorbing, electrically-conductive optical mask disposed on the substrate and offset from the plurality of optical elements, the optical mask electrically coupled to one or more of the optical elements to provide one or more electrical paths for application of voltages to the one or more optical elements. In another embodiment a method of providing an electrical signal to a plurality of optical elements of a display comprises electrically coupling an electrically-conductive light-absorbing mask to one or more optical elements, and applying a voltage to the mask to activate the one or more optical elements.

Abstract translation: 一种用于遮蔽显示器的非有效部分并为一个或多个显示电路提供电路径的光学部件的系统和方法。 在一个实施例中，光学器件包括衬底，衬底上的多个光学元件，每个光学元件具有响应于施加到光学元件的电压而变化的光学特性，以及光吸收导电光学掩模 设置在基板上并偏离多个光学元件，光学掩模电耦合到一个或多个光学元件，以提供用于向一个或多个光学元件施加电压的一个或多个电路径。 在另一个实施例中，向显示器的多个光学元件提供电信号的方法包括将导电光吸收掩模电耦合到一个或多个光学元件，以及向所述掩模施加电压以激活所述一个或多个 光学元件。

公开(公告)号：US20080158646A1

公开(公告)日：2008-07-03

申请号：US12041618

申请日：2008-03-03

Applicant: William J Cummings ,  Brian Gally ,  Manish Kothari

Inventor： William J Cummings ,  Brian Gally ,  Manish Kothari

IPC: G02B26/00

CPC classification number: G09G3/006 ,  G02B26/001 ,  G09G3/3466

Abstract: Disclosed herein are methods and systems for testing the electrical characteristics of reflective displays, including interferometric modulator displays. In one embodiment, a controlled voltage is applied to conductive leads in the display and the resulting current is measured. The voltage may be controlled so as to ensure that interferometric modulators do not actuate during the resistance measurements. Also disclosed are methods for conditioning interferometric modulator display by applying a voltage waveform that causes actuation of interferometric modulators in the display.

Abstract translation: 本文公开了用于测试反射显示器的电气特性的方法和系统，包括干涉式调制器显示器。 在一个实施例中，将受控电压施加到显示器中的导电引线，并且测量所得到的电流。 可以控制电压以确保在电阻测量期间干涉式调制器不起动。 还公开了通过施加使显示器中的干涉式调制器致动的电压波形来调节干涉式调制器显示的方法。

公开(公告)号：US07343080B2

公开(公告)日：2008-03-11

申请号：US11173822

申请日：2005-07-01

Applicant: Brian J. Gally ,  Lauren Palmateer ,  Manish Kothari ,  William J. Cummings

Inventor： Brian J. Gally ,  Lauren Palmateer ,  Manish Kothari ,  William J. Cummings

IPC: G02B6/00

CPC classification number: B81C99/0045 ,  G01M3/002 ,  G01M3/02 ,  G01M3/186 ,  G01M3/229 ,  G02B26/001 ,  Y10T29/49002

Abstract: One embodiment provides a method of testing humidity, comprising: determining a property of a device which encloses a plurality of interferometric modulators; and determining a relative humidity value or a degree of the relative humidity inside the device based at least in part upon the determined property. In one embodiment, the property of the device includes one of the following: i) a weight of the device, ii) a color change of a desiccant enclosed in the device, iii) a resistance inside the device, iv) whether frost formed in an inside area of the device which is contacted by a cold finger device, v) whether a desiccant enclosed in the device, when water vapor is provided into the device, is working properly, and vi) combination of at lest two of i)-v).

Abstract translation: 一个实施例提供一种测试湿度的方法，包括：确定包围多个干涉式调制器的装置的属性; 以及至少部分地基于所确定的属性来确定所述装置内的相对湿度值或相对湿度的程度。 在一个实施例中，设备的特性包括以下之一：i）设备的重量，ii）封装在设备中的干燥剂的颜色变化，iii）设备内部的电阻，iv）是否形成 设备的内部区域，其由冷指装置接触，v）当在设备中提供水蒸气时，包封在设备中的干燥剂是否正常工作，以及vi）至少两个组合，i） - v）。

公开(公告)号：US20080029481A1

公开(公告)日：2008-02-07

申请号：US11462026

申请日：2006-08-02

Applicant: Manish Kothari ,  Jeffrey B. Sampsell

Inventor： Manish Kothari ,  Jeffrey B. Sampsell

IPC: C03C25/68 ,  B44C1/22 ,  H01L47/00

CPC classification number: B81C1/00579 ,  B81C2201/0109 ,  B81C2201/0132

Abstract: Provided herein are methods for preventing the formation and accumulation of surface-associated charges, and deleterious effects associated therewith, during the manufacture of a MEMS device. In some embodiments, methods provided herein comprise etching a sacrificial material in the presence of an ionized gas, wherein the ionized gas neutralizes charged species produced during the etching process and allows for their removal along with other etching byproducts. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 本文提供了在制造MEMS器件期间防止表面相关电荷的形成和累积以及与其相关的有害影响的方法。 在一些实施例中，本文提供的方法包括在存在电离气体的情况下蚀刻牺牲材料，其中电离气体中和在蚀刻工艺期间产生的带电物质，并允许其与其它蚀刻副产物一起去除。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US20080025466A1

公开(公告)日：2008-01-31

申请号：US11492437

申请日：2006-07-25

Applicant: Charles G. Peterfy ,  David L. White ,  Manish Kothari ,  Gabriele von Ingersleben ,  Martine M. Sieffert ,  Julie Camille DiCarlo

Inventor： Charles G. Peterfy ,  David L. White ,  Manish Kothari ,  Gabriele von Ingersleben ,  Martine M. Sieffert ,  Julie Camille DiCarlo

IPC: H05G1/28

CPC classification number: A61B6/00 ,  A61B6/583 ,  A61B90/39

Abstract: A frame for determining the position and orientation of an x-ray source relative to an x-ray cassette during x-radiography. In one embodiment the frame includes an x-ray transparent or translucent plate having a first surface and a second surface; and a partially radio-opaque protrusion positioned on the first surface of the plate. In another embodiment, a method for determining the position and orientation of an x-ray source relative to an x-ray cassette is disclosed. The method includes the steps of providing a frame, including an x-ray transparent plate having a first surface and a second surface; and a protrusion having a radio-opaque portion positioned on the first surface of the plate, and placing the plate on the x-ray cassette such that the second surface is in contact with the x-ray cassette. The method further includes placing the appendage on the plate in close juxtaposition to the protrusion, exposing the appendage and plate to an x-ray beam, and examining the image formed.

Abstract translation: 用于在X射线照相术期间确定x射线源相对于x射线盒的位置和取向的框架。 在一个实施例中，框架包括具有第一表面和第二表面的x射线透明或半透明板; 以及位于所述板的第一表面上的部分不透射线的突起。 在另一个实施例中，公开了一种用于确定x射线源相对于x射线盒的位置和取向的方法。 该方法包括提供包括具有第一表面和第二表面的x射线透明板的框架的步骤; 以及具有位于所述板的第一表面上的不透射线部分的突起，并且将所述板放置在所述X射线盒上，使得所述第二表面与所述x射线盒接触。 该方法还包括将附件放置在板上，与突起并排放置，将附属物和板暴露于X射线束，并检查形成的图像。

公开(公告)号：US20070291347A1

公开(公告)日：2007-12-20

申请号：US11649439

申请日：2007-01-03

Applicant: Jeffrey Sampsell ,  Clarence Chui ,  Manish Kothari

Inventor： Jeffrey Sampsell ,  Clarence Chui ,  Manish Kothari

IPC: G02B26/00

CPC classification number: G09G3/3466 ,  G02B26/001 ,  G09G3/2074 ,  G09G3/2081 ,  G09G2300/06 ,  G09G2310/0267 ,  G09G2310/0297

Abstract: A light modulator is arranged as an array of rows and columns of interferometric display elements. Each element is divided into sub-rows of sub-elements. Array connection lines transmit operating signals to the display elements, with one connection line corresponding to one row of display elements in the array. Sub-array connection lines electrically connect to each array connection line. Switches transmit the operating signals from each array connection line to the sub-rows to effect gray scale modulation.

Abstract translation: 光调制器被布置为干涉式显示元件的行和列的阵列。 每个元素被划分成子行子元素。 阵列连接线将工作信号发送到显示元件，其中一条连接线对应于阵列中的一行显示元件。 子阵列连接线电连接到每个阵列连接线。 开关将来自每个阵列连接线的操作信号传输到子行以实现灰度调制。

公开(公告)号：US20070177129A1

公开(公告)日：2007-08-02

申请号：US11453633

申请日：2006-06-15

Applicant: Manish Kothari ,  Lior Kogut ,  Clarence Chui

Inventor： Manish Kothari ,  Lior Kogut ,  Clarence Chui

IPC: G01B11/16 ,  G02B26/00

CPC classification number: G01L5/0047 ,  G02B26/001

Abstract: The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

Abstract translation: 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。

公开(公告)号：US20070019280A1

公开(公告)日：2007-01-25

申请号：US11490880

申请日：2006-07-21

Applicant: Teruo Sasagawa ,  SuryaPrakash Ganti ,  Mark Miles ,  Clarence Chui ,  Manish Kothari ,  Ming-Hau Tung

Inventor： Teruo Sasagawa ,  SuryaPrakash Ganti ,  Mark Miles ,  Clarence Chui ,  Manish Kothari ,  Ming-Hau Tung

IPC: G02F1/29 ,  G02B6/00

CPC classification number: G02B26/001 ,  B81B3/007 ,  B81B2201/047 ,  B81B2203/0307 ,  B81B2203/053

Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.

Abstract translation: MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。 在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。 在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。