公开(公告)号：US06664111B2

公开(公告)日：2003-12-16

申请号：US09935183

申请日：2001-08-22

Applicant: James G. Bentsen ,  Ralph R. Roberts ,  Orlin B. Knudson ,  Daniel Alvarez, Jr. ,  Michael J. Rude

Inventor： James G. Bentsen ,  Ralph R. Roberts ,  Orlin B. Knudson ,  Daniel Alvarez, Jr. ,  Michael J. Rude

IPC: G01N2164

CPC classification number: G01N21/6408 ,  G01N21/7703 ,  G01N31/225 ,  G01N2021/7786 ,  Y10T436/207497 ,  Y10T436/209163

Abstract: Sensing elements, sensor systems and methods for determining the concentration of oxygen and oxygen-related analytes in a medium are provided. The sensing element comprises a solid polymeric matrix material that is permeable to oxygen or an oxygen related analyte and an indicator that is covalently bonded to the solid polymeric matrix material. The indicator is a luminescent platinum group metal polyaromatic chelate complex capable of having its luminescence quenched by the presence of oxygen. The polyaromatic complex comprises three ligands, at least one of which is a bidentate diphenylphenanthroline. The polyaromatic complex is distributed substantially homogenously throughout the matrix material and is covalently bonded to the matrix material via a linker arm. The linker arm is attached to a phenyl group of a diphenylphenanthroline ligand and to the backbone of the polymeric matrix material. The sensor systems comprise the present sensing element, an excitation assembly, a detector assembly, and a processor assembly.

Abstract translation: 提供用于确定介质中氧和氧相关分析物浓度的感测元件，传感器系统和方法。 感测元件包括可渗透氧气或氧相关分析物的固体聚合物基体材料和共价键合到固体聚合物基质材料上的指示剂。 该指示剂是能够通过存在氧而使发光淬灭的发光铂族金属多芳族螯合络合物。 多芳族络合物包含三个配体，其中至少一个是双齿二苯基菲咯啉。 多芳族复合物基本均匀地分布在整个基质材料中，并通过连接臂与基质材料共价键合。 连接臂连接到二苯基菲咯啉配体的苯基和聚合物基质材料的主链上。 传感器系统包括本感测元件，激励组件，检测器组件和处理器组件。

公开(公告)号：US06391090B1

公开(公告)日：2002-05-21

申请号：US09824382

申请日：2001-04-02

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

IPC: B01D5304

CPC classification number: G03F7/70883 ,  B01D53/02 ,  B01D53/04 ,  B01D53/261 ,  B01D53/508 ,  B01D53/565 ,  B01D53/72 ,  B01D2253/108 ,  B01D2256/10 ,  B01D2256/18 ,  B01D2257/206 ,  B01D2257/306 ,  B01D2257/70 ,  B01D2257/702 ,  B01D2257/80 ,  B01J20/02 ,  B01J20/0207 ,  B01J20/0211 ,  B01J20/0214 ,  B01J20/0225 ,  B01J20/0229 ,  B01J20/0237 ,  B01J20/0244 ,  B01J20/06 ,  B01J20/08 ,  B01J20/103 ,  B01J20/18 ,  B01J2220/42 ,  G03F7/70925 ,  G03F7/70933

Abstract: A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.

Abstract translation: 描述了用于去除光刻和计量的污染敏感过程中气流中污染物的方法和组合物。 正电性金属组分，高二氧化硅沸石和后期过渡金属化合物的组合的协同效应影响气体中污染物的去除或还原，其干扰对于气体所需的ppb或ppt水平的透光率 适合这些用途。 中性极性分子，中性极性非质子分子，质子和非质子碱性分子，酸性极性物质和中性非极性非质子分子的去除是用要求保护的组合物完成的。 取决于污染物的类型，组合物组分各自为10至80体积份，总组合物限制为100体积份。

公开(公告)号：US08790506B2

公开(公告)日：2014-07-29

申请号：US12731114

申请日：2010-03-24

Applicant: Alexander David Deptala ,  Daniel Alvarez, Jr. ,  Arthur Deptala

Inventor： Alexander David Deptala ,  Daniel Alvarez, Jr. ,  Arthur Deptala

IPC: C01B3/50 ,  C01B3/02

CPC classification number: B01D53/229 ,  B01D53/22 ,  B01D53/326 ,  B01D63/06 ,  B01D71/32 ,  B01D2256/16 ,  B01D2257/502 ,  B01D2257/504 ,  B01D2313/345 ,  B01D2313/365 ,  C01B3/50 ,  C01B3/503 ,  H01M8/0662 ,  Y02C10/10 ,  Y02C20/30 ,  Y02P20/152

Abstract: A method of purifying a hydrogen stream using an electrochemical cell having an enclosed electrically conductive cylindrical outer shell and a hollow wet polymeric membrane located within and parallel to the longitudinal axis of the cylindrical member which provides an inner compartment and an outer compartment. An electrode having a longitudinal axis is located within the inner compartment and is spaced from the hollow polymeric membrane. A gas inlet for feeding a hydrogen stream that is to be purified communicates with the inner compartment and a gas outlet is provided for passing purified hydrogen gas thru the cylindrical outer shell. The electrode within the hollow wet polymeric membrane is connected to an anode terminal of a dc supply with an electrical conductor and the outer shell of the cylindrical shaped member is connected to a cathode terminal of the dc supply with another electrical conductor.

Abstract translation: 使用具有封闭的导电圆柱形外壳和位于圆柱形构件的纵向轴线内并平行于圆柱形构件的中空湿聚合物膜的电化学电池来净化氢气流的方法，其提供内隔室和外隔室。 具有纵向轴线的电极位于内部隔室内并与中空聚合物隔膜间隔开。 用于供给要净化的氢气流的气体入口与内部隔室相连，并且设置有气体出口，用于使纯化的氢气通过圆柱形外壳。 中空湿聚合物膜内的电极连接到具有电导体的直流电源的阳极端子，并且圆柱形构件的外壳通过另一电导体连接到直流电源的阴极端子。

公开(公告)号：US06524544B1

公开(公告)日：2003-02-25

申请号：US09699100

申请日：2000-10-27

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman

IPC: B01J2034

CPC classification number: B01J20/3458 ,  B01D15/00 ,  B01J20/06 ,  B01J20/28057 ,  B01J20/3433 ,  B01J20/3483 ,  B01J2220/56 ,  C01C1/024 ,  H01S3/005

Abstract: A method and apparatus for the decontamination of fluid ammonia are described. Liquid or gaseous ammonia is purified of contaminants by passage through an adsorbent bed, the contaminants accumulating in the bed. A portion of the purified ammonia discharged from the bed is decomposed to hydrogen and nitrogen. The hydrogen is used to regenerate an adsorbent bed which has accumulated sufficient contaminants to reduce its ability to further decontaminate incoming ammonia satisfactorily. Preferably there are a plurality of interconnected adsorbent beds, with some being operated for ammonia decontamination while others are being regenerated, with their operations being reversed as needed to maintain a continual production of decontaminated ammonia from the plurality of beds. Computers or other controllers can be used to control such bed operations and interchanges. Internal production of hydrogen makes the system self-contained and no addition of hydrogen is needed.

公开(公告)号：US06241955B1

公开(公告)日：2001-06-05

申请号：US09165791

申请日：1998-10-02

Applicant: Daniel Alvarez, Jr.

Inventor： Daniel Alvarez, Jr.

IPC: B01D5302

CPC classification number: C01B6/34 ,  C01B3/56 ,  C01B33/046 ,  C01B2203/042 ,  C01B2203/0465 ,  C01B2203/0475 ,  C01B2203/0495 ,  C01C1/024

Abstract: A process and apparatus for the decontamination of gaseous contaminants (especially oxygen, carbon dioxide and water vapor) from hydride gases (including their lower alkyl analogs) down to ≦100 ppb contaminant concentration are described. The critical component is a high surface area metal oxide substrate with reduced metal active sites, which in various physical forms is capable of decontaminating such gases to ≦100 ppb, ≦50 ppb or ≦10 ppb level without being detrimentally affected by the hydride gases. The surface area of the substrate will be ≧100 m2/g, and preferably 200-800 m2/g. Oxides of various metals, especially manganese or molybdenum, can be used, and mixtures of integrated oxides, or one type of oxide coated on another, may be used. The substrate is preferably retained in a hydride-gas-resistant container which is installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The invention provides final decontamination for hydride gas streams intended for gas- or vapor-deposition formation of high purity LED, laser (especially blue laser), electronic, optical or similar products, and can be used in combination with upstream preliminary decontamination process and/or upstream or downstream solid particulate removal units.

Abstract translation: 描述了从氢化物气体（包括它们的低级烷基类似物）至<= 100ppb的污染物浓度去除污染气体污染物（特别是氧气，二氧化碳和水蒸气）的方法和装置。 关键组分是具有降低的金属活性位点的高表面积金属氧化物底物，其以各种物理形式能够将这些气体净化至<= 100ppb，<= 50ppb或<= 10ppb水平，而不受不利影响 氢化物气体。 基材的表面积> 100m2 / g，优选为200-800m2 / g。 可以使用各种金属，特别是锰或钼的氧化物，并且可以使用一体化氧化物或另一种类型的氧化物的混合物。 基板优选保持在安装在气体供给管线中的氢化物 - 气体保护容器中，例如气体或蒸气沉积制造单元。 本发明为用于气相或气相沉积形成高纯度LED，激光（特别是蓝色激光），电子，光学或类似产品的氢化物气流提供最终的净化，并且可以与上游预净化过程和/ 或上游或下游固体颗粒去除单元。

公开(公告)号：US08075704B2

公开(公告)日：2011-12-13

申请号：US10523371

申请日：2004-06-01

Applicant: Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Russell J. Holmes ,  Allan Tram

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Russell J. Holmes ,  Allan Tram

IPC: B08B5/00

CPC classification number: B01D53/00 ,  B01D53/72 ,  B08B5/02 ,  B08B9/00 ,  C23G5/00 ,  H01L21/02046

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract translation: 本发明公开了一种从装置内的表面除去多种分子污染物的方法。 含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。 污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。 污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。

公开(公告)号：US07381243B2

公开(公告)日：2008-06-03

申请号：US10531512

申请日：2003-10-16

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Russell J. Holmes

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Russell J. Holmes

IPC: C01B31/20 ,  B01J20/06 ,  B01D53/04

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D2253/10 ,  B01D2253/112 ,  B01D2256/22 ,  B01D2257/104 ,  B01D2257/308 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/702 ,  B01D2257/80 ,  B01D2259/40083 ,  B01D2259/402 ,  B01J20/06 ,  B01J20/3433 ,  B01J20/3458 ,  B01J20/3483 ,  B01J2220/42 ,  C01B32/50 ,  Y02C10/08

Abstract: The invention is a method for the decontamination of CO2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.

Abstract translation: 本发明是一种将CO 2去污的方法，使其具有足够的纯度以使其可用于半导体工业。 本发明包括在适合除去污染物的条件下将流体CO 2 2暴露于至少一种金属的组合金属状态。 然后将吸附剂去污/活化，使吸附剂回到混合氧化态，并允许进一步的去污染。 吸附剂被选择为彼此互补，优先吸附不同的污染物。 此外，选择吸附剂进行不同的还原，使得在再生时，只有一部分金属被还原，并且吸附剂基本恢复到其初始状态。

公开(公告)号：US06869463B2

公开(公告)日：2005-03-22

申请号：US10692019

申请日：2003-10-23

Applicant: Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Joshua T. Cook

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Joshua T. Cook

IPC: B01D53/04 ,  B01J20/34

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D2259/40086 ,  B01J20/28057 ,  B01J20/3458 ,  B01J20/3491

Abstract: A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to ≦1 ppm contaminants.

Abstract translation: 描述了通过提供预处理或活化气体通过衬底的孔的强制对流来快速和经济地激活和/或预处理气体净化衬底的方法。 将气体泵送到含底物的容器中并升高到升高的压力，其保持较短的预定时间，然后排出容器的内容物。 将容器再次用吹扫气体加压到升高的水平，并且升高的压力保持较短的预定时间，然后排出容器。 根据需要或期望，经常重复该循环。 激活和/或预处理可以在更短的时间内完成，并且与扩散预处理和激活过程相比，气体使用量更少。 该方法特别适用于气体净化器基板的预处理和激活，用于将污染物净化至<= 1ppm污染物。

公开(公告)号：US07510692B2

公开(公告)日：2009-03-31

申请号：US10565353

申请日：2004-07-21

Applicant: Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Joshua T. Cook ,  Tram Doan Nguyen ,  Daniel A. Lev ,  Troy B. Scoggins

Inventor： Daniel Alvarez, Jr. ,  Jeffrey J. Spiegelman ,  Joshua T. Cook ,  Tram Doan Nguyen ,  Daniel A. Lev ,  Troy B. Scoggins

IPC: B01D53/38 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/72 ,  C09K3/00

CPC classification number: B01D53/86 ,  C01B3/56 ,  C01B6/34 ,  C01B25/06 ,  C01B33/04 ,  C01B35/02 ,  C01C1/024 ,  Y02E60/324

Abstract: A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

Abstract translation: 氢化物气体净化的方法使用具有至少一种镧系金属或镧系金属氧化物的材料。 该方法将污染物减少到小于百亿分之一（ppb），最好是10ppb，更优选1ppb。 该材料还可以包括过渡金属和过渡金属氧化物，稀土元素和其它金属氧化物。 本发明还包括用于本发明方法的材料。

公开(公告)号：US07189291B2

公开(公告)日：2007-03-13

申请号：US10683903

申请日：2003-10-10

Applicant: Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Allan Tram ,  Russell Holmes

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, Jr. ,  Allan Tram ,  Russell Holmes

IPC: B08B5/00

CPC classification number: B01D53/00 ,  B01D53/72 ,  B08B5/02 ,  B08B9/00 ,  C23G5/00 ,  H01L21/02046

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract translation: 本发明公开了一种从装置内的表面除去多种分子污染物的方法。 含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。 污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。 污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。