公开(公告)号：US11842917B2

公开(公告)日：2023-12-12

申请号：US17216439

申请日：2021-03-29

Applicant: Applied Materials, Inc.

Inventor： Leon Volfovski ,  Andreas Schmid ,  Denis Martin Koosau ,  Nicholas Michael Kopec ,  Steven Babayan ,  Douglas R. McAllister ,  Helder Lee ,  Jeffrey Hudgens ,  Damon K. Cox

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/683 ,  H01L21/677

CPC classification number: H01L21/68735 ,  H01L21/68 ,  H01L21/6838 ,  H01L21/68707 ,  H01L21/68721 ,  H01L21/68742 ,  H01L21/677

Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.

公开(公告)号：US11469123B2

公开(公告)日：2022-10-11

申请号：US16994413

申请日：2020-08-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nicholas Michael Bergantz ,  Jeffrey Hudgens ,  Doug McAllister ,  Helder Lee

IPC: H01L21/67 ,  H01L21/673

Abstract: A method for detecting positions of replacement parts, wafers, or empty carriers for a replacement part stored at a replacement parts storage container is provided. A container is received at a at a load port of a factory interface of an electronics processing system. The container is configured to store replacement parts for a process chamber of the electronics processing system. A robot arm is moved according to a first mapping pattern to identify, using a detection system at a distal end of an end effector of the robot arm, positions of one or more replacement parts in the container. Regions of the container that do not contain replacement parts are determined. The robot arm is moved according to a second mapping pattern to identify, within the regions of the container that do not contain replacement parts, using the detection system, a position in the container of at least one of a wafer or an empty carrier for a replacement part. A mapping of positions of the one or more replacement parts and of positions of at least one of the empty carrier or the wafer in the container is recorded in a storage medium.

公开(公告)号：US20210217650A1

公开(公告)日：2021-07-15

申请号：US17216439

申请日：2021-03-29

Applicant: Applied Materials, Inc.

Inventor： Leon Volfovski ,  Andreas Schmid ,  Denis Martin Koosau ,  Nicholas Michael Kopec ,  Steven Babayan ,  Douglas R. McAllister ,  Helder Lee ,  Jeffrey Hudgens ,  Damon K. Cox

IPC: H01L21/687 ,  H01L21/68 ,  H01L21/683

Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.

公开(公告)号：US09423042B2

公开(公告)日：2016-08-23

申请号：US13764204

申请日：2013-02-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Chandrasekhar Balasubramanyam ,  Helder Lee ,  Miriam Schwartz ,  Elizabeth Wu ,  Kedarnath Sangam

IPC: F16K15/14 ,  C23C16/44 ,  C23C16/455 ,  F16K51/02 ,  H01L21/677

CPC classification number: F16K15/147 ,  C23C16/4401 ,  C23C16/45519 ,  F16K51/02 ,  H01L21/67772

Abstract: Methods and apparatus for increasing flow uniformity are provided herein. In some embodiments, a slit valve having increased flow uniformity may be provided, the slit valve may include a housing having an opening disposed therethrough, the opening configured to allow a substrate to pass therethrough; a gas inlet formed in the housing; an outer plenum disposed in the housing and coupled to the gas inlet; an inner plenum disposed in the housing and coupled to the outer plenum via a plurality of holes; and a plurality of gas outlets disposed in the housing and fluidly coupling the opening to the inner plenum.