公开(公告)号：US20070177129A1

公开(公告)日：2007-08-02

申请号：US11453633

申请日：2006-06-15

申请人： Manish Kothari ,  Lior Kogut ,  Clarence Chui

发明人： Manish Kothari ,  Lior Kogut ,  Clarence Chui

IPC分类号： G01B11/16 ,  G02B26/00

CPC分类号： G01L5/0047 ,  G02B26/001

摘要： The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

摘要翻译： 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。

公开(公告)号：US07636151B2

公开(公告)日：2009-12-22

申请号：US11453633

申请日：2006-06-15

申请人： Manish Kothari ,  Lior Kogut ,  Clarence Chui

发明人： Manish Kothari ,  Lior Kogut ,  Clarence Chui

IPC分类号： G01L1/24 ,  G01B11/02 ,  G01B9/02

CPC分类号： G01L5/0047 ,  G02B26/001

摘要： The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

摘要翻译： 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。

公开(公告)号：US20100118382A1

公开(公告)日：2010-05-13

申请号：US12687850

申请日：2010-01-14

申请人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

发明人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

IPC分类号： G02B26/00

CPC分类号： G02B26/001

摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.

摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。

公开(公告)号：US20120088027A1

公开(公告)日：2012-04-12

申请号：US13327675

申请日：2011-12-15

申请人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

发明人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

IPC分类号： B05D5/12

CPC分类号： G02B26/001

摘要： Examples of methods of manufacturing a microelectromechanical system (MEMS) device can include forming a first reflective layer on a substrate, forming a sacrificial layer over the first reflective layer, removing a portion of the sacrificial layer to form an opening, and filling the opening with a dielectric material to form a post. Some methods further include forming a second reflective layer over the sacrificial layer, removing a portion of the second reflective layer and a portion of the post to form a hole, filling the hole with a conductive material to form an electrode, and removing the sacrificial layer.

摘要翻译： 制造微机电系统（MEMS）器件的方法的实例可以包括在衬底上形成第一反射层，在第一反射层上形成牺牲层，去除牺牲层的一部分以形成开口，并且用 形成柱的电介质材料。 一些方法还包括在牺牲层上形成第二反射层，去除第二反射层的一部分和柱的一部分以形成孔，用导电材料填充孔以形成电极，以及去除牺牲层 。

公开(公告)号：US08098416B2

公开(公告)日：2012-01-17

申请号：US12687850

申请日：2010-01-14

申请人： Manish Kothari ,  Lior Kogut ,  Jeffrey B Sampsell

发明人： Manish Kothari ,  Lior Kogut ,  Jeffrey B Sampsell

IPC分类号： G02B26/00 ,  G02B26/08

CPC分类号： G02B26/001

摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.

摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。

公开(公告)号：US20070279729A1

公开(公告)日：2007-12-06

申请号：US11444567

申请日：2006-06-01

申请人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

发明人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

IPC分类号： G02B26/00

CPC分类号： G02B26/001

摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.

摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。

公开(公告)号：US07649671B2

公开(公告)日：2010-01-19

申请号：US11444567

申请日：2006-06-01

申请人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

发明人： Manish Kothari ,  Lior Kogut ,  Jeffrey B. Sampsell

IPC分类号： G02B26/00 ,  G02B26/08 ,  G02F1/29

CPC分类号： G02B26/001

摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.

摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。

公开(公告)号：US08735225B2

公开(公告)日：2014-05-27

申请号：US12415986

申请日：2009-03-31

申请人： Lauren Palmateer ,  William J. Cummings ,  Brian Gally ,  Clarence Chui ,  Manish Kothari

发明人： Lauren Palmateer ,  William J. Cummings ,  Brian Gally ,  Clarence Chui ,  Manish Kothari

IPC分类号： H01L23/31

CPC分类号： B81B7/0038 ,  B81C2203/019 ,  G02B26/001

摘要： Methods and systems for packaging MEMS devices such as interferometric modulator arrays are disclosed. One embodiment of a MEMS device package structure includes a seal with a chemically reactant getter. Another embodiment of a MEMS device package comprises a primary seal with a getter, and a secondary seal proximate an outer periphery of the primary seal. Yet another embodiment of a MEMS device package comprises a getter positioned inside the MEMS device package and proximate an inner periphery of the package seal.

摘要翻译： 公开了用于封装诸如干涉式调制器阵列之类的MEMS装置的方法和系统。 MEMS器件封装结构的一个实施例包括具有化学反应物吸气剂的密封。 MEMS器件封装的另一实施例包括具有吸气剂的主密封件和靠近主密封件的外周边的次级密封件。 MEMS器件封装的另一个实施例包括位于MEMS器件封装内部并且靠近封装密封件的内周边的吸气剂。

公开(公告)号：US08402647B2

公开(公告)日：2013-03-26

申请号：US12868656

申请日：2010-08-25

申请人： Clarence Chui ,  Gaurav Sethi ,  Jonathan Charles Griffiths ,  Manish Kothari

发明人： Clarence Chui ,  Gaurav Sethi ,  Jonathan Charles Griffiths ,  Manish Kothari

IPC分类号： H05K3/30

CPC分类号： B23P11/00 ,  G02B6/0036 ,  G02B6/0038 ,  G02B6/0053 ,  G02B6/0065 ,  Y10T29/49002 ,  Y10T29/49131 ,  Y10T29/49155 ,  Y10T29/49208 ,  Y10T29/49826 ,  Y10T29/49904

摘要： Methods of manufacturing light panels having at least one re-entrant turning feature. In one embodiment, a method of manufacturing a light panel includes providing a base layer, providing a cover layer, and coupling the cover layer to the base layer to form at least one re-entrant turning feature between the base layer and the cover layer. In another embodiment, a method of manufacturing a light panel includes providing a base layer, forming at least one receiving space in the base layer, providing at least one prismatic block, and coupling at least a portion of the prismatic block into the receiving space such that re-entrant turning features are formed between the prismatic block and the base layer.

摘要翻译： 制造具有至少一个重新转向特征的轻型面板的方法。 在一个实施例中，制造光面板的方法包括提供基底层，提供覆盖层，以及将覆盖层耦合到基底层，以在基底层和覆盖层之间形成至少一个重复的转动特征。 在另一个实施例中，一种制造光面板的方法包括提供基底层，在基底层中形成至少一个接收空间，提供至少一个棱柱形块，并将棱柱形块的至少一部分连接到接收空间中， 在棱柱块和基层之间形成了转向特征。

公开(公告)号：US08278726B2

公开(公告)日：2012-10-02

申请号：US12861778

申请日：2010-08-23

申请人： Mark W. Miles ,  John Batey ,  Clarence Chui ,  Manish Kothari ,  Ming-Hau Tung

发明人： Mark W. Miles ,  John Batey ,  Clarence Chui ,  Manish Kothari ,  Ming-Hau Tung

IPC分类号： H01L29/84

CPC分类号： B81B3/0086 ,  B81C2201/0109 ,  B81C2201/014 ,  B81C2201/053 ,  G02B26/001

摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.

摘要翻译： 在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。 该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。