ARRAY OF MUTUALLY INSULATED GEIGER-MODE AVALANCHE PHOTODIODES, AND CORRESPONDING MANUFACTURING PROCESS
    11.
    发明申请
    ARRAY OF MUTUALLY INSULATED GEIGER-MODE AVALANCHE PHOTODIODES, AND CORRESPONDING MANUFACTURING PROCESS 有权
    绝缘子伽米夫模型AVALANCHE光电子阵列和相应的制造工艺

    公开(公告)号:US20120009722A1

    公开(公告)日:2012-01-12

    申请号:US13241114

    申请日:2011-09-22

    CPC classification number: H01L27/1446 H01L27/14658 H01L27/14689 H01L31/107

    Abstract: An embodiment of an array of Geiger-mode avalanche photodiodes, wherein each photodiode is formed by a body of semiconductor material, having a first conductivity type, housing a first cathode region, of the second conductivity type, and facing a surface of the body, an anode region, having the first conductivity type and a higher doping level than the body, extending inside the body, and facing the surface laterally to the first cathode region and at a distance therefrom, and an insulation region extending through the body and insulating an active area from the rest of the body, the active area housing the first cathode region and the anode region. The insulation region is formed by a mirror region of metal material, a channel-stopper region having the second conductivity type, surrounding the mirror region, and a coating region, of dielectric material, arranged between the mirror region and the channel-stopper region.

    Abstract translation: 盖格模式雪崩光电二极管阵列的一个实施例,其中每个光电二极管由半导体材料体形成,具有第一导电类型,容纳第二导电类型的第一阴极区,并面向主体的表面, 具有第一导电类型并且具有比主体更高的掺杂水平的阳极区域,其在主体内延伸并且横向于第一阴极区域和与其间隔一定距离的表面,以及延伸穿过主体并绝缘的绝缘区域 活动区域从身体的其余部分,活动区域容纳第一阴极区域和阳极区域。 绝缘区域由金属材料的反射镜区域,具有第二导电类型的沟道截止区域,围绕反射镜区域以及布置在反射镜区域和通道阻挡区域之间的电介质材料的涂覆区域形成。

    RADIATION DETECTOR OF THE DELTA E-E TYPE WITH INSULATION TRENCHES

    公开(公告)号:US20100140489A1

    公开(公告)日:2010-06-10

    申请号:US12704323

    申请日:2010-02-11

    CPC classification number: H01L31/103 G01T1/026 G01T1/29 H01L27/1463 H01L31/115

    Abstract: A radiation detector of the ΔE-E type is proposed. The detector is integrated in a chip of semiconductor material with a front surface and a back surface opposite the front surface, the detector having at least one detection cell arranged on the front surface for receiving a radiation to be evaluated, wherein the detector includes: a first region of a first type of conductivity extending into the chip from the front surface to a first depth; a second region of a second type of conductivity extending into the chip from the back surface to a second depth so as to reach the first region; and for each detection cell a third region of the second type of conductivity extending into the first region from the front surface to a third depth lower than the first depth and the second depth, a thin sensitive volume for absorbing energy from the radiation being defined by a junction between the first region and each third region, and a thick sensitive volume for absorbing further energy from the radiation being defined by a further junction between the first region and the second region. For each detection cell the detector further includes insulation means arranged around the third region and extending from the front surface into the first region to an insulation depth comprised between the first depth and the third depth.

    ARRAY OF MUTUALLY ISOLATED, GEIGER-MODE, AVALANCHE PHOTODIODES AND MANUFACTURING METHOD THEREOF
    13.
    发明申请
    ARRAY OF MUTUALLY ISOLATED, GEIGER-MODE, AVALANCHE PHOTODIODES AND MANUFACTURING METHOD THEREOF 有权
    单相分离阵列,GEIGER模式,AVALANCHE光刻胶及其制造方法

    公开(公告)号:US20090184384A1

    公开(公告)日:2009-07-23

    申请号:US12356445

    申请日:2009-01-20

    Abstract: An embodiment of array of Geiger-mode avalanche photodiodes, wherein each photodiode is formed by a body of semiconductor material, having a first conductivity type and housing an anode region, of a second conductivity type, facing a top surface of the body, a cathode-contact region, having the first conductivity type and a higher doping level than the body, facing a bottom surface of the body, an insulation region extending through the body and insulating an active area from the rest of the body, the active area housing the anode region and the cathode-contact region. The insulation region is formed by a first mirror region of polycrystalline silicon, a second mirror region of metal material, and a channel-stopper region of dielectric material, surrounding the first and second mirror regions.

    Abstract translation: Geiger型雪崩光电二极管阵列的一个实施例,其中每个光电二极管由半导体材料体形成,具有第一导电类型并且容纳阳极区,第二导电类型面向主体的顶表面,阴极 接触区域,其具有第一导电类型和比主体更高的掺杂水平,面向主体的底表面;绝缘区域,其延伸穿过主体并将活动区域与身体的其余部分隔离;活动区域容纳 阳极区域和阴极接触区域。 绝缘区域由多晶硅的第一反射镜区域,金属材料的第二反射镜区域和电介质材料的通道停止区域形成,围绕第一和第二反射镜区域。

    Array of mutually isolated, geiger-mode, avalanche photodiodes and manufacturing method thereof
    15.
    发明授权
    Array of mutually isolated, geiger-mode, avalanche photodiodes and manufacturing method thereof 有权
    相互隔离,盖格模式,雪崩光电二极管的阵列及其制造方法

    公开(公告)号:US08778721B2

    公开(公告)日:2014-07-15

    申请号:US12356445

    申请日:2009-01-20

    Abstract: An embodiment of array of Geiger-mode avalanche photodiodes, wherein each photodiode is formed by a body of semiconductor material, having a first conductivity type and housing an anode region, of a second conductivity type, facing a top surface of the body, a cathode-contact region, having the first conductivity type and a higher doping level than the body, facing a bottom surface of the body, an insulation region extending through the body and insulating an active area from the rest of the body, the active area housing the anode region and the cathode-contact region. The insulation region is formed by a first mirror region of polycrystalline silicon, a second mirror region of metal material, and a channel-stopper region of dielectric material, surrounding the first and second mirror regions.

    Abstract translation: Geiger型雪崩光电二极管阵列的一个实施例,其中每个光电二极管由半导体材料体形成,具有第一导电类型并且容纳阳极区,第二导电类型面向主体的顶表面,阴极 接触区域,其具有第一导电类型和比主体更高的掺杂水平,面向主体的底表面;绝缘区域,其延伸穿过主体并将活动区域与身体的其余部分隔离;活动区域容纳 阳极区域和阴极接触区域。 绝缘区域由多晶硅的第一反射镜区域,金属材料的第二反射镜区域和电介质材料的通道停止区域形成,围绕第一和第二反射镜区域。

    Vertical-type, integrated bipolar device and manufacturing process thereof
    17.
    发明授权
    Vertical-type, integrated bipolar device and manufacturing process thereof 有权
    垂直型,集成双极型器件及其制造工艺

    公开(公告)号:US07898008B2

    公开(公告)日:2011-03-01

    申请号:US11779681

    申请日:2007-07-18

    Abstract: A bipolar device is integrated in an active layer, wherein delimitation trenches surround respective active areas housing bipolar transistors of complementary types. Each active area accommodates a buried layer; a well region extending on top of the buried layer; a top sinker region extending between the surface of the device and the well region; a buried collector region extending on top of the well region and laterally with respect to the top sinker region; a base region, extending on top of the buried collector region laterally with respect to the top sinker region; and an emitter region extending inside the base region. The homologous regions of the complementary transistors have a similar doping level, being obtained by ion-implantation of epitaxial layers wherein the concentration of dopant added during the growth is very low, possibly zero.

    Abstract translation: 双极器件集成在有源层中,其中限定沟槽包围容纳互补类型的双极晶体管的相应有源区域。 每个活动区容纳埋层; 在掩埋层的顶部延伸的阱区; 在所述装置的表面和所述阱区之间延伸的顶部沉降片区域; 在阱区域的顶部延伸并且相对于顶部沉降片区域横向延伸的掩埋收集器区域; 基部区域,相对于顶部沉降片区域横向延伸在埋藏的收集器区域的顶部上; 以及在基极区域内延伸的发射极区域。 互补晶体管的同源区具有相似的掺杂水平,通过外延层的离子注入获得,其中在生长期间添加的掺杂剂的浓度非常低,可能为零。

    Radiation detector of the deltaE-E type with insulation trenches
    18.
    发明授权
    Radiation detector of the deltaE-E type with insulation trenches 有权
    具有绝缘沟槽的deltaE-E型辐射检测器

    公开(公告)号:US07847360B2

    公开(公告)日:2010-12-07

    申请号:US11810701

    申请日:2007-06-05

    CPC classification number: H01L31/103 H01L27/1463 H01L31/115

    Abstract: A radiation detector of the ΔE-E type is proposed. The detector is integrated in a chip of semiconductor material with a front surface and a back surface opposite the front surface, the detector having at least one detection cell arranged on the front surface for receiving a radiation to be evaluated, wherein the detector includes: a first region of a first type of conductivity extending into the chip from the front surface to a first depth; a second region of a second type of conductivity extending into the chip from the back surface to a second depth so as to reach the first region; and for each detection cell a third region of the second type of conductivity extending into the first region from the front surface to a third depth lower than the first depth and the second depth, a thin sensitive volume for absorbing energy from the radiation being defined by a junction between the first region and each third region, and a thick sensitive volume for absorbing further energy from the radiation being defined by a further junction between the first region and the second region. For each detection cell the detector further includes insulation means arranged around the third region and extending from the front surface into the first region to an insulation depth comprised between the first depth and the third depth.

    Abstract translation: 提出了一种E-E型辐射探测器。 检测器集成在具有与前表面相对的前表面和后表面的半导体材料芯片中,检测器具有布置在前表面上的至少一个检测单元,用于接收待评估的辐射,其中检测器包括: 从前表面延伸到第一深度的第一类导电性的第一区域; 从第二深度延伸到芯片中的第二类导电体的第二区域,以便到达第一区域; 并且对于每个检测单元,第二类型的电导率的第三区域从前表面延伸到比第一深度和第二深度低的第三深度的第一区域,用于吸收来自辐射的能量的薄敏感体积由 第一区域和每个第三区域之间的接合点,以及用于吸收来自辐射的进一步能量的厚度敏感体积,由第一区域和第二区域之间的另一接合限定。 对于每个检测单元,检测器还包括设置在第三区域周围并且从前表面延伸到第一区域到包括在第一深度和第三深度之间的绝缘深度的绝缘装置。

    Radiation detector of the deltaE-E type with insulation trenches
    19.
    发明申请
    Radiation detector of the deltaE-E type with insulation trenches 有权
    具有绝缘沟槽的deltaE-E型辐射检测器

    公开(公告)号:US20080121807A1

    公开(公告)日:2008-05-29

    申请号:US11810701

    申请日:2007-06-05

    CPC classification number: H01L31/103 H01L27/1463 H01L31/115

    Abstract: A radiation detector of the ΔE-E type is proposed. The detector is integrated in a chip of semiconductor material with a front surface and a back surface opposite the front surface, the detector having at least one detection cell arranged on the front surface for receiving a radiation to be evaluated, wherein the detector includes: a first region of a first type of conductivity extending into the chip from the front surface to a first depth; a second region of a second type of conductivity extending into the chip from the back surface to a second depth so as to reach the first region; and for each detection cell a third region of the second type of conductivity extending into the first region from the front surface to a third depth lower than the first depth and the second depth, a thin sensitive volume for absorbing energy from the radiation being defined by a junction between the first region and each third region, and a thick sensitive volume for absorbing further energy from the radiation being defined by a further junction between the first region and the second region. For each detection cell the detector further includes insulation means arranged around the third region and extending from the front surface into the first region to an insulation depth comprised between the first depth and the third depth.

    Abstract translation: 提出了DeltaE-E型辐射探测器。 检测器集成在具有与前表面相对的前表面和后表面的半导体材料芯片中,检测器具有布置在前表面上的至少一个检测单元,用于接收待评估的辐射,其中检测器包括: 从前表面延伸到第一深度的第一类导电性的第一区域; 从第二深度延伸到芯片中的第二类导电体的第二区域,以便到达第一区域; 并且对于每个检测单元,第二类型的电导率的第三区域从前表面延伸到比第一深度和第二深度低的第三深度的第一区域,用于吸收来自辐射的能量的薄敏感体积由 第一区域和每个第三区域之间的接合点,以及用于吸收来自辐射的进一步能量的厚度敏感体积,由第一区域和第二区域之间的另一接合限定。 对于每个检测单元,检测器还包括设置在第三区域周围并且从前表面延伸到第一区域到包括在第一深度和第三深度之间的绝缘深度的绝缘装置。

    VERTICAL-TYPE, INTEGRATED BIPOLAR DEVICE AND MANUFACTURING PROCESS THEREOF
    20.
    发明申请
    VERTICAL-TYPE, INTEGRATED BIPOLAR DEVICE AND MANUFACTURING PROCESS THEREOF 有权
    垂直型,一体式双极设备及其制造工艺

    公开(公告)号:US20080017895A1

    公开(公告)日:2008-01-24

    申请号:US11779681

    申请日:2007-07-18

    Abstract: A bipolar device is integrated in an active layer, wherein delimitation trenches surround respective active areas housing bipolar transistors of complementary types. Each active area accommodates a buried layer; a well region extending on top of the buried layer; a top sinker region extending between the surface of the device and the well region; a buried collector region extending on top of the well region and laterally with respect to the top sinker region; a base region, extending on top of the buried collector region laterally with respect to the top sinker region; and an emitter region extending inside the base region. The homologous regions of the complementary transistors have a similar doping level, being obtained by ion-implantation of epitaxial layers wherein the concentration of dopant added during the growth is very low, possibly zero.

    Abstract translation: 双极器件集成在有源层中,其中限定沟槽包围容纳互补类型的双极晶体管的相应有源区域。 每个活动区容纳埋层; 在掩埋层的顶部延伸的阱区; 在所述装置的表面和所述阱区之间延伸的顶部沉降片区域; 在阱区域的顶部延伸并且相对于顶部沉降片区域横向延伸的掩埋收集器区域; 基部区域,相对于顶部沉降片区域横向延伸在埋藏的收集器区域的顶部上; 以及在基极区域内延伸的发射极区域。 互补晶体管的同源区具有相似的掺杂水平,通过外延层的离子注入获得,其中在生长期间添加的掺杂剂的浓度非常低,可能为零。

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