公开(公告)号：US20110189925A1

公开(公告)日：2011-08-04

申请号：US13012692

申请日：2011-01-24

Applicant: Hassan G. Iravani ,  Kun Xu ,  Boguslaw A. Swedek ,  Yuchun Wang ,  Wen-Chiang Tu

Inventor： Hassan G. Iravani ,  Kun Xu ,  Boguslaw A. Swedek ,  Yuchun Wang ,  Wen-Chiang Tu

IPC: B24B49/00

CPC classification number: H01L22/14 ,  B24B37/013 ,  B24B37/205 ,  B24B49/105 ,  H01L21/3212 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus for chemical mechanical polishing includes a platen having a surface to support a polishing pad, and an eddy current monitoring system to generate an eddy current signal. The eddy current monitoring system includes a core and a coil wound around a portion of the core. The core includes a back portion, a first prong extending from the back portion in a first direction normal to the surface of the platen and having a width in a second direction parallel to the surface of the platen, and second and third prongs extending from the back portion in parallel with the first protrusion, the second and third prongs positioned on opposite sides of and equidistant from the first prong. A spacing between each of the second and third prongs and the first prong is approximately equal to twice the width of the first prong.

Abstract translation: 用于化学机械抛光的设备包括具有支撑抛光垫的表面的压板和用于产生涡流信号的涡流监测系统。 涡流监视系统包括绕芯部的一部分缠绕的芯线圈和线圈。 该芯包括一个后部，一个第一叉脚，从第一方向延伸到第一方向上，该平行于压板的表面的第二方向上的第二方向从第二方向延伸， 后部部分与第一突起平行，第二和第三插脚定位在与第一插脚相对并且等距离的第一插脚上。 第二和第三插脚和第一插脚中的每一个之间的间隔大致等于第一插脚宽度的两倍。

公开(公告)号：US20110189856A1

公开(公告)日：2011-08-04

申请号：US13014558

申请日：2011-01-26

Applicant: Kun Xu ,  Hassan G. Iravani ,  Boguslaw A. Swedek ,  Yuchun Wang ,  Wen-Chiang Tu

Inventor： Kun Xu ,  Hassan G. Iravani ,  Boguslaw A. Swedek ,  Yuchun Wang ,  Wen-Chiang Tu

IPC: H01L21/306 ,  B24B49/10

CPC classification number: B24B37/013 ,  B24B37/042 ,  B24B49/105 ,  H01L21/3212 ,  H01L22/14 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of chemical mechanical polishing a metal layer on a substrate includes polishing the metal layer on the substrate at first and second polishing stations, monitoring thickness of the metal layer during polishing at the first and second polishing station with first and second eddy current monitoring systems having different resonant frequencies, and controlling pressures applied by a carrier head to the substrate during polishing at the first and second polishing stations to improve uniformity based on thickness measurements from the first and second eddy current monitoring systems.

Abstract translation: 在基板上进行化学机械抛光金属层的方法包括：在第一和第二抛光台处抛光基板上的金属层，在第一和第二抛光站用第一和第二涡流监测系统监测在抛光过程中金属层的厚度 具有不同的谐振频率，以及在第一和第二抛光站的抛光过程中由载体头施加到基底上的压力，以改善基于来自第一和第二涡流监测系统的厚度测量的均匀性。

公开(公告)号：US07894440B2

公开(公告)日：2011-02-22

申请号：US12404140

申请日：2009-03-13

Applicant: Kun Xu ,  David Kramer

Inventor： Kun Xu ,  David Kramer

IPC: H04L12/56

CPC classification number: H04L45/00 ,  H04L45/745

Abstract: Techniques have been developed to facilitate concurrent evaluation of hash rule entries in ways that allow an implementation to maintain a deterministic resultant hash irrespective of variations in the allocation of particular rules to particular storage banks or evaluation logic, such as may occur with rule set revisions. Similarly, uniform deterministic hash results can be assured even across a range of implementations that support greater or lesser levels of concurrent rule evaluations.

Abstract translation: 已经开发了技术来促进哈希规则条目的并发评估，其方式允许实现维持确定性的合成散列，而不管特定规则对特定存储库或评估逻辑的分配的变化，例如可能随规则集修订而发生。 类似地，即使在支持更多或更少级别的并发规则评估的一系列实现中，也可以确保统一的确定性散列结果。

公开(公告)号：US20100130013A1

公开(公告)日：2010-05-27

申请号：US12622251

申请日：2009-11-19

Applicant: Feng Q. Liu ,  Alain Duboust ,  Wen-Chiang Tu ,  Chenhao Ge ,  Kun Xu ,  Yuchun Wang ,  Yufei Chen

Inventor： Feng Q. Liu ,  Alain Duboust ,  Wen-Chiang Tu ,  Chenhao Ge ,  Kun Xu ,  Yuchun Wang ,  Yufei Chen

IPC: H01L21/306 ,  H01L21/304 ,  C09K13/06 ,  C11D3/20

CPC classification number: C11D3/3947 ,  C09G1/02 ,  C09K3/1463 ,  C11D7/08 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1683

Abstract: A CMP method for polishing a phase change alloy on a substrate surface including positioning the substrate comprising a phase change alloy material on a platen containing a polishing pad and delivering a polishing slurry to the polishing pad. The polishing slurry includes colloidal particles with a particle size less than 60 nm, in an amount between 0.2% to about 10% by weight of slurry, a pH adjustor, a chelating agent, an oxidizing agent in an amount less than 1% by weight of slurry, and polyacrylic acid. The substrate on the platen is polished to remove a portion of the phase change alloy. A rinsing solution for rinsing the substrate on the platen includes deionized water and at least one component in the deionized water where the component selected from the group consisting of polyethylene imine, polyethylene glycol, polyacrylic amide, alcohol ethoxylates, polyacrylic acid, an azole containing compound, benzo-triazole, and combinations thereof.

Abstract translation: 一种用于在衬底表面上抛光相变合金的CMP方法，包括将包含相变合金材料的衬底定位在包含抛光垫的压板上并将抛光浆料输送到抛光垫。 抛光浆料包括粒度小于60nm的胶体颗粒，其浆料重量为0.2％至约10％，pH调节剂，螯合剂，小于1重量％的氧化剂 的浆料和聚丙烯酸。 抛光台板上的基板以除去一部分相变合金。 用于冲洗台板上的基材的冲洗溶液包括去离子水和去离子水中的至少一种组分，其中选自聚乙烯亚胺，聚乙二醇，聚丙烯酰胺，醇乙氧基化物，聚丙烯酸，含唑化合物 ，苯并三唑及其组合。

公开(公告)号：US20090112876A1

公开(公告)日：2009-04-30

申请号：US11928489

申请日：2007-10-30

Applicant: CUNEYT KARUL ,  KUN XU

Inventor： CUNEYT KARUL ,  KUN XU

IPC: G06F17/30

CPC classification number: G06Q30/02 ,  G06F2221/2101 ,  G06F2221/2151

Abstract: A method and system for providing dynamic branding for a computer program or suite having windows, screens, display elements in a graphical interface. The system comprises a branding service module and a branding files database. The database includes a schema for storing and accessing the branding files. The branding files comprise graphical elements and/or textual elements, which can be modified and updated.

Abstract translation: 一种用于为具有图形界面中的窗口，屏幕，显示元素的计算机程序或套件提供动态品牌的方法和系统。 该系统包括品牌服务模块和品牌文件数据库。 数据库包括用于存储和访问品牌文件的模式。 品牌文件包括可以修改和更新的图形元素和/或文本元素。

公开(公告)号：US20080254722A1

公开(公告)日：2008-10-16

申请号：US11734063

申请日：2007-04-11

Applicant: Kun Xu ,  Jimin Zhang ,  James C. Wang ,  Thomas H. Osterheld ,  Yutao Ma ,  Steve M. Zuniga ,  Jin Xi

Inventor： Kun Xu ,  Jimin Zhang ,  James C. Wang ,  Thomas H. Osterheld ,  Yutao Ma ,  Steve M. Zuniga ,  Jin Xi

IPC: B24B21/18

CPC classification number: B24B53/017 ,  B24B29/005 ,  B24B53/12

Abstract: A pad conditioner is provided for conditioning a polishing pad in chemical mechanical planarization (CMP). The pad conditioner comprises a plastic abrasive portion having a first hardness and optionally a brush portion having a second hardness less than the first hardness. The plastic abrasive portion comprises a base plate and a plurality of plastic nodules formed on a surface of the base plate, each of the plastic nodules having a planar top surface, wherein the planar top surface is positioned to substantially contact a polishing pad. The brush portion may be positioned adjacent to the plastic abrasive portion, the brush portion having a plurality of brush elements positioned to substantially contact the pad.

Abstract translation: 提供了用于在化学机械平面化（CMP）中调理抛光垫的衬垫调节器。 衬垫调节剂包括具有第一硬度的塑料磨料部分和任选地具有小于第一硬度的第二硬度的刷部分。 塑料研磨部分包括基板和形成在基板的表面上的多个塑料结节，每个塑料结节具有平坦的顶表面，其中平面顶表面被定位成基本接触抛光垫。 刷部分可以定位成与塑料研磨部分相邻，刷部分具有多个刷子元件，其定位成基本上接触焊盘。

公开(公告)号：USD943383S1

公开(公告)日：2022-02-15

申请号：US29775901

申请日：2021-03-25

Applicant: Kun Xu

Designer： Kun Xu

公开(公告)号：US09733981B2

公开(公告)日：2017-08-15

申请号：US14300762

申请日：2014-06-10

Applicant: Tommi M. Jokinen ,  Michael Kardonik ,  David B. Kramer ,  Peter W. Newton ,  John F. Pillar ,  Kun Xu

Inventor： Tommi M. Jokinen ,  Michael Kardonik ,  David B. Kramer ,  Peter W. Newton ,  John F. Pillar ,  Kun Xu

IPC: G06F9/48 ,  G06F9/46

CPC classification number: G06F9/4881 ,  G06F2209/484

Abstract: A data processing system includes a processor core and a hardware module. The processor core performs tasks on data packets. The ordering scope manager stores a first value in a first storage location. The first value indicates that exclusive execution of a first task in a first ordering scope is enabled. In response to a relinquish indicator being received, the ordering scope manager stores a second value in the first storage location. The second value indicates that the exclusively execution of the first task in the first ordering scope is disabled.

公开(公告)号：US09542238B2

公开(公告)日：2017-01-10

申请号：US13900761

申请日：2013-05-23

Applicant: Kun Xu ,  Tommi M. Jokinen ,  Zheng Xu

Inventor： Kun Xu ,  Tommi M. Jokinen ,  Zheng Xu

IPC: G06F9/46 ,  G06F9/52 ,  G06F9/48 ,  G06F9/50

CPC classification number: G06F9/526 ,  G06F9/46 ,  G06F9/4843 ,  G06F9/4881 ,  G06F9/5016 ,  G06F9/52

Abstract: A multi-core system configured to execute a plurality of tasks and having a semaphore engine and a direct memory access (DMA) engine capable of selecting, by a task scheduler of a first core, a first task for execution by the first core. In response to a semaphore lock request, the task scheduler of the first core switches the first task to an inactive state and selects a next task for execution by the first core. After the semaphore engine acquires the semaphore lock of the first semaphore, a data transfer request is provided to the DMA engine. In response to the data transfer request, the DMA engine transfers data associated with the locked first semaphore to the entry of the workspace of the first core.

Abstract translation: 一种多核系统，被配置为执行多个任务并具有能够由第一核心的任务调度器选择由第一核执行的第一任务的信号引擎和直接存储器访问（DMA）引擎。 响应于信号量锁定请求，第一核心的任务调度器将第一任务切换到非活动状态，并选择下一任务以由第一核执行。 在信号引擎获取第一信号量的信号锁之后，向DMA引擎提供数据传输请求。 响应于数据传输请求，DMA引擎将与锁定的第一信号量相关联的数据传送到第一核心的工作空间的入口。

公开(公告)号：US20150355938A1

公开(公告)日：2015-12-10

申请号：US14300762

申请日：2014-06-10

Applicant: Tommi M. Jokinen ,  Michael Kardonik ,  David B. Kramer ,  Peter W. Newton ,  John F. Pillar ,  Kun Xu

Inventor： Tommi M. Jokinen ,  Michael Kardonik ,  David B. Kramer ,  Peter W. Newton ,  John F. Pillar ,  Kun Xu

IPC: G06F9/48

CPC classification number: G06F9/4881 ,  G06F2209/484

Abstract: A data processing system includes a processor core and a hardware module. The processor core performs tasks on data packets. The ordering scope manager stores a first value in a first storage location. The first value indicates that exclusive execution of a first task in a first ordering scope is enabled. In response to a relinquish indicator being received, the ordering scope manager stores a second value in the first storage location. The second value indicates that the exclusively execution of the first task in the first ordering scope is disabled.

Abstract translation: 数据处理系统包括处理器核心和硬件模块。 处理器内核在数据包上执行任务。 订购范围管理器将第一个值存储在第一个存储位置。 第一个值表示启用第一个排序范围中的第一个任务的独占执行。 响应于接收到的放弃指示符，订购范围管理器将第二值存储在第一存储位置中。 第二个值表示第一个排序范围中的第一个任务的排他性执行被禁用。