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公开(公告)号：US10076005B2
公开(公告)日：2018-09-11
申请号：US14882031
申请日：2015-10-13
发明人： Doug Childers
CPC分类号： H05B33/0812 , F21K9/60 , F21K9/68 , F26B3/28 , H05B33/0806
摘要： A lighting device may comprise a light emitting element and a reflector, the reflector comprising: a first opening surrounding the light emitting element and a second opening; reflector side walls forming the first and second openings, the reflector side walls divergently extending from the first opening away from the light emitting element to the second opening; and corner facets, wherein each corner facet is positioned over a corresponding reflector corner formed by an adjacent pair of reflector side walls at the first opening. In this way, a photosensitive work piece may be uniformly irradiated while mitigating under-curing and over-curing, and while reducing a coupling optics size and a distance between the light emitting elements and the work piece, thereby decreasing cure times and lowering manufacturing costs.
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公开(公告)号：US09967950B2
公开(公告)日：2018-05-08
申请号：US15710687
申请日：2017-09-20
IPC分类号： H05B37/02
CPC分类号： H05B37/02 , H05B33/0845
摘要： A system and method for operating one or more light emitting devices is disclosed. In one example, an analog circuit outputs a voltage pulse to drive a voltage regulator in a way that may provide more consistent light intensity from the one or more light emitting devices over a range of requested lighting intensity levels.
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13.发明授权公开(公告)号：US09638833B2
公开(公告)日：2017-05-02
申请号：US15063723
申请日：2016-03-08
发明人： Doug Childers
IPC分类号： G02B1/12 , G02B6/44 , B05C9/12 , G02B5/08 , G02B5/20 , G02B6/02 , G02B27/14 , H05B33/08 , F21K9/60
CPC分类号： G02B1/12 , B05C9/12 , F21K9/60 , G02B5/0891 , G02B5/208 , G02B6/02 , G02B6/44 , G02B27/141 , H05B33/0845
摘要： A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises at least two UV light sources equally spaced around a central axis, each UV light source comprising a reflector and a cylindrical lens, and the UV curing device configured to receive a workpiece along the central axis. The reflectors are configured to substantially reduce the emitting angle of light from the UV light sources, thereby directing the light substantially through the cylindrical lenses, the cylindrical lenses focusing the light intensely along a surface of the workpiece.
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公开(公告)号：US09320090B2
公开(公告)日：2016-04-19
申请号：US14309761
申请日：2014-06-19
发明人： Ognyan Moore , Paul Eddy
CPC分类号： H05B33/0809 , H05B33/0845
摘要： A system and method for operating one or more light emitting devices is disclosed. In one example, the intensity of light provided by the one or more light emitting devices is adjusted responsive to follow a step change in requested lighting output.
摘要翻译： 公开了一种用于操作一个或多个发光器件的系统和方法。 在一个示例中，响应于遵循所请求的照明输出中的阶跃改变来调整由一个或多个发光装置提供的光的强度。
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15.发明授权公开(公告)号：US09304273B2
公开(公告)日：2016-04-05
申请号：US13648447
申请日：2012-10-10
发明人： Doug Childers
CPC分类号： G02B1/12 , B05C9/12 , F21K9/60 , G02B5/0891 , G02B5/208 , G02B6/02 , G02B6/44 , G02B27/141 , H05B33/0845
摘要： A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises at least two UV light sources equally spaced around a central axis, each UV light source comprising a reflector and a cylindrical lens, and the UV curing device configured to receive a workpiece along the central axis. The reflectors are configured to substantially reduce the emitting angle of light from the UV light sources, thereby directing the light substantially through the cylindrical lenses, the cylindrical lenses focusing the light intensely along a surface of the workpiece.
摘要翻译： 用于UV固化在诸如光纤的工件上的涂层或印刷油墨的装置包括围绕中心轴等距间隔的至少两个UV光源，每个UV光源包括反射器和柱面透镜，并且UV固化装置配置 以沿着中心轴接收工件。 反射器被配置为基本上减少来自UV光源的光的发射角，从而将光基本上引导通过柱面透镜，柱面透镜沿着工件的表面强烈聚焦光。
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16.发明授权Methods and systems relating to light sources for use in industrial processes 有权与工业过程中使用的光源有关的方法和系统公开(公告)号：US09281001B2
公开(公告)日：2016-03-08
申请号：US11813090
申请日：2005-12-30
申请人： Duwayne R. Anderson , Roland Jasmin
发明人： Duwayne R. Anderson , Roland Jasmin , Mark D. Owen
CPC分类号： G11B7/26 , Y10S362/80
摘要： System and methods are disclosed in connection with a reaction at or below the surface of a work object, in the context of a fluid flow fostering the reaction. In some example embodiments, the reaction is fostered by (1) creating fluid flow of an inerting fluid over a surface during exposure of the surface to a predetermined type of light, (2) creating fluid flow comprising a reactive species that reacts with another species at or below the work surface in a predetermined manner and/or (3) creating a fluid flow comprising a catalytic species that catalyzes a reaction in a predetermined manner, e.g., during exposure of the surface to a predetermined type of light. In some example embodiments, a light source is employed that comprises a solid-state light source, e.g., a dense array of solid-state light sources. In at least one of such example embodiments, the reaction is a photoreaction associated with the light source.
摘要翻译： 关于在促进反应的流体流动的上下文中与工作对象的表面或其下方的反应有关的系统和方法被公开。 在一些示例性实施方案中，通过（1）在将表面暴露于预定类型的光时在表面上产生惰性流体的流体流动，（2）产生包含与另一种物质反应的反应性物质的流体流 以预定的方式在工作表面处或下方，和/或（3）产生包含以预定方式催化反应的催化物质的流体流，例如在将表面暴露于预定类型的光时。 在一些示例性实施例中，采用包括固态光源（例如，固态光源的密集阵列）的光源。 在这样的示例性实施方案中的至少一个中，反应是与光源相关联的光反应。
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公开(公告)号：US09107246B2
公开(公告)日：2015-08-11
申请号：US13762001
申请日：2013-02-07
CPC分类号： H05B37/02 , H05B33/0845 , H05B37/029
摘要： A system and method for operating one or more light emitting devices is disclosed. In one example, the switching of a regulator is ceased in response to a request to stop supplying power to one or more light emitting devices. The approach may reduce power consumption of a lighting system when light is not requested.
摘要翻译： 公开了一种用于操作一个或多个发光器件的系统和方法。 在一个示例中，响应于停止向一个或多个发光器件供电的请求，停止调节器的切换。 当不需要光时，该方法可以降低照明系统的功耗。
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公开(公告)号：US08928256B2
公开(公告)日：2015-01-06
申请号：US13890076
申请日：2013-05-08
发明人： Jeff Smith
CPC分类号： H05B33/089 , F21V29/56 , H05B33/083 , H05B33/0842 , H05B33/0854
摘要： A system and method for operating one or more light emitting devices is disclosed. In one example, the light emitting devices may be deactivated in response to a rate of temperature rise of the light emitting devices. The system and method further include a way of reducing false positive indications of light emitting device.
摘要翻译： 公开了一种用于操作一个或多个发光器件的系统和方法。 在一个示例中，发光器件可以响应于发光器件的温度升高速率而被去激活。 该系统和方法还包括减少发光装置的假阳性指示的方法。
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19.发明授权Dual elliptical reflector with a co-located foci for curing optical fibers 有权双椭圆形反射器，具有用于固化光纤的共定位焦点公开(公告)号：US08872137B2
公开(公告)日：2014-10-28
申请号：US13619837
申请日：2012-09-14
申请人： Doug Childers
发明人： Doug Childers
CPC分类号： G21K5/00 , C03C25/12 , F26B3/28 , F26B13/00 , G21K1/067 , G21K2201/064 , G21K2201/065
摘要： A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
摘要翻译： 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。
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20.发明申请公开(公告)号：US20130068969A1
公开(公告)日：2013-03-21
申请号：US13619837
申请日：2012-09-14
申请人： Doug Childers
发明人： Doug Childers
IPC分类号： G21K5/00
CPC分类号： G21K5/00 , C03C25/12 , F26B3/28 , F26B13/00 , G21K1/067 , G21K2201/064 , G21K2201/065
摘要： A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
摘要翻译： 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。
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