-
11.发明申请GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权气体放映机，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US20120092631A1
公开(公告)日：2012-04-19
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
-
公开(公告)号：US07310131B2
公开(公告)日：2007-12-18
申请号：US11194764
申请日：2005-08-02
CPC分类号： G03F7/7025
摘要： The projection system of a lithographic apparatus has a plurality of pupil planes and at least two irises provided in respective pupil planes each optimized to provide a high degree of NA uniformity over a respective NA range so that a high degree of NA uniformity can be provided over a wide range of NA settings.
-
公开(公告)号：US06882405B2
公开(公告)日：2005-04-19
申请号：US10686641
申请日：2003-10-17
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52 , G03B27/32 , G03B27/42
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。
-
公开(公告)号：US07224431B2
公开(公告)日：2007-05-29
申请号：US11062765
申请日：2005-02-22
CPC分类号： G03F7/70591 , G03F7/70341 , G03F7/7085 , G03F9/7046
摘要： In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the sensor compatible with the immersion liquid and also make incoupling of radiation easier since the numerical aperture may be less at, for example, patterning device level.
摘要翻译： 例如，浸没式光刻装置，通常设置在基板台上的传感器由基板台上的逆反射器和例如图案形成装置的传感器代替。 这可以避免使得传感器与浸没液体兼容并且还使得辐射的耦合更容易，因为例如在图案形成装置水平上的数值孔径可能较小。
-
-
-
搜索结果
14 条记录 (耗时 0.034 秒)
