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公开(公告)号：US20210349397A1
公开(公告)日：2021-11-11
申请号：US17273758
申请日：2019-08-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Raphael Nico Johan STEGEN , Erik Henricus Egidius Catharina EUMMELEN , Christianus Wilhelmus Johannes BERENDSEN , Theodorus Wilhelmus POLET , Giovanni Luca GATTOBIGIO
Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.
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公开(公告)号：US20190187568A1
公开(公告)日：2019-06-20
申请号：US16269745
申请日：2019-02-07
Applicant: ASML Netherlands B.V.
Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Victor Manuel BLANCO CARBALLO , Casper Roderik DE GROOT , Rolf Hendrikus Jacobus CUSTERS , David Merritt PHILLIPS , Frederik Antonius VAN DER ZANDEN , Pieter Lein Joseph GUNTER , Erik Henricus Egidius Catharina EUMMELEN , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Marijn WOUTERS , Ronald Frank KOX , Jorge Alberto VIEYRA SALAS
CPC classification number: G03F7/70341 , G02B27/0043 , G03F7/2043 , G03F7/70358 , G03F7/70725 , G03F7/70858 , G03F7/70925
Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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公开(公告)号：US20190004434A1
公开(公告)日：2019-01-03
申请号：US16063583
申请日：2016-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Artunç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70258 , G03F7/70716 , H01L21/0274
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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14.发明申请公开(公告)号：US20170363948A1
公开(公告)日：2017-12-21
申请号：US15537214
申请日：2015-12-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria ROPS , Walter Theodorus Matheus STALS , David BESSEMS , Giovanni Luca GATTOBIGIO , Victor Manuel BLANCO CARBALLO , Erik Henricus Egidius Catharina EUMMELEN , Ronald VAN DER HAM , Frederik Antonius VAN DER ZANDEN , Wilhelmus Antonius WERNAART
Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
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公开(公告)号：US20230259037A1
公开(公告)日：2023-08-17
申请号：US18015522
申请日：2021-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria ROPS , Christianus Wilhelmus Johannes BERENDSEN , Erik Henricus Egidius Catharina EUMMELEN , Dagmar Antoinette WISMEIJER
CPC classification number: G03F7/70341 , B06B1/0644
Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.
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Patent Agency Ranking
公开(公告)号：US20210096471A1
公开(公告)日：2021-04-01
申请号：US16464361
申请日：2017-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Frank DEBOUGNOUX , Koen CUYPERS , Han Henricus Aldegonda LEMPENS , Theodoras Wilhelmus POLET , Jorge Alberto VIEYRA SALAS , John Maria BOMBEECK , Johannes Cornelis Paulus MELMAN , Giovanni Luca GATTOBIGIO
IPC: G03F7/20
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US20210088912A1
公开(公告)日：2021-03-25
申请号：US17112278
申请日：2020-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria ROPS , Walter Theodorus Matheus STALS , David BESSEMS , Giovanni Luca GATTOBIGIO , Victor Manuel BLANCO CARBALLO , Erik Henricus Egidius Catharina EUMMELEN , Ronald VAN DER HAM , Frederik Antonius VAN DER ZANDEN , Wilhelmus Antonius WERNAART
Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
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公开(公告)号：US20200166851A1
公开(公告)日：2020-05-28
申请号：US16778635
申请日：2020-01-31
Applicant: ASML Netherlands B.V.
Inventor： Cornelius Maria ROPS , Walter Theodorus Matheus STALS , David BESSEMS , Giovanni Luca GATTOBIGIO , Victor Manuel BLANCO CARBALLO , Erik Henricus Egidius Catharina EUMMELEN , Ronald VAN DER HAM , Frederik Antonius VAN DER ZANDEN , Wilhelmus Antonius WERNAART
Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
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公开(公告)号：US20200150545A1
公开(公告)日：2020-05-14
申请号：US16604324
申请日：2018-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Giovanni Luca GATTOBIGIO , Nirupam BANERJEE , Johan Franciscus Maria BECKERS , Erik Henricus Egidius Catharina EUMMELEN , Ronald Frank KOX , Theodoras Wilhelmus POLET , Cornelius Maria ROPS , Mike Paulus Johannes VAN GILS , Wouterus Jozephus Johannes VAN SLUISVELD , Rik VANGHELUWE
IPC: G03F7/20
Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.
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20.发明申请公开(公告)号：US20200041895A1
公开(公告)日：2020-02-06
申请号：US16339402
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Koen CUYPERS , Rogier Hendrikus Magdalena CORTIE , Sudhir SRIVASTAVA , Theodorus Johannes Antonius RENCKENS , Jeroen Gerard GOSEN , Erik Henricus Egidius Catharina EUMMELEN , Hendrikus Johannes SCHELLENS , Adrianus Marinus Wouter HEEREN , Bo LENSSEN
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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