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39 条记录 (耗时 0.091 秒)

    Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation
    12.
    发明授权
    Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation 失效
    用于确定在离子注入之前，期间或之后的样品的特性的方法和系统

    公开(公告)号：US06812045B1

    公开(公告)日：2004-11-02

    申请号：US09956842

    申请日：2001-09-20

    申请人： Mehrdad Nikoonahad ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Dan Wack ,  John Fielden

    发明人： Mehrdad Nikoonahad ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Dan Wack ,  John Fielden

    IPC分类号： H01L2166

    CPC分类号： G03F7/70616 ,  G01N21/636 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/707 ,  G03F7/70708 ,  H01J2237/31701

    摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a characteristic of a specimen prior to, during, or subsequent to ion implantation. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

    摘要翻译： 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，该系统可以被配置成确定样品的多个性质，包括但不限于在离子注入之前，期间或之后的样品的特性。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

    Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
    15.
    发明授权
    Methods and systems for determining a presence of defects and a thin film characteristic of a specimen 有权
    用于确定缺陷的存在和样品的薄膜特性的方法和系统

    公开(公告)号：US07106425B1

    公开(公告)日：2006-09-12

    申请号：US09956845

    申请日：2001-09-20

    申请人： Gary Bultman ,  Ady Levy ,  Kyle A. Brown ,  Mehrdad Nikoonahad ,  Dan Wack ,  John Fielden

    发明人： Gary Bultman ,  Ady Levy ,  Kyle A. Brown ,  Mehrdad Nikoonahad ,  Dan Wack ,  John Fielden

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/211 ,  G01N21/47 ,  G01N21/636 ,  G01N21/64 ,  G01N2021/646 ,  G01N2021/8825

    摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of defects on the specimen and a thin film characteristic of the specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

    摘要翻译： 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，系统可以被配置为确定样本的多个属性，包括但不限于在样本上存在缺陷和样本的薄膜特性。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。