公开(公告)号：US11664199B2

公开(公告)日：2023-05-30

申请号：US16655217

申请日：2019-10-16

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  DaeYoun Kim ,  JulIl Lee ,  ChangMin Lee

IPC: C23C16/458 ,  H01J37/32 ,  H01L21/02 ,  H01L21/687 ,  H01L21/67 ,  H01L21/68 ,  C23C16/505 ,  C23C16/455

CPC classification number: H01J37/32715 ,  C23C16/4585 ,  H01J37/32642 ,  H01L21/02274 ,  H01L21/6719 ,  H01L21/68 ,  H01L21/68764 ,  C23C16/45536 ,  C23C16/505 ,  H01J2237/20285 ,  H01J2237/3321 ,  H01J2237/3323

Abstract: A substrate processing method capable of improving thin film uniformity on a substrate by controlling the position of a substrate supporting apparatus includes: a first operation of moving the substrate supporting apparatus in a first direction by a first predetermined distance; a second operation of moving the substrate supporting apparatus in a second direction by a second predetermined distance; a third operation of moving the substrate supporting apparatus in the second direction by the first predetermined distance; and a fourth operation of moving the substrate supporting apparatus in the first direction by the second predetermined distance, wherein the second direction may be opposite to the first direction.

公开(公告)号：US20210371976A1

公开(公告)日：2021-12-02

申请号：US17330999

申请日：2021-05-26

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh

IPC: C23C16/44

Abstract: A substrate processing device with improved exhaust efficiency and process reproducibility includes: a plurality of reactors; a plurality of exhaust ports in communication with the plurality of reactors and symmetrically arranged with respect to the reactors, respectively; and a plurality of exhaust channels in communication with the plurality of exhaust ports, wherein each exhaust channel includes a plurality of exhaust channels including a first channel extending in the first direction and a second channel extending in a second direction different from the first direction, wherein the plurality of exhaust channels extend through components supporting at least a portion of the plurality of reactors.