Surface inspection method and surface inspection apparatus
    11.
    发明申请
    Surface inspection method and surface inspection apparatus 有权
    表面检查方法和表面检查装置

    公开(公告)号:US20080015810A1

    公开(公告)日:2008-01-17

    申请号:US11826088

    申请日:2007-07-12

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: G01N21/9501 G01N21/47

    Abstract: When detecting light scattered by an object to be inspected by using a pulse laser as a light source, noise increases unless a sampling repletion period of an A/D converter is determined so as to be related to a pulse oscillation repetition period of the light source. (1) The sampling repletion period of the A/D converter is set equal to the pulse oscillation repetition period of the light source or an integer times thereof, and the sampling is synchronized with oscillation of the light source. Or (2) the sampling repletion period of the A/D converter is set equal to a half-integer times the pulse oscillation repetition period of the light source. Even if a ripple component resulting from emission pulses of the light source remains in the scattered light signal supplied to the A/D converter remains, therefore, its influence can be eliminated or reduced.

    Abstract translation: 当通过使用脉冲激光器作为光源检测被检查物体散射的光时,噪声增加,除非确定A / D转换器的采样恢复周期以与光源的脉冲振荡重复周期相关 。 (1)A / D转换器的采样补偿周期被设定为等于光源的脉冲振荡重复周期或其整数倍,采样与光源的振荡同步。 或者(2)将A / D转换器的采样恢复周期设定为等于光源的脉冲振荡重复周期的半个整数倍。 即使由于光源的发射脉冲而产生的纹波分量残留在供给A / D转换器的散射光信号中,因此可以消除或减小其影响。

    Surface Inspection Method and Surface Inspection Apparatus
    12.
    发明申请
    Surface Inspection Method and Surface Inspection Apparatus 审中-公开
    表面检查方法和表面检查装置

    公开(公告)号:US20080013076A1

    公开(公告)日:2008-01-17

    申请号:US11776887

    申请日:2007-07-12

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: G01N21/9501 G01N21/4738 G01N21/94

    Abstract: It is an object of the present invention to realize a surface inspection method capable of enlarging a dynamic range of a measurement system while keeping high a calculation accuracy for a particle size of a contaminant particle/defect irrespectively of the particle size even if an intensity of a scattered light resulting from the contaminant particle/defect present on a surface of an object to be inspected is dependent on an illumination direction or the like.A surface of an object to be inspected is illuminated with two illumination beams having an identical wavelength, an identical elevation angle, an identical azimuth, and an identical polarization characteristic but different in intensity by 100:1. Even if an intensity of a scattered light resulting from a contaminant particle/defect present on or near the surface of the object to be inspected has anisotropy dependent on an illumination direction or a detection direction, an intensity ratio of scattered/diffracted/reflected lights generated by illumination beams is always constant to 100:1. It is possible to enlarge a dynamic range of a measurement system while keeping high calculation accuracy for a particle size of the contaminant particle/defect irrespectively of the anisotropy and the particle size of the contaminant particle/defect.

    Abstract translation: 本发明的目的是为了实现能够扩大测量系统的动态范围的表面检查方法,同时保持与污染物颗粒/缺陷的粒径的计算精度无关的粒度,即使是强度 存在于待检查物体的表面上的污染物颗粒/缺陷产生的散射光取决于照明方向等。 待检查物体的表面用具有相同波长,相同仰角,相同方位角和相同偏振特性但具有100:1不同强度的两个照明光束照射。 即使存在于待检查对象的表面上或附近的污染物粒子/缺陷产生的散射光的强度具有取决于照明方向或检测方向的各向异性,产生散射/衍射/反射光的强度比 通过照明光束始终恒定为100:1。 可以扩大测量系统的动态范围,同时对于污染物颗粒/缺陷的粒度保持高的计算精度,而与污染物颗粒/缺陷的各向异性和粒径无关。

    Defect inspection method and apparatus for silicon wafer
    14.
    发明授权
    Defect inspection method and apparatus for silicon wafer 失效
    硅片缺陷检查方法及装置

    公开(公告)号:US06683683B2

    公开(公告)日:2004-01-27

    申请号:US10084059

    申请日:2002-02-28

    CPC classification number: G01N21/9505 G01N21/9501

    Abstract: A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.

    Abstract translation: 提供了一种用于根据从将样本照射光束获得的样本的光信息检测存在于半导体样品表面和/或样品内部的缺陷的缺陷检查装置,其包括检测装置, 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置,显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。

    Defect assessing apparatus and method, and semiconductor manufacturing method
    15.
    发明授权
    Defect assessing apparatus and method, and semiconductor manufacturing method 有权
    缺陷评估装置和方法以及半导体制造方法

    公开(公告)号:US06226079B1

    公开(公告)日:2001-05-01

    申请号:US09161393

    申请日:1998-09-29

    CPC classification number: G01N21/9501 G01N21/47

    Abstract: A defect assessing apparatus and method and a semiconductor manufacturing method for revealing the relationship between the size and depth of defects is disclosed. A detecting optical system is provided for detecting the intensity of scattered light from a defect generated by the shorter wavelength one of the light rays of at least two different wavelengths emitted from irradiating optical systems and that of scattered light from the defect generated by the longer wavelength one of same. A calculating means is provided for determining, from the scattered light intensity derived from the shorter wavelength ray and that derived form the longer wavelength ray, both detected by the detecting optical system, a value corresponding to the defect size and another value corresponding to the defect depth. A display means is provided for displaying a distribution revealing the relationship between defect size and defect depth on the basis of the value corresponding to the defect size and the value corresponding to the defect depth, both determined by the calculating means.

    Abstract translation: 公开了一种用于揭示缺陷的尺寸和深度之间的关系的缺陷评估装置和方法以及半导体制造方法。 提供了一种检测光学系统,用于检测由照射光学系统发射的至少两种不同波长的较短波长的一个光线产生的缺陷的散射光的强度,以及来自由较长波长产生的缺陷的散射光 一个是相同的 提供了一种计算装置,用于根据由检测光学系统检测的来自较短波长的衍射的散射光强度和由较长波长的光导出的值,确定对应于缺陷尺寸的值和对应于缺陷的另一个值 深度。 提供显示装置,用于根据由计算装置确定的缺陷尺寸和对应于缺陷深度的值,显示出显示缺陷尺寸和缺陷深度之间的关系的分布。

    Wristwatch band with radio antenna
    16.
    发明授权
    Wristwatch band with radio antenna 失效
    手表带无线电天线

    公开(公告)号:US5179733A

    公开(公告)日:1993-01-12

    申请号:US836171

    申请日:1992-02-12

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: H01Q1/273

    Abstract: A wristband with an internal antenna for a wristwatch-receiver has first and second band portions each adapted for coupling at first ends thereof to a receiver housing and an adjustable clasp for coupling opposed, second ends thereof to one another to encircle a wearer's wrist. The band portions include conductive metal strips within an insulative covering and mechanically and electrically coupled at one end to the receiver housing. The clasp is adjustably positioned on one band portion and includes a clampable/releasable conductive protrusion for electrically contacting segments of the metal strip exposed through openings in a portion of the insulative covering to form a continuous conductive loop within the wristband. The inner side of the band has a grid pattern of transverse and longitudinal ridges.

    Abstract translation: 具有用于手表 - 接收器的内部天线的腕带具有第一和第二带部分,每个带部分适于在其第一端处耦合到接收器壳体和可调节的钩扣,用于将相对的第二端彼此连接以包围佩戴者的腕部。 带部分包括在绝缘覆盖物内的导电金属条,并在一端机械地和电耦合到接收器壳体。 该扣环可调节地定位在一个带部分上并且包括可夹紧/可释放的导电突起,用于电接触绝缘覆盖物的一部分中的开口露出的金属带的段,以在腕带内形成连续的导电环。 带的内侧具有横向和纵向脊的网格图案。

    Image reconstruction method in NMR imaging
    17.
    发明授权
    Image reconstruction method in NMR imaging 失效
    NMR成像中的图像重建方法

    公开(公告)号:US4939463A

    公开(公告)日:1990-07-03

    申请号:US218694

    申请日:1988-07-07

    CPC classification number: G01R33/56554 G01R33/56

    Abstract: A method wherein the requirement for the amplitude of the oscillating gradient magnetic field is relaxed by reconstructing an image while using simultaneously echoes S.sub.p (k.sub.x, y) produced in the case where the positive oscillating gradient magnetic field is applied to the object to be tested and echoes S.sub.N (k.sub.x, y) produced in the case where the negative is applied thereto, i.e. by using data points on segments of a trajectory of data points ascending from left to right in the spatial frequency domain and those on segments of a trajectory of data points ascending from right to left. That is, the image M(x, y) is obtained by Fourier-transforming at first the echoes S.sub.p (k.sub.x, k.sub.y) and S.sub.N (k.sub.x, k.sub.y) with respect to k.sub.y, multiplying complex numbers a.sub.1 and a.sub.2 to g.sub.p (k.sub.x, y) and g.sub.N (k.sub.x, y) obtained by this transformation; adding the results thus obtained, i.e. forming g(k.sub.x, y)=a.sub.1 g.sub.p (k.sub.x, y)+a.sub.2 g.sub.N (k.sub.x, y); and finally Fourier-transforming this g(k.sub.x, y) with respect to k.sub.x.

    High speed NMR spectroscopic imaging method
    18.
    发明授权
    High speed NMR spectroscopic imaging method 失效
    高速NMR光谱成像方法

    公开(公告)号:US4797616A

    公开(公告)日:1989-01-10

    申请号:US151901

    申请日:1988-02-03

    CPC classification number: G01R33/485

    Abstract: An NMR spectroscopic imaging method of obtaining separate spin distribution images for respective spectral components of the spectrum of an NMR signal caused by the chemical shift of nuclides of interest in an object includes providing for a transversal magnetization signal of the object placed in a static magnetic field. A position of the signal in a phase domain is translated in a K-space from the origin thereof. Further, the signal is sampled while rotating a position of the signal in the K-space plural times on a certain circle in the K-space by applying a rotating field gradient, thereby to obtain a group of signal data. Signal data trains each of which is composed of signal data present at the same position on the K-space in the signal data group obtained by the sampling during the plural signal rotations, is subjected to Fourier transformations, respectively, thereby effecting a spectral analysis of the NMR signal.

    Abstract translation: 由对象物质的化学位移引起的核磁共振信号频谱的各频谱分量的分离自旋分布图像的NMR分光成像方法包括提供放置在静磁场中的物体的横向磁化信号 。 信号在相位域中的位置从其原点在K空间中平移。 此外,在通过施加旋转场梯度在K空间中的某个圆上多次旋转K空间中的信号的位置的同时对信号进行采样,从而获得一组信号数据。 由多个信号旋转中的采样获得的信号数据组中的与K空间上的相同位置处的信号数据组成的信号数据串分别进行傅里叶变换,从而进行频谱分析 NMR信号。

    Switch with movable and fixed contacts
    19.
    发明授权
    Switch with movable and fixed contacts 失效
    可移动和固定的触点开关

    公开(公告)号:US4052581A

    公开(公告)日:1977-10-04

    申请号:US626557

    申请日:1975-10-28

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: H01H50/56

    Abstract: A switch is comprised of at least one leaf-like springy fixed contact, a movable contact, a supporting member for supporting the fixed contact and a positioning member for positioning the free end of the fixed contact. The leaf-like fixed contact is fixed by the supporting member at a position close to one end of the fixed contact, and is biased by the positioning member at a position close to the other end. Thus, the free end of the leaf-like springy fixed contact is placed at a position by its function of urging the positioning member.

    SURFACE DEFECT INSPECTION METHOD AND APPARATUS
    20.
    发明申请
    SURFACE DEFECT INSPECTION METHOD AND APPARATUS 有权
    表面缺陷检查方法和装置

    公开(公告)号:US20130208271A1

    公开(公告)日:2013-08-15

    申请号:US13838460

    申请日:2013-03-15

    CPC classification number: G01N21/9501 G01N2021/4716

    Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

    Abstract translation: 一种表面缺陷检查装置和方法,用于将多个光束照射到检查样品的表面上的相同区域,分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号,并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

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