公开(公告)号：US20100273105A1

公开(公告)日：2010-10-28

申请号：US12765590

申请日：2010-04-22

Applicant: Yoshiyuki Utsumi ,  Takehiro Seshimo

Inventor： Yoshiyuki Utsumi ,  Takehiro Seshimo

IPC: G03F7/004 ,  G03F7/20 ,  C07C303/00

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0046 ,  G03F7/0397

Abstract: A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure, the acid generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a hetero atom; R1 represents a divalent linking group; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms; n represents an integer of 1 to 3; and Z represents an organic cation (exclusive of an amine ion and a quaternary ammonium ion) having a valence of n.

Abstract translation: 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中溶解度变化的基材成分（A）和暴露时产生酸的酸产生剂成分（B），所述酸产生剂成分（B）含有酸发生剂 （B1）由下述通式（b1-1）表示的化合物组成：其中RX表示可具有杂原子的烃基; R1表示二价连接基团; Y1表示1〜4个碳原子的亚烷基或1〜4个碳原子的氟化亚烷基; n表示1〜3的整数， Z表示n价的有机阳离子（不含胺离子和季铵离子）。

公开(公告)号：US20100121077A1

公开(公告)日：2010-05-13

申请号：US12692513

申请日：2010-01-22

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC: C07D327/04

CPC classification number: G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: A compound represented by general formula (I); and a compound represented by general formula (b1-1). wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M− represents an alkali metal ion; and A+ represents an organic cation.

Abstract translation: 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M-表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US08932795B2

公开(公告)日：2015-01-13

申请号：US13106691

申请日：2011-05-12

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Kazushige Dohtani

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Kazushige Dohtani

IPC: G03F7/004 ,  G03F7/20 ,  C07D333/52 ,  C07D333/76 ,  C07D493/18 ,  C07D497/08 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07D333/52 ,  C07D333/76 ,  C07D493/18 ,  C07D497/08 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, RX represents a divalent aliphatic group of 3 to 20 carbon atoms; RY represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)2—; each of R1 and R2 independently represents a divalent linking group; and Z+ represents a monovalent organic cation).

Abstract translation: 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）表示的通式（b1-1）（式中，RX表示碳原子数3〜20的2价脂肪族基团; RY表示碳原子数3〜20的1价脂肪族基团，具有-C（= 0） ）-O-或-S（= O）2 - ; R 1和R 2各自独立地表示二价连接基团; Z +表示一价有机阳离子）。

公开(公告)号：US08765352B2

公开(公告)日：2014-07-01

申请号：US13223595

申请日：2011-09-01

Applicant: Yoshiyuki Utsumi ,  Takehiro Seshimo

Inventor： Yoshiyuki Utsumi ,  Takehiro Seshimo

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  C07C381/12 ,  C07C309/06 ,  C07C309/07

CPC classification number: C07D327/04 ,  C07D493/08 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).

Abstract translation: 一种正型抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述酸发生剂成分（B）含有 含有下述通式（b1-1）表示的化合物（其中Z +表示有机阳离子）的酸发生剂（B1）。

公开(公告)号：US08298748B2

公开(公告)日：2012-10-30

申请号：US12781540

申请日：2010-05-17

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Takeyoshi Mimura ,  Daichi Takaki

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Takeyoshi Mimura ,  Daichi Takaki

IPC: G03F7/004 ,  C08F228/02

CPC classification number: G03F7/0045 ,  C08F8/34 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F220/18 ,  C08F220/28 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/14 ,  C08F212/32

Abstract: A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein X− represents an anion moiety represented by one of general formulas (1) to (5)).

Abstract translation: 一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包含具有结构单元的聚合物（A1'） 由通式（a5-1）表示的（a5-1），由通式（a0-1）表示的结构单元（a0-1）和曝光时产生酸的结构单元（a0-2），结构单元 （a0-2'）表示的基团（a0-2）（式中，X表示由通式（1）〜（5）中的一个表示的阴离子部分）。

公开(公告)号：US08007981B2

公开(公告)日：2011-08-30

申请号：US11997527

申请日：2006-07-10

Applicant: Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

Inventor： Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

IPC: G03F7/00 ,  G03F7/004

CPC classification number: G03F7/0048 ,  G03F7/0397 ,  Y10S430/114

Abstract: A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.

Abstract translation: 本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂 溶剂（S）包括芳族有机溶剂（S1）。 根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。

公开(公告)号：US07955777B2

公开(公告)日：2011-06-07

申请号：US12327549

申请日：2008-12-03

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

Abstract: There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1] X—Q1—Y1—SO3−M+  (I) X—Q1—Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.).

Abstract translation: 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 [化学式1] X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1）（其中，Q1表示二价连接基或单键; Y1表示亚烷基 其可以含有取代基或可以含有取代基的氟化亚烷基; X表示含有氟原子且含有取代基的碳原子数为5〜30的芳香族环状基团，M +表示碱金属离子， A +表示有机阳离子。）

公开(公告)号：US07713679B2

公开(公告)日：2010-05-11

申请号：US12251327

申请日：2008-10-14

Applicant: Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

Inventor： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: There is provided a compound represented by a general formula (B1-1) shown below, an acid generator composed of the above compound, a resist composition containing an acid generator composed of the above compound, and a method of forming a resist pattern: (wherein RX represents a hydrocarbon group which may contain a substituent group; Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y1 represents an alkylene group of 1 to 4 carbon atoms, or a fluorinated alkylene group of 1 to 4 carbon atoms; and A+ represents an organic cation which contains a nitrogen atom).

Abstract translation: 提供由下述通式（B1-1）表示的化合物，由上述化合物组成的酸产生剂，含有由上述化合物组成的酸发生剂的抗蚀剂组合物和形成抗蚀剂图案的方法：（ 其中RX表示可以含有取代基的烃基; Q1表示可以含有取代基的1〜12个碳原子的亚烷基或单键; n表示0或1的整数; Y1表示亚烷基 1〜4个碳原子的氟化亚烷基或1〜4个碳原子的氟化亚烷基，A +表示含有氮原子的有机阳离子。

公开(公告)号：US20090130597A1

公开(公告)日：2009-05-21

申请号：US12265607

申请日：2008-11-05

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC: G03F7/031 ,  G03F7/20 ,  C07C309/04 ,  C07D327/04

CPC classification number: G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: A compound represented by general formula (I); and a compound represented by general formula (b1-1). X-Q1-Y1—SO3−M+  [Chemical Formula 1] (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

Abstract translation: 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M + [化学式1] <？in-line-formula description =“ “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（I）<？in-line-formula description =”In-line Formulas“end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A + <？in-line-formula description =“In-line Formulas “end =”tail“？> <？in-line-formula description =”在线公式“end =”lead“？>（b1-1）<？in-line-formula description =”In-line Formulas“ end =“tail”？>其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US20090104563A1

公开(公告)日：2009-04-23

申请号：US12251327

申请日：2008-10-14

Applicant: Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

Inventor： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

IPC: G03F7/028 ,  G03F7/20 ,  C07C309/02 ,  C07C309/78

CPC classification number: G03F7/0045 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: There is provided a compound represented by a general formula (B1-1) shown below, an acid generator composed of the above compound, a resist composition containing an acid generator composed of the above compound, and a method of forming a resist pattern: (wherein RX represents a hydrocarbon group which may contain a substituent group; Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y1 represents an alkylene group of 1 to 4 carbon atoms, or a fluorinated alkylene group of 1 to 4 carbon atoms; and A+ represents an organic cation which contains a nitrogen atom).

Abstract translation: 提供由下述通式（B1-1）表示的化合物，由上述化合物组成的酸产生剂，含有由上述化合物组成的酸发生剂的抗蚀剂组合物和形成抗蚀剂图案的方法：（ 其中RX表示可以含有取代基的烃基; Q1表示可以含有取代基的1〜12个碳原子的亚烷基或单键; n表示0或1的整数; Y1表示亚烷基 1〜4个碳原子的氟化亚烷基或1〜4个碳原子的氟化亚烷基，A +表示含有氮原子的有机阳离子。