公开(公告)号：US20120183693A1

公开(公告)日：2012-07-19

申请号：US13424011

申请日：2012-03-19

申请人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

发明人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

IPC分类号： B05D3/00

CPC分类号： H01L21/67051

摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

摘要翻译： 一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围​​绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

公开(公告)号：US20120160278A1

公开(公告)日：2012-06-28

申请号：US13337533

申请日：2011-12-27

申请人： Jiro HIGASHIJIMA ,  Nobuhiro OGATA ,  Satoshi KANEKO ,  Shuichi NAGAMINE ,  Yoshihiro KAI

发明人： Jiro HIGASHIJIMA ,  Nobuhiro OGATA ,  Satoshi KANEKO ,  Shuichi NAGAMINE ,  Yoshihiro KAI

IPC分类号： B08B3/00

CPC分类号： H01L21/6708 ,  H01L21/67051 ,  H01L21/68728

摘要： Disclosed is a liquid treatment apparatus for processing a lower surface of the substrate. The apparatus includes a first nozzle disposed below a lower surface of the substrate retained by the substrate retaining unit to eject a treatment liquid towards the lower surface of the substrate, the first nozzle having a plurality of first ejection ports, which are arrayed from a position opposing a central portion of the substrate retained by the substrate retaining unit to a position opposing a peripheral portion of the substrate retained by the substrate retaining unit. An ejecting direction of the treatment liquid ejected from the first ejection port is inclined towards a rotation direction of the substrate rotated by the rotational driving unit.

摘要翻译： 公开了一种用于处理基板的下表面的液体处理装置。 该设备包括设置在基板保持单元保持的基板的下表面下方的第一喷嘴，以朝向基板的下表面喷射处理液体，第一喷嘴具有多个第一喷射口，其从位置 将由基板保持单元保持的基板的中心部分相对于与由基板保持单元保持的基板的周边部分相对的位置。 从第一喷射口喷出的处理液的排出方向朝着由旋转驱动单元旋转的基板的旋转方向倾斜。

公开(公告)号：US20110297257A1

公开(公告)日：2011-12-08

申请号：US13151577

申请日：2011-06-02

申请人： Nobuhiro OGATA ,  Shuichi Nagamine

发明人： Nobuhiro OGATA ,  Shuichi Nagamine

IPC分类号： F03B11/02

CPC分类号： H01L21/67051 ,  Y10T137/8593

摘要： A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.

摘要翻译： 基板液体处理装置包括：被配置为保持基板的放置台，构造成旋转放置台的旋转驱动单元，配置成将液体供给到放置在放置台上的基板的液体供给单元，以及上部液体引导杯 ，中央液体引导杯和下部液体引导杯，其从顶部起依次设置并且被配置为向下引导从放置在放置台上的旋转基板的液体散射。 驱动机构被构造成上下液体引导杯，中央液引导杯和下液体引导杯上下移动。 驱动机构连接到中央液体引导杯。

公开(公告)号：US20110220216A1

公开(公告)日：2011-09-15

申请号：US13114346

申请日：2011-05-24

申请人： Tsunenaga NAKASHIMA ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

发明人： Tsunenaga NAKASHIMA ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

IPC分类号： B23P11/00

CPC分类号： G03F7/162 ,  Y10T137/0402

摘要： A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

摘要翻译： 一种液体处理装置，通过从供给喷嘴向所述表面供给处理液，处理基本上水平地保持在壳体的台架上的基板的表面。 液体处理装置包括：杯体，其设置成围绕保持在基板保持部的基板侧面，杯体从其上方可拆卸地安装在壳体内的基座上; 可拆卸地保持杯体的杯体保持部; 以及升降机构，其在所述杯体安装在所述基体上的第一位置与位于所述第一位置上方的第二位置之间上下移动所述杯体保持部。

公开(公告)号：US20090285984A1

公开(公告)日：2009-11-19

申请号：US12394690

申请日：2009-02-27

申请人： Takahiro KITANO ,  Koichi OBATA ,  Hiroichi INADA ,  Nobuhiro OGATA

发明人： Takahiro KITANO ,  Koichi OBATA ,  Hiroichi INADA ,  Nobuhiro OGATA

IPC分类号： B05D1/02 ,  B05C11/02

CPC分类号： G03F7/162 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.

摘要翻译： 涂布装置包括驱动单元，其构造成使基板保持构件绕垂直轴线旋转，从而通过离心力向基板的前侧中央部分供给的涂布液向基板的前侧周边部分扩散。 该装置设置有摆动阻尼机构，该摆动阻尼机构包括气体输送口和吸入口，两者设置为面对基板的背面，并且构造成通过从输送口输送气体来吸收正在旋转的基板的摆动并吸入 气体进入吸入口。

公开(公告)号：US20080280054A1

公开(公告)日：2008-11-13

申请号：US12106747

申请日：2008-04-21

申请人： Nobuhiro OGATA ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

发明人： Nobuhiro OGATA ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

IPC分类号： B05D1/40 ,  B05B15/04 ,  B05B13/02 ,  B08B3/04 ,  B08B13/00

CPC分类号： H01L21/67051

摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

摘要翻译： 一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围​​绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

公开(公告)号：US20080092813A1

公开(公告)日：2008-04-24

申请号：US11907291

申请日：2007-10-10

申请人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

发明人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

IPC分类号： B05B7/00 ,  B05C11/00 ,  B66B17/00

CPC分类号： G03F7/162 ,  Y10T137/0402

摘要： A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

摘要翻译： 一种液体处理装置，通过从供给喷嘴向所述表面供给处理液，处理基本上水平地保持在壳体的台架上的基板的表面。 液体处理装置包括：杯体，其设置成围绕保持在基板保持部的基板侧面，杯体从其上方可拆卸地安装在壳体内的基座上; 可拆卸地保持杯体的杯体保持部; 以及升降机构，其在所述杯体安装在所述基体上的第一位置与位于所述第一位置上方的第二位置之间上下移动所述杯体保持部。

公开(公告)号：US09484230B2

公开(公告)日：2016-11-01

申请号：US13151610

申请日：2011-06-02

申请人： Nobuhiro Ogata ,  Shuichi Nagamine

发明人： Nobuhiro Ogata ,  Shuichi Nagamine

IPC分类号： B08B3/00 ,  H01L21/00 ,  H01L21/67

CPC分类号： H01L21/67051

摘要： A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in this order from the top and are configured to respectively guide downward the process-liquid scattering from the rotating substrate while being held by the substrate holding table; and a position adjustment mechanism adjusting a positional relationship between the first and second guide cups and the substrate holding table. A first process-liquid recovery tank is provided at a lower area of the first and second guide cups and recovers the process-liquid guided by the first guide cup. A second process-liquid recovery tank is provided at the inner peripheral side of the first process-liquid recovery tank and recovers the process-liquid guided by the second guide cup.

摘要翻译： 本发明的基板液体处理装置包括：处理液供给单元，其选择性地将多种类型的处理液供给到由基板保持台保持的基板;第一和第二引导杯，从顶部 并且被配置为在由基板保持台保持的同时分别引导来自旋转基板的处理液体飞散; 以及位置调节机构，其调节所述第一和第二引导杯与所述基板保持台之间的位置关系。 第一处理液回收罐设置在第一和第二引导杯的下部区域，并且回收由第一引导杯引导的处理液体。 第二处理液回收罐设置在第一处理液回收罐的内周侧，并回收由第二引导杯引导的处理液。

公开(公告)号：US09022045B2

公开(公告)日：2015-05-05

申请号：US13337547

申请日：2011-12-27

申请人： Jiro Higashijima ,  Nobuhiro Ogata ,  Satoshi Kaneko ,  Shuichi Nagamine ,  Yoshihiro Kai

发明人： Jiro Higashijima ,  Nobuhiro Ogata ,  Satoshi Kaneko ,  Shuichi Nagamine ,  Yoshihiro Kai

IPC分类号： H01L21/67 ,  H01L21/687

CPC分类号： H01L21/67051 ,  H01L21/68728 ,  H01L21/68785 ,  H01L21/68792

摘要： Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.

摘要翻译： 公开了一种液体处理装置，其包括位于基板保持单元保持的基板下方的喷嘴。 喷嘴能够喷射液体和气体的混合物的两种流体。 喷嘴包括用于喷射液体的多个喷液通道和用于喷射气体的多个气体喷射通道，并且还包括各自对应于一个喷液通道的多个液体喷射口。 液体喷射口排列在从基板的周边部分下方的位置向内延伸的水平线上。 液体喷射口被配置为沿喷射方向朝向基板的下表面喷射液体，并且喷射方向以相对于平面旋转的旋转驱动单元旋转的基板的旋转方向以倾斜角度倾斜 包括基底的下表面。

公开(公告)号：US08808798B2

公开(公告)日：2014-08-19

申请号：US13569345

申请日：2012-08-08

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05D3/12 ,  H01L21/67 ,  H01L21/683 ,  H01L21/027 ,  G03F7/16

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/027 ,  H01L21/67051 ,  H01L21/6838

摘要： A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.

摘要翻译： 一种涂布方法，包括将涂布液从涂布喷嘴供给到保持在基板保持部件上的基板的前侧中央部，使基板保持部件绕垂直轴旋转，使涂布液朝向基板的周边部分扩散， 离心力，从而形成涂布液的膜，形成用于防止来自涂布液的污染物沉积或残留在基板的背面周边部分上的处理液的液膜，并且阻尼垂直摆动 通过姿势调节机构，在从形成有液膜的周边部分的内侧将来自输送孔的气体输送到基板的背面侧，同时旋转基板的周边部。