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公开(公告)号：US09167679B2
公开(公告)日：2015-10-20
申请号：US14658417
申请日：2015-03-16
Applicant: ASML Netherlands B.V.
Inventor： Vladimir B. Fleurov , Igor V. Fomenkov
Abstract: A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor; and an electronic processor coupled to a computer-readable storage medium, the medium storing instructions that, when executed, cause the processor to: receive data from the first sensor and the second sensor, and determine, based on the received data, a location of the irradiating amplified light beam relative to the target material in more than one dimension.
Abstract translation: 用于极紫外光源的系统包括一个或多个定位成接收反射放大光束并将反射的放大光束引导到第一，第二和第三通道中的光学元件，反射的放大光束至少包括至少 与目标材料相互作用的照射放大光束的一部分; 感测来自第一通道的光的第一传感器; 第二传感器，其感测来自第二通道和第三通道的光，第二传感器具有比第一传感器低的采集速率; 以及耦合到计算机可读存储介质的电子处理器，所述介质存储指令，所述指令在被执行时使所述处理器：从所述第一传感器和所述第二传感器接收数据，并且基于所接收的数据来确定 在多于一个维度上相对于目标材料照射放大的光束。
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12.发明申请公开(公告)号：US20150209701A1
公开(公告)日：2015-07-30
申请号：US14674724
申请日：2015-03-31
Applicant: ASML Netherlands B.V.
Inventor： Igor V. Fomenkov , William N. Partlo , Gregory O. Vaschenko , William Oldham
Abstract: A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
Abstract translation: 在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。 第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。 通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。 片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。
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公开(公告)号：US09000405B2
公开(公告)日：2015-04-07
申请号：US14184777
申请日：2014-02-20
Applicant: ASML Netherlands B.V.
Inventor： Vladimir B. Fleurov , Igor V. Fomenkov
Abstract: A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor; and an electronic processor coupled to a computer-readable storage medium, the medium storing instructions that, when executed, cause the processor to: receive data from the first sensor and the second sensor, and determine, based on the received data, a location of the irradiating amplified light beam relative to the target material in more than one dimension.
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公开(公告)号：US08912514B2
公开(公告)日：2014-12-16
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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