公开(公告)号：US11587758B2

公开(公告)日：2023-02-21

申请号：US17135969

申请日：2020-12-28

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/06 ,  H01J37/10

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US11538655B2

公开(公告)日：2022-12-27

申请号：US17135915

申请日：2020-12-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Xuedong Liu ,  Zhong-wei Chen ,  Weiming Ren

IPC: H01J37/14 ,  H01J37/15 ,  H01J37/153 ,  H01J37/147

Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.

公开(公告)号：US11469074B2

公开(公告)日：2022-10-11

申请号：US16886461

申请日：2020-05-28

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuerang Hu ,  Qingpo Xi ,  Xuedong Liu

IPC: H01J37/244 ,  H01J37/153 ,  H01J37/28

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.

公开(公告)号：US11232928B2

公开(公告)日：2022-01-25

申请号：US16729190

申请日：2019-12-27

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Qian Zhang ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

Abstract: A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.

公开(公告)号：US11062874B2

公开(公告)日：2021-07-13

申请号：US16474027

申请日：2017-12-22

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/145

Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.

公开(公告)号：US11043354B2

公开(公告)日：2021-06-22

申请号：US16799773

申请日：2020-02-24

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US12191109B2

公开(公告)日：2025-01-07

申请号：US18144821

申请日：2023-05-08

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Qingpo Xi ,  Youfei Jiang ,  Weiming Ren ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/12 ,  H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

公开(公告)号：US11948772B2

公开(公告)日：2024-04-02

申请号：US18102766

申请日：2023-01-30

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/12 ,  H01J37/141 ,  H01J37/1474 ,  H01J37/28

Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.

公开(公告)号：US11804356B2

公开(公告)日：2023-10-31

申请号：US17656731

申请日：2022-03-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

CPC classification number: H01J37/1477 ,  H01J37/12 ,  H01J37/26 ,  H01J2237/0213 ,  H01J2237/0262 ,  H01J2237/038 ,  H01J2237/0435

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US11676793B2

公开(公告)日：2023-06-13

申请号：US16679023

申请日：2019-11-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/145 ,  H01J37/26 ,  H01J37/285

CPC classification number: H01J37/145 ,  H01J37/26 ,  H01J37/285

Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.