公开(公告)号：US10649341B2

公开(公告)日：2020-05-12

申请号：US15287524

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus Van Den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03B27/52 ,  G03F7/20

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

公开(公告)号：US10018925B2

公开(公告)日：2018-07-10

申请号：US15452445

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US09429853B2

公开(公告)日：2016-08-30

申请号：US14664360

申请日：2015-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.

Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。