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公开(公告)号：US11747739B2
公开(公告)日：2023-09-05
申请号：US17434802
申请日：2020-02-10
Applicant: ASML Netherlands B. V. , Cymer, LLC
Inventor： Willard Earl Conley , Joshua Jon Thornes , Duan-Fu Stephen Hsu
CPC classification number: G03F7/70575 , G03F7/705
Abstract: Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.
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12.发明公开公开(公告)号：US20230260855A1
公开(公告)日：2023-08-17
申请号：US18014431
申请日：2021-06-21
Applicant: ASML NETHERLANDS B. V.
Inventor： Andriy Vasyliovich HLOD , Arnaud HUBAUX
CPC classification number: H01L22/26 , G03F7/7065 , G03F7/70525
Abstract: A method of determining a correction strategy in a semiconductor manufacturing process. The method can include obtaining functional indicator data relating to functional indicators associated with one or more process parameters of each of a plurality of different control regimes of the semiconductor manufacturing process and/or a tool associated with the semiconductor manufacturing process and using the functional indicator data as an input to a trained model to determine for which of the control regimes should a correction be determined so as to improve performance of the semiconductor manufacturing process according to at least one quality metric being representative of a quality of the semiconductor manufacturing process. The correction is then calculated for the determined control regime(s).
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公开(公告)号：US11474435B2
公开(公告)日：2022-10-18
申请号：US17415671
申请日：2019-11-19
Applicant: ASML Netherlands B. V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Sergei Sokolov
Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.
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公开(公告)号：US20220317368A1
公开(公告)日：2022-10-06
申请号：US17836537
申请日：2022-06-09
Applicant: ASML NETHERLANDS B. V.
Abstract: A mounted hollow-core fiber arrangement includes a hollow-core fiber having a microstructure, and a mount arrangement including a plurality of mounting contacts configured to apply a force to an outer layer of the hollow-core fiber. A portion of the hollow-core fiber is located in a receiving region of the mount arrangement. The plurality of mounting contacts are positioned around the receiving region. The mounting contacts are distributed around the receiving region, the distribution of the mounting contacts corresponding to a distribution of features of the microstructure of the hollow-core fiber. The mounted hollow core fiber can be used in a radiation source apparatus for providing broadband radiation.
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公开(公告)号：US20220171298A1
公开(公告)日：2022-06-02
申请号：US17600340
申请日：2020-03-10
Applicant: ASML Netherlands B,V.
Inventor： Alisia Mariska WILLEMS - PETERS , Sander BALTUSSEN , Zhuangxiong HUANG , Reinier Theodorus Martinus JILISEN , Sietse WIJTVLIET
IPC: G03F7/20
Abstract: An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.
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Patent Agency Ranking
公开(公告)号：US20220163895A1
公开(公告)日：2022-05-26
申请号：US17441168
申请日：2020-02-20
Applicant: ASML Netherlands B,V.
Inventor： Oscar Franciscus Jozephus NOORDMAN , Antonius Theodorus Wilhelmu KEMPEN , Jan Bernard Plechelmus VAN SCHOOT , Marinus Aart VAN DEN BRINK
IPC: G03F7/20
Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.
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公开(公告)号：US20210311400A1
公开(公告)日：2021-10-07
申请号：US17264023
申请日：2019-07-03
Applicant: ASML NETHERLANDS B,V.
Inventor： Mohammad Reza KAMALI , Brennad PETERSON
IPC: G03F7/20
Abstract: A method for controlling a manufacturing process for manufacturing semiconductor devices, the method including: obtaining performance data indicative of the performance of the manufacturing process, the performance data including values for a performance parameter across a substrate subject to the manufacturing process; and determining a process correction for the manufacturing process based on the performance data and at least one control characteristic related to a dynamic behavior of one or more control parameters of the manufacturing process, wherein the determining is further based on an expected stability of the manufacturing process when applying the process correction.
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公开(公告)号：US20200096881A1
公开(公告)日：2020-03-26
申请号：US16698905
申请日：2019-11-27
Applicant: ASML Netherlands B,V
Inventor： Jeroen VAN DUIVENBODE , Petrus Jacobus Maria VAN GILS , Petrus Johannes VAN DEN OEVER , Coen Hubertus Matheus BALTIS
Abstract: An apparatus for removing particles from a clamp, the apparatus being arrangeable in proximity of the clamp and comprising an insulating portion, a supporting portion, at least a part or all of the insulating portion being arranged on the supporting portion, wherein the supporting portion is configured such that when a voltage is applied to the supporting portion of the apparatus and/or to an electrode of the clamp, the supporting portion acts as an electrode to allow an electric field to be generated between the apparatus and the clamp for removal of the particles from the clamp.
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公开(公告)号：US10514618B2
公开(公告)日：2019-12-24
申请号：US16026195
申请日：2018-07-03
Applicant: ASML NETHERLANDS B. V.
Inventor： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
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公开(公告)号：US20150138520A1
公开(公告)日：2015-05-21
申请号：US14503697
申请日：2014-10-01
Applicant: ASML Netherlands B. V. , Carl Zeiss SMT GMBH
Inventor： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
Abstract: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.
Abstract translation: 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。
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