Data receiver and data receiving method
    11.
    发明授权
    Data receiver and data receiving method 有权
    数据接收和数据接收方式

    公开(公告)号:US07741880B2

    公开(公告)日:2010-06-22

    申请号:US11677779

    申请日:2007-02-22

    IPC分类号: H03K5/22

    CPC分类号: H03K5/2481 H04L25/0292

    摘要: A data receiver and a data receiving method in which the data receiver generates two comparison signals based on amplitude modulated differential input signals, amplifies the comparison signals, compares amplified signals, and outputs logic operation results based on the amplitude modulated differential input signals and the comparison signals, thereby detecting data bits. Accordingly, the number of necessary amplifiers and comparators is reduced and a separate reference voltage generator is not needed, so that chip size reduction and low-power operation is accomplished.

    摘要翻译: 数据接收机和数据接收方法,其中数据接收机基于幅度调制的差分输入信号产生两个比较信号,放大比较信号,比较放大的信号,并基于幅度调制的差分输入信号和比较输出逻辑运算结果 信号,从而检测数据位。 因此,减少了必要的放大器和比较器的数量,并且不需要单独的参考电压发生器,从而实现了芯片尺寸减小和低功率操作。

    Pixel sensors using nonlinear capacitance with logarithmic characteristics
    12.
    发明授权
    Pixel sensors using nonlinear capacitance with logarithmic characteristics 有权
    使用具有对数特性的非线性电容的像素传感器

    公开(公告)号:US07573017B2

    公开(公告)日:2009-08-11

    申请号:US11859086

    申请日:2007-09-21

    IPC分类号: H01J40/14 H01L27/00

    摘要: Disclosed herein is an active pixel sensor having a first transistor amplifying voltage generated in response to light at an integration node; a second transistor selects a specific pixel from a pixel array; a third transistor resets voltage of the integration node to voltage supplied from VDD during a reset period; a fourth transistor connects a photogate capacitance to the integration node increasing a dynamic range when the voltage of the integration node is VDD-Vth; a fifth transistor generates a signal voltage in a logarithmic response to light when the voltage of the integration node is logarithmic bias voltage-Vth; and a photodiode to convert photons into electron pairs in a depletion layer, causing signal charges to be accumulated when light is incident from outside.

    摘要翻译: 这里公开了一种有源像素传感器,其具有响应于集成节点处的光而产生的第一晶体管放大电压; 第二晶体管从像素阵列中选择特定像素; 在复位期间,第三晶体管将积分节点的电压复位为从VDD提供的电压; 第四晶体管将光栅电容连接到积分节点,当积分节点的电压为VDD-Vth时增加动态范围; 当积分节点的电压为对数偏置电压Vth时,第五晶体管产生对光的对数响应的信号电压; 以及用于将光子转换成耗尽层中的电子对的光电二极管,当光从外部入射时,引起信号电荷的累积。

    Tunneling diode logic IC using CML-type input driving circuit configuration and monostable bistable transition logic element (MOBILE)
    13.
    发明授权
    Tunneling diode logic IC using CML-type input driving circuit configuration and monostable bistable transition logic element (MOBILE) 有权
    隧道二极管逻辑IC采用CML型输入驱动电路配置和单稳态双稳态转换逻辑元件(MOBILE)

    公开(公告)号:US07403032B2

    公开(公告)日:2008-07-22

    申请号:US11153138

    申请日:2005-06-15

    IPC分类号: H03K19/195

    CPC分类号: B82Y10/00 H03K3/315 H03K19/10

    摘要: The present invention relates to CML(Current Mode Logic)-type input driving method and tunneling diode logic using MOBILE(Monostable Nistable transition Logic Element) configuration, as kinds of very high-speed digital logic circuits.The objectives of the present invention are to improve the disadvantage of MOBILE circuit configuration that is an existing tunneling diode logic, and at the same time provide new MOBILE based logic functions. Wherein, the difficulty for input voltage adjustment is resolved by replacing the input part with a CML input driving gate, and speed problem due to transistor is resolved. Moreover, a plurality of logic functions such as inverted return-to-zero D flip-flop, non-inverted return-to-zero D flip-flop, return-to-zero OR gate, return-to-zero D flip-flop generating differential output, and optical flip-flop are implemented.

    摘要翻译: 本发明涉及使用MOBILE(单稳态Nistable转换逻辑元件)配置的CML(电流模式逻辑)型输入驱动方法和隧道二极管逻辑,作为非常高速数字逻辑电路的种类。 本发明的目的是改进作为现有隧道二极管逻辑的MOBILE电路配置的缺点,同时提供新的基于MOBILE的逻辑功能。 其中,通过用CML输入驱动门代替输入部分来解决输入电压调整的难度,解决晶体管导致的速度问题。 此外,还有多个逻辑功能,例如反向归零D触发器,非反相返回到零D触发器,归零或或门,归零D触发器 产生差分输出和光学触发器。

    HIGH SENSITIVITY AND HIGH DYNAMIC-RANGE CMOS IMAGE SENSOR PIXEL STRUCTURE WITH DYNAMIC C-V CHARACTERISTICS
    14.
    发明申请
    HIGH SENSITIVITY AND HIGH DYNAMIC-RANGE CMOS IMAGE SENSOR PIXEL STRUCTURE WITH DYNAMIC C-V CHARACTERISTICS 有权
    高灵敏度和高动态范围的具有动态C-V特性的CMOS图像传感器像素结构

    公开(公告)号:US20080029794A1

    公开(公告)日:2008-02-07

    申请号:US11463679

    申请日:2006-08-10

    IPC分类号: H01L31/113

    摘要: A new photogate pixel structure for high performance CMOS Image Sensors is proposed. A new photogate structure is incorporated into the photodiode active-pixel structure. The proposed pixel structure exhibits the dynamic integration capacitance characteristics, which can be controlled by varying the control-voltage at the photogate node. Since the sensitivity is inversely proportional to the integration capacitance, the dynamic integration capacitance characteristics can provide the new functionality and controllability for high sensitivity and high dynamic range. At a low voltage level of the photogate, the pixel sensitivity of the new photogate pixel structure is maximized due to the minimum value of the integration capacitance. At a high voltage of the photogate, the dynamic range of the new structure can be maximized due to the increased well capacity. In addition, at an optimum bias voltage of the photogate, both the dynamic-range and the sensitivity can be simultaneously improved. Consequently, the new pixel structure allows performance tunability as well as optimization in both the dynamic range and the sensitivity of the image sensor cell.

    摘要翻译: 提出了一种用于高性能CMOS图像传感器的新型光栅像素结构。 新的光栅结构被并入到光电二极管有源像素结构中。 所提出的像素结构表现出动态积分电容特性,其可以通过改变光栅节点处的控制电压来控制。 由于灵敏度与积分电容成反比,动态积分电容特性可为高灵敏度和高动态范围提供新的功能和可控性。 在光栅的低电压电平下,由于积分电容的最小值,新的光栅像素结构的像素灵敏度最大化。 在光栅的高电压下,由于井容量的增加,新结构的动态范围可以最大化。 另外,在光栅的最佳偏置电压下,可以同时提高动态范围和灵敏度。 因此,新的像素结构允许性能可调性以及图像传感器单元的动态范围和灵敏度的优化。

    High sensitivity and high dynamic-range CMOS image sensor pixel structure with dynamic C-V characteristics
    15.
    发明申请
    High sensitivity and high dynamic-range CMOS image sensor pixel structure with dynamic C-V characteristics 审中-公开
    高灵敏度和高动态范围CMOS图像传感器像素结构具有动态C-V特性

    公开(公告)号:US20070252073A1

    公开(公告)日:2007-11-01

    申请号:US11653438

    申请日:2007-01-16

    IPC分类号: H04N3/14

    摘要: A new photogate pixel structure for high performance CMOS Image Sensors is proposed. A new photogate structure is incorporated into the photodiode active-pixel structure. The proposed pixel structure exhibits the dynamic integration capacitance characteristics, which can be controlled by varying the control-voltage at the photogate node. Since the sensitivity is inversely proportional to the integration capacitance, the dynamic integration capacitance characteristics can provide the new functionality and controllability for high sensitivity and high dynamic range. At a low voltage level of the photogate, the pixel sensitivity of the new photogate pixel structure is maximized due to the minimum value of the integration capacitance. At a high voltage of the photogate, the dynamic range of the new structure can be maximized due to the increased well capacity. In addition, at an optimum bias voltage of the photogate, both the dynamic-range and the sensitivity can be simultaneously improved. Consequently, the new pixel structure allows performance tunability as well as optimization in both the dynamic range and the sensitivity of the image sensor cell.

    摘要翻译: 提出了一种用于高性能CMOS图像传感器的新型光栅像素结构。 新的光栅结构被并入到光电二极管有源像素结构中。 所提出的像素结构表现出动态积分电容特性,其可以通过改变光栅节点处的控制电压来控制。 由于灵敏度与积分电容成反比,动态积分电容特性可为高灵敏度和高动态范围提供新的功能和可控性。 在光栅的低电压电平下,由于积分电容的最小值,新的光栅像素结构的像素灵敏度最大化。 在光栅的高电压下,由于井容量的增加,新结构的动态范围可以最大化。 另外,在光栅的最佳偏置电压下,可以同时提高动态范围和灵敏度。 因此,新的像素结构允许性能可调性以及图像传感器单元的动态范围和灵敏度的优化。

    RTD-HBT DIFFERENTIAL OSCILLATOR TOPOLOGY
    16.
    发明申请
    RTD-HBT DIFFERENTIAL OSCILLATOR TOPOLOGY 失效
    RTD-HBT差异振荡器拓扑学

    公开(公告)号:US20080042762A1

    公开(公告)日:2008-02-21

    申请号:US11463669

    申请日:2006-08-10

    IPC分类号: H03B7/08

    摘要: The new RTD-HBT differential oscillator circuit topology is proposed. At the nodes of the inductors and varactors in the conventional differential oscillator topology, each the RTD is attached to increase the magnitude of the negative conductance, which results in performance improvement in both the RF output power and phase noise. And, the differential sinusoidal voltage waveform which is essential for the wireless communication system are generated. In addition, the DC power consumption RTD-HBT differential oscillator circuit is similar to the conventional HBT differential oscillator due to the small DC power consumption performance of the RTD.

    摘要翻译: 提出了新的RTD-HBT差分振荡器电路拓扑结构。 在常规差分振荡器拓扑中的电感器和变容二极管的节点处,每个RTD被连接以增加负电导的幅度,这导致RF输出功率和相位噪声两者的性能改善。 并且,产生对于无线通信系统必不可少的差分正弦电压波形。 此外,直流功耗RTD-HBT差分振荡电路由于RTD的小直流功耗特性,与传统的HBT差分振荡器相似。

    Method of reducing device parasitic capacitance using underneath crystallographically selective wet etching
    17.
    发明授权
    Method of reducing device parasitic capacitance using underneath crystallographically selective wet etching 失效
    使用晶体选择性湿蚀刻下降器件寄生电容的方法

    公开(公告)号:US06780702B2

    公开(公告)日:2004-08-24

    申请号:US10271246

    申请日:2002-10-15

    IPC分类号: H01L218249

    摘要: When InP DHBTs are located in parallel to a crystallographical direction of , there are several advantages in the aspect of device property such as reliability. But, in case of a direction parallel to a general , there exists the limitation in reducing base-collector parasitic capacitance only by collector over-etching technique due to poor lateral-etching characteristic of the InP collector. To overcome such a problem mentioned above and improve device performance, the present invention provides a method of reducing parasitic capacitance using underneath crystallographically selective wet etching, thereby providing a self-alignable, structurally stable device.

    摘要翻译: 当InP DHBT平行于<011>的晶体学方向时,在诸如可靠性的器件特性方面存在若干优点。 但是,在平行于一般<011>的方向的情况下,由于InP集电极的横向蚀刻特性差,存在仅通过集电极过蚀刻技术来减小集电极的寄生电容的限制。为了克服这种问题 提高了器件性能,本发明提供了一种使用晶体选择性湿蚀刻下降寄生电容的方法,从而提供了可自对准的结构稳定的器件。

    Fabrication method of submicron gate using anisotropic etching

    公开(公告)号:US06372594B1

    公开(公告)日:2002-04-16

    申请号:US09749785

    申请日:2000-12-28

    IPC分类号: H01L21331

    摘要: Disclosed is a method for fabricating a self-aligned submicron gate electrode using an anisotropic etching process. The method involves the steps of laminating a dummy emitter defining a dummy emitter region over a heterojunction bipolar transistor structure including layers sequentially formed over a semiconductor substrate to define a base region, an emitter region, and an emitter cap region, respectively, defining a line having a width of about 1 micron on the dummy emitter by use of a photoresist while using a contact aligner, selectively anisotropic etching the dummy emitter at a region where the line is defined, to allow the dummy emitter to have an etched portion having a bottom surface with a width less than the width of the line defined by the photoresist, and depositing a contact metal on the etched portion of the dummy emitter, thereby forming a gate. In accordance with the present invention, a reliable submicron gate can be fabricated using a simple anisotropic wet etch process and an inexpensive contact aligner. Accordingly, the manufacturing costs can be reduced. In the formation of a base electrode involved in the fabrication of an HBT device, the present invention also provides an effect of reducing the distance between a base and an emitter, thereby achieving a reduction in base resistance, by virtue of a self-alignment using a V-shaped submicron gate.