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11.发明授权Air conditioning system for semiconductor clean room including a chemical filter downstream of a humidifier 失效半导体洁净室的空调系统，包括加湿器下游的化学过滤器
公开(公告)号：US5890367A
公开(公告)日：1999-04-06
申请号：US899388
申请日：1997-07-23
申请人： Nam-hee You , Jung-sung Hwang , Gee-do Kim , Young-jin Han
发明人： Nam-hee You , Jung-sung Hwang , Gee-do Kim , Young-jin Han
CPC分类号： F24F3/161 , F24F2003/1682
摘要： An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.
摘要翻译： 用于半导体洁净室的空调系统包括在包括加湿器的空气调节器和洁净室的ULPA过滤器之间的化学过滤器，用于使用从加湿器供应的水分电离化学杂质，然后通过使用化学品吸附电离的化学杂质 过滤。 化学过滤器安装在加湿器的下游，该加湿器采用磷酸防止结垢形成。 该下游位置允许化学过滤器防止磷酸作为新的化学杂质被包含在新鲜空气中，这使得可以调节空气的温度和湿度，而不必使用特殊和昂贵的纯蒸汽系统。
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公开(公告)号：US08469650B2
公开(公告)日：2013-06-25
申请号：US12285982
申请日：2008-10-17
IPC分类号： H01L21/677 , G06F19/00
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
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公开(公告)号：US07988122B2
公开(公告)日：2011-08-02
申请号：US11937384
申请日：2007-11-08
申请人： Seok-Youn Kim , Jung-Sung Hwang , Ho-Young Lee , Do-Hyun Kwun , Jung-Shik Heo
发明人： Seok-Youn Kim , Jung-Sung Hwang , Ho-Young Lee , Do-Hyun Kwun , Jung-Shik Heo
IPC分类号： F16M1/00
CPC分类号： F16F15/02 , H01L21/6719
摘要： A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.
摘要翻译： 公开了一种振动控制基座及其安装方法，包括在将包括半导体设备的设备从一个振动控制基座移动到另一个振动控制基座的同时减小颗粒和振动的方法。 振动控制基座包括具有至少两个设备支撑单元的设备支撑体。 电池连接单元通过设备支撑单元的侧表面并将设备支撑单元彼此连接。 安装在设备支撑体下方的底部结构支撑设备支撑体。
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14.发明申请EXHAUST UNIT, EXHAUSTING METHOD, AND SEMICONDUCTOR MANUFACTURING FACILITY WITH THE EXHAUST UNIT 审中-公开排气装置，排气装置和排气装置的半导体制造设备公开(公告)号：US20080160905A1
公开(公告)日：2008-07-03
申请号：US11968039
申请日：2007-12-31
申请人： Moon-Jeong Kim , Kang-Ho Ahn , Suck-Hoon Kang , Jae-Young Lee , Jai-Heung Choi , Jung-Sung Hwang
发明人： Moon-Jeong Kim , Kang-Ho Ahn , Suck-Hoon Kang , Jae-Young Lee , Jai-Heung Choi , Jung-Sung Hwang
CPC分类号： F24F11/72 , F24F2110/40
摘要： Provided is an exhaust unit capable of preventing large pressure fluctuations within a process chamber due to atmospheric pressure changes. The exhaust unit includes a main exhaust duct and a supplemental exhaust duct that acts as a partial bypass. A flap is located at a downstream opening between the main exhaust duct and supplemental exhaust duct and controls the amount of bypassed gas flowing from the supplemental exhaust duct to the main exhaust duct. First and second plates of the flap are pivotally coupled to the main exhaust duct adjacent the downstream opening, the first plate colliding with gas flowing through the main exhaust duct and the second plate partially blocking bypassed gas flowing back into the main exhaust duct from the supplemental exhaust duct. When gas is exhausted through the main exhaust line and the supplemental exhaust duct, the flap passively controls the amount by which the supplemental exhaust duct is opened through fluctuations in atmospheric pressure.
摘要翻译： 提供了能够防止由于大气压变化而导致处理室内的大的压力波动的排气单元。 排气单元包括用作部分旁路的主排气管道和补充排气管道。 翼片位于主排气管道和补充排气管道之间的下游开口处，并且控制从辅助排气管道流向主排气管道的旁路气体的量。 翼片的第一和第二板与邻近下游开口的主排气管枢转连接，第一板与流经主排气管的气体相碰撞，第二板部分地阻挡旁路气体从辅助排出管道流回主排气管道 排气管。 当气体通过主排气管线和补充排气管道排出时，挡板被动地控制补充排气管道通过大气压力的波动而打开的量。
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15.发明申请Apparatus to suppress ascending gas flow and method for exhaust control thereof 审中-公开抑制上升气流的装置及其排气控制方法公开(公告)号：US20060002833A1
公开(公告)日：2006-01-05
申请号：US11150208
申请日：2005-06-13
申请人： Hyung-Seok Choi , Jung-Sung Hwang , Kyoung-Ho Park , Kil-Sun Ko , Yong-Woon Oh
发明人： Hyung-Seok Choi , Jung-Sung Hwang , Kyoung-Ho Park , Kil-Sun Ko , Yong-Woon Oh
IPC分类号： B01J8/04
CPC分类号： H01L21/67017 , H01L21/67034 , H01L21/67051 , H01L21/6715 , H01L21/67253
摘要： An apparatus and method for exhaust control. The apparatus may include a vessel to accommodate a gas flow of a gas, a sensor mounted on the vessel to sense a direction of the gas flow in the vessel, a conduit coupled to the vessel to exhaust the gas from the vessel, and a control unit that adjusts a flow rate of the gas through the conduit based on the direction of the gas flow in vessel sensed by the sensor. The method may include providing a gas flow of a gas in a vessel, sensing a direction of the gas flow in the vessel, exhausting the gas from the vessel at an exhaust flow rate, and adjusting the exhaust flow rate based on the sensed direction of the gas flow in the vessel.
摘要翻译： 一种排气控制装置和方法。 该装置可以包括容纳气体的气流的容器，安装在容器上的传感器以感测容器中的气体流动的方向，连接到容器以从容器排出气体的管道，以及控制器 单元，其基于由传感器感测的容器中的气体流的方向来调节通过导管的气体的流速。 该方法可以包括在容器中提供气体的气流，感测容器中的气体流动的方向，以排气流量从容器排出气体，并且基于检测到的方向调节排气流量 容器内的气体流动。
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公开(公告)号：US20050134823A1
公开(公告)日：2005-06-23
申请号：US11017783
申请日：2004-12-22
申请人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
发明人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
IPC分类号： H01L21/027 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70558
摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。
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公开(公告)号：US20080174057A1
公开(公告)日：2008-07-24
申请号：US11937384
申请日：2007-11-08
申请人： Seok-Youn KIM , Jung-Sung HWANG , Ho-Young LEE , Do-Hyun KWUN , Jung-Shik HEO
发明人： Seok-Youn KIM , Jung-Sung HWANG , Ho-Young LEE , Do-Hyun KWUN , Jung-Shik HEO
IPC分类号： F16F7/00
CPC分类号： F16F15/02 , H01L21/6719
摘要： A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.
摘要翻译： 公开了一种振动控制基座及其安装方法，包括在将包括半导体设备的设备从一个振动控制基座移动到另一个振动控制基座的同时减小颗粒和振动的方法。 振动控制基座包括具有至少两个设备支撑单元的设备支撑体。 电池连接单元通过设备支撑单元的侧表面并将设备支撑单元彼此连接。 安装在设备支撑体下方的底部结构支撑设备支撑体。
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18.发明授权公开(公告)号：US07047793B2
公开(公告)日：2006-05-23
申请号：US10728004
申请日：2003-12-03
申请人： Kun-Hyung Lee , Jung-Sung Hwang , Seung-Yeon Cho
发明人： Kun-Hyung Lee , Jung-Sung Hwang , Seung-Yeon Cho
IPC分类号： G01N29/02
CPC分类号： G01N29/022 , G01N2291/0423 , G01N2291/0426
摘要： A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.
摘要翻译： 用于检测预定物质的表面声波气体传感器包括压电基片，输入换能器和形成在压电基片上的输出换能器，以及形成在输入换能器和输出换能器之间的敏感膜，并检测至少一个 的丙酮，苯，二氯乙烷，乙醇和甲苯。 敏感膜包括巯基十一烷酸和由硝酸纤维素，邻苯二甲酸二丁酯，苯和乙醇的化合物，乙酸乙酯组成的CMP。 表面声波气体传感器可以快速检测到这些物质的少量。
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公开(公告)号：US20050115213A1
公开(公告)日：2005-06-02
申请号：US11032591
申请日：2005-01-10
申请人： Chang-Su Lim , Suk-Hee Im , Jung-Sung Hwang
发明人： Chang-Su Lim , Suk-Hee Im , Jung-Sung Hwang
摘要： A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.
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公开(公告)号：US06849100B2
公开(公告)日：2005-02-01
申请号：US10272319
申请日：2002-10-16
申请人： Chang-Su Lim , Suk-Hee Im , Jung-Sung Hwang
发明人： Chang-Su Lim , Suk-Hee Im , Jung-Sung Hwang
摘要： A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.
摘要翻译： 新鲜空气管道构造成将由空调系统过滤的新鲜空气引导到新鲜空气管道下游的洁净室，新鲜空气具有第一级的颗粒密度。 新鲜空气管道中的独立的颗粒过滤器位于空调系统的下游，并且位于洁净室的上游，被构造成进一步过滤新鲜空气，以提供其中具有第二级别的颗粒密度的过滤的新鲜空气，其中小于 一级 还公开了相关方法。
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