公开(公告)号：US06059859A

公开(公告)日：2000-05-09

申请号：US933668

申请日：1997-09-19

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

IPC: B01D53/26 ,  B01D53/28 ,  B01J20/06 ,  B01D53/04

CPC classification number: B01D53/28 ,  B01D53/261

Abstract: A process, composition and apparatus for the removal of water from moist non-corrosive gases (such as those containing oxygen or CO.sub.2) down to .ltoreq.10-20 ppb water concentration are described. The dehydrating agent is an oxide or salt of an electropositive metal and has a surface area of at least 140 m.sup.2 /g, preferably 140-500 m.sup.2 /g, is compatible with the gas, and preferably is capable of dehydrating such gases to .ltoreq.1 ppb, preferably to as low as 500 ppt. The electropositive metal will be a Group 3b, 4b or lanthanide metal or vanadium. The preferred agent is a high surface area titania, zirconia, yttria or vanadia, with titania most preferred. The dehydrating agent can be in the form of a pelleted or granular bulk material or a coating on or within the pores of a substrate. The agent is retained in a simple container which is easily installed in a gas supply line for the gas, such as to a gas- or vapor-deposition manufacturing unit. The dehydration process can be operated for long periods of time in the presence of these gases. The invention can be used to provide final dehydration to gas streams intended for gas- or vapor-deposition formation of high purity electronic, prosthetic, pharmaceutical, optical fiber or similar products, and can be used in combination with a preliminary dehydration process for such gases upstream of a solid particulate removal unit or molecular contaminant elimination unit downstream.

Abstract translation: 描述了用于从潮湿的非腐蚀性气体（例如含有氧气或二氧化碳的那些）中去除水的方法，组合物和装置，其浓度低于10-20ppb。 脱水剂是正电性金属的氧化物或盐，并且具有至少140m 2 / g，优选140-500m 2 / g的表面积与气体相容，并且优选地能够使这些气体脱水至< = 1ppb，优选低至500ppt。 正电性金属将是3b，4b族或镧系元素金属或钒。 优选的试剂是高表面积的二氧化钛，氧化锆，氧化钇或氧化钒，其中二氧化钛是最优选的。 脱水剂可以是颗粒状或颗粒状体材料的形式或涂层在基材的孔或其内。 该试剂保持在易于安装在用于气体的气体供应管线中的简单容器中，例如气体或蒸气沉积制造单元。 脱水过程可以在这些气体的存在下长时间运行。 本发明可用于为用于高纯度电子，假体，药物，光纤或类似产品的气相或气相沉积形成的气流提供最终脱水，并且可以与用于这种气体的初步脱水方法组合使用 在固体颗粒去除单元或分子污染物消除单元下游的上游。

公开(公告)号：US5910292A

公开(公告)日：1999-06-08

申请号：US914524

申请日：1997-08-19

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

IPC: B01D53/26 ,  B01D53/02 ,  B01D53/28

CPC classification number: B01D53/02 ,  B01D53/28 ,  B01D2253/108 ,  B01D2253/1085 ,  B01D2256/26 ,  B01D2257/80 ,  Y10S95/902

Abstract: A process and apparatus for the removal of water from corrosive halogen gases, particularly chlorine- or bromine-containing gases, down to .ltoreq.100 ppb water concentration are described. The critical component is a high silica zeolite, preferably high silica mordenite, which in a variety of physical forms is capable of dehydrating such gases to .ltoreq.100 ppb or .ltoreq.50 ppb without being detrimentally affected by the corrosive nature of the gases in the presence of water. The high silica zeolite is produced by the removal of alumina from a natural or synthetic zeolite while retaining the desirable zeolite structure, to a silica:alumina ratio of from 20-2000:1. Metal cations which may be depleted by the alumina removal may be replaced by solution impregnation. Halogen- or halide-containing gases, or those with equivalent corrosion properties, may be dehydrated without deterioration of the high silica zeolite. The high silica zeolite is retained in a corrosion-resistant container which is installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The invention provides final dehydration to corrosive halogen gas streams intended for gas- or vapor-deposition formation of high purity electronic, optical, prosthetic or similar products, and can be used in combination with upstream preliminary dehydration process and/or solid particulate removal units.

Abstract translation: 描述了从腐蚀性卤素气体，特别是含氯或溴的气体中去除水的方法和装置，低至

公开(公告)号：US08790506B2

公开(公告)日：2014-07-29

申请号：US12731114

申请日：2010-03-24

Applicant: Alexander David Deptala ,  Daniel Alvarez, Jr. ,  Arthur Deptala

Inventor： Alexander David Deptala ,  Daniel Alvarez, Jr. ,  Arthur Deptala

IPC: C01B3/50 ,  C01B3/02

CPC classification number: B01D53/229 ,  B01D53/22 ,  B01D53/326 ,  B01D63/06 ,  B01D71/32 ,  B01D2256/16 ,  B01D2257/502 ,  B01D2257/504 ,  B01D2313/345 ,  B01D2313/365 ,  C01B3/50 ,  C01B3/503 ,  H01M8/0662 ,  Y02C10/10 ,  Y02C20/30 ,  Y02P20/152

Abstract: A method of purifying a hydrogen stream using an electrochemical cell having an enclosed electrically conductive cylindrical outer shell and a hollow wet polymeric membrane located within and parallel to the longitudinal axis of the cylindrical member which provides an inner compartment and an outer compartment. An electrode having a longitudinal axis is located within the inner compartment and is spaced from the hollow polymeric membrane. A gas inlet for feeding a hydrogen stream that is to be purified communicates with the inner compartment and a gas outlet is provided for passing purified hydrogen gas thru the cylindrical outer shell. The electrode within the hollow wet polymeric membrane is connected to an anode terminal of a dc supply with an electrical conductor and the outer shell of the cylindrical shaped member is connected to a cathode terminal of the dc supply with another electrical conductor.

Abstract translation: 使用具有封闭的导电圆柱形外壳和位于圆柱形构件的纵向轴线内并平行于圆柱形构件的中空湿聚合物膜的电化学电池来净化氢气流的方法，其提供内隔室和外隔室。 具有纵向轴线的电极位于内部隔室内并与中空聚合物隔膜间隔开。 用于供给要净化的氢气流的气体入口与内部隔室相连，并且设置有气体出口，用于使纯化的氢气通过圆柱形外壳。 中空湿聚合物膜内的电极连接到具有电导体的直流电源的阳极端子，并且圆柱形构件的外壳通过另一电导体连接到直流电源的阴极端子。

公开(公告)号：US06524544B1

公开(公告)日：2003-02-25

申请号：US09699100

申请日：2000-10-27

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

IPC: B01J2034

CPC classification number: B01J20/3458 ,  B01D15/00 ,  B01J20/06 ,  B01J20/28057 ,  B01J20/3433 ,  B01J20/3483 ,  B01J2220/56 ,  C01C1/024 ,  H01S3/005

Abstract: A method and apparatus for the decontamination of fluid ammonia are described. Liquid or gaseous ammonia is purified of contaminants by passage through an adsorbent bed, the contaminants accumulating in the bed. A portion of the purified ammonia discharged from the bed is decomposed to hydrogen and nitrogen. The hydrogen is used to regenerate an adsorbent bed which has accumulated sufficient contaminants to reduce its ability to further decontaminate incoming ammonia satisfactorily. Preferably there are a plurality of interconnected adsorbent beds, with some being operated for ammonia decontamination while others are being regenerated, with their operations being reversed as needed to maintain a continual production of decontaminated ammonia from the plurality of beds. Computers or other controllers can be used to control such bed operations and interchanges. Internal production of hydrogen makes the system self-contained and no addition of hydrogen is needed.

公开(公告)号：US06241955B1

公开(公告)日：2001-06-05

申请号：US09165791

申请日：1998-10-02

Applicant: Daniel Alvarez, Jr.

Inventor： Daniel Alvarez, Jr.

IPC: B01D5302

CPC classification number: C01B6/34 ,  C01B3/56 ,  C01B33/046 ,  C01B2203/042 ,  C01B2203/0465 ,  C01B2203/0475 ,  C01B2203/0495 ,  C01C1/024

Abstract: A process and apparatus for the decontamination of gaseous contaminants (especially oxygen, carbon dioxide and water vapor) from hydride gases (including their lower alkyl analogs) down to ≦100 ppb contaminant concentration are described. The critical component is a high surface area metal oxide substrate with reduced metal active sites, which in various physical forms is capable of decontaminating such gases to ≦100 ppb, ≦50 ppb or ≦10 ppb level without being detrimentally affected by the hydride gases. The surface area of the substrate will be ≧100 m2/g, and preferably 200-800 m2/g. Oxides of various metals, especially manganese or molybdenum, can be used, and mixtures of integrated oxides, or one type of oxide coated on another, may be used. The substrate is preferably retained in a hydride-gas-resistant container which is installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The invention provides final decontamination for hydride gas streams intended for gas- or vapor-deposition formation of high purity LED, laser (especially blue laser), electronic, optical or similar products, and can be used in combination with upstream preliminary decontamination process and/or upstream or downstream solid particulate removal units.

Abstract translation: 描述了从氢化物气体（包括它们的低级烷基类似物）至<= 100ppb的污染物浓度去除污染气体污染物（特别是氧气，二氧化碳和水蒸气）的方法和装置。 关键组分是具有降低的金属活性位点的高表面积金属氧化物底物，其以各种物理形式能够将这些气体净化至<= 100ppb，<= 50ppb或<= 10ppb水平，而不受不利影响 氢化物气体。 基材的表面积> 100m2 / g，优选为200-800m2 / g。 可以使用各种金属，特别是锰或钼的氧化物，并且可以使用一体化氧化物或另一种类型的氧化物的混合物。 基板优选保持在安装在气体供给管线中的氢化物 - 气体保护容器中，例如气体或蒸气沉积制造单元。 本发明为用于气相或气相沉积形成高纯度LED，激光（特别是蓝色激光），电子，光学或类似产品的氢化物气流提供最终的净化，并且可以与上游预净化过程和/ 或上游或下游固体颗粒去除单元。

公开(公告)号：US08075704B2

公开(公告)日：2011-12-13

申请号：US10523371

申请日：2004-06-01

Applicant: Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Russell J. Holmes ,  Allan Tram

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Russell J. Holmes ,  Allan Tram

IPC: B08B5/00

CPC classification number: B01D53/00 ,  B01D53/72 ,  B08B5/02 ,  B08B9/00 ,  C23G5/00 ,  H01L21/02046

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract translation: 本发明公开了一种从装置内的表面除去多种分子污染物的方法。 含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。 污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。 污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。

公开(公告)号：US20090229346A1

公开(公告)日：2009-09-17

申请号：US11989553

申请日：2006-07-31

Applicant: Daniel Alvarez, JR. ,  Troy B. Scoggins ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, JR. ,  Troy B. Scoggins ,  Jeffrey J. Spiegelman

IPC: G01N33/00 ,  B01D59/26

CPC classification number: B08B17/00

Abstract: A method of detecting a molecular species in an electronics processing environment is disclosed. The method exposes a capture substrate to the processing environment. The capture substrate has a surface area different from the surface area of an electronic substrate undergoing electronics processing. The molecular species is transferred from the environment to the capture substrate. A characteristic of the molecular species is identified, thereby detecting the species. Other methods utilize a capture substrate to remove the molecular species from an electronic processing environment, or use the capture substrate to determine the presence of a molecular species in a transfer container operating between two process environments or two intermediate process steps. Systems for carrying out the methods are also disclosed.

Abstract translation: 公开了一种在电子处理环境中检测分子种类的方法。 该方法将捕获衬底暴露于处理环境。 捕获基板具有与经历电子处理的电子基板的表面积不同的表面积。 分子物质从环境转移到捕获底物。 确定分子种类的特征，从而检测物种。 其他方法利用捕获底物从电子处理环境中除去分子物质，或使用捕获底物来确定在两个工艺环境或两个中间工艺步骤之间操作的转移容器中分子物质的存在。 还公开了用于实施方法的系统。

公开(公告)号：US07381243B2

公开(公告)日：2008-06-03

申请号：US10531512

申请日：2003-10-16

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Russell J. Holmes

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Russell J. Holmes

IPC: C01B31/20 ,  B01J20/06 ,  B01D53/04

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D2253/10 ,  B01D2253/112 ,  B01D2256/22 ,  B01D2257/104 ,  B01D2257/308 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/702 ,  B01D2257/80 ,  B01D2259/40083 ,  B01D2259/402 ,  B01J20/06 ,  B01J20/3433 ,  B01J20/3458 ,  B01J20/3483 ,  B01J2220/42 ,  C01B32/50 ,  Y02C10/08

Abstract: The invention is a method for the decontamination of CO2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.

Abstract translation: 本发明是一种将CO 2去污的方法，使其具有足够的纯度以使其可用于半导体工业。 本发明包括在适合除去污染物的条件下将流体CO 2 2暴露于至少一种金属的组合金属状态。 然后将吸附剂去污/活化，使吸附剂回到混合氧化态，并允许进一步的去污染。 吸附剂被选择为彼此互补，优先吸附不同的污染物。 此外，选择吸附剂进行不同的还原，使得在再生时，只有一部分金属被还原，并且吸附剂基本恢复到其初始状态。

公开(公告)号：US06869463B2

公开(公告)日：2005-03-22

申请号：US10692019

申请日：2003-10-23

Applicant: Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Joshua T. Cook

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Joshua T. Cook

IPC: B01D53/04 ,  B01J20/34

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D2259/40086 ,  B01J20/28057 ,  B01J20/3458 ,  B01J20/3491

Abstract: A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to ≦1 ppm contaminants.

Abstract translation: 描述了通过提供预处理或活化气体通过衬底的孔的强制对流来快速和经济地激活和/或预处理气体净化衬底的方法。 将气体泵送到含底物的容器中并升高到升高的压力，其保持较短的预定时间，然后排出容器的内容物。 将容器再次用吹扫气体加压到升高的水平，并且升高的压力保持较短的预定时间，然后排出容器。 根据需要或期望，经常重复该循环。 激活和/或预处理可以在更短的时间内完成，并且与扩散预处理和激活过程相比，气体使用量更少。 该方法特别适用于气体净化器基板的预处理和激活，用于将污染物净化至<= 1ppm污染物。

公开(公告)号：US07510692B2

公开(公告)日：2009-03-31

申请号：US10565353

申请日：2004-07-21

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Joshua T. Cook ,  Tram Doan Nguyen ,  Daniel A. Lev ,  Troy B. Scoggins

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Joshua T. Cook ,  Tram Doan Nguyen ,  Daniel A. Lev ,  Troy B. Scoggins

IPC: B01D53/38 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/72 ,  C09K3/00

CPC classification number: B01D53/86 ,  C01B3/56 ,  C01B6/34 ,  C01B25/06 ,  C01B33/04 ,  C01B35/02 ,  C01C1/024 ,  Y02E60/324

Abstract: A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

Abstract translation: 氢化物气体净化的方法使用具有至少一种镧系金属或镧系金属氧化物的材料。 该方法将污染物减少到小于百亿分之一（ppb），最好是10ppb，更优选1ppb。 该材料还可以包括过渡金属和过渡金属氧化物，稀土元素和其它金属氧化物。 本发明还包括用于本发明方法的材料。