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11.发明申请APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 有权用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法公开(公告)号：US20120262687A1
公开(公告)日：2012-10-18
申请号：US13532195
申请日：2012-06-25
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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公开(公告)号：US20100271159A1
公开(公告)日：2010-10-28
申请号：US12718600
申请日：2010-03-05
IPC分类号： H01F5/00
CPC分类号： H01F7/08 , G03F7/70858 , G03F7/709 , H01F5/00 , H01F27/2876
摘要： Methods and apparatus for improving the thermal performance of electromagnetic coils are disclosed. According to one aspect of the present invention, an electromagnetic actuator includes a core and a coil. The coil is formed form a conductor wire that includes a plurality of windings. The windings are arranged around the core, and include at least a first set of windings and a second set of windings. The first set of windings has a different geometry from the second set of windings.
摘要翻译： 公开了用于改善电磁线圈的热性能的方法和装置。 根据本发明的一个方面，电磁致动器包括芯和线圈。 线圈形成为包括多个绕组的导线。 绕组围绕芯布置，并且包括至少第一组绕组和第二组绕组。 第一组绕组具有与第二组绕组不同的几何形状。
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13.发明授权Gas curtain type immersion lithography tool using porous material for fluid removal 有权使用多孔材料进行流体清除的气帘式浸没式光刻工具公开(公告)号：US07576833B2
公开(公告)日：2009-08-18
申请号：US11987788
申请日：2007-12-04
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
摘要翻译： 气帘式浸没式光刻装置具有与气体入口相邻的流体去除多孔区域，以防止蒸发冷却。 该装置包括保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸没流体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 通过进入间隙的入口提供气体。 在气体入口附近设置多孔区域。 通过多孔区域去除在气体入口附近收集的浸液。
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14.发明申请Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus 审中-公开用于减少浸没式光刻设备浸没液体逸出的装置和方法公开(公告)号：US20080231823A1
公开(公告)日：2008-09-25
申请号：US12076501
申请日：2008-03-19
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.
摘要翻译： 台架组件包括支撑邻近光学组件的工件的工件台。 环境系统将浸入液体从工件和光学组件之间的空间提供并移除，以形成浸入区域。 环境系统具有与工件的上表面和/或工件台相对设置的下表面。 下表面与工件和/或工件台间隔开第一距离，以在浸没区域的周边形成弯液面。 边缘构件设置在环境系统上并且延伸越过环境系统的下表面，使得边缘构件的下部与工件的上表面间距第二距离小于第一距离，并且/ 工件台在超过浸没区域周边的位置。
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公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
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16.发明授权Apparatus and method to control vacuum at porous material using multiple porous materials 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US08477284B2
公开(公告)日：2013-07-02
申请号：US12573356
申请日：2009-10-05
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.
摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和第一和第二液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口，并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一腔室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。
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公开(公告)号：US20090237631A1
公开(公告)日：2009-09-24
申请号：US12379419
申请日：2009-02-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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18.发明申请Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器公开(公告)号：US20090231560A1
公开(公告)日：2009-09-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
摘要翻译： 浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。 浸没液体填充表面和最终光学元件之间的间隙。 液体限制构件将浸没液体保持在间隙中。 浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。 可移动的液体转向器位于液体限制构件和载物台之间。 可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。
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19.发明授权Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US07532309B2
公开(公告)日：2009-05-12
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
摘要翻译： 光刻设备包括可以完全浸没衬底的成像表面的流体限制板。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。
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20.发明申请Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US20080231822A1
公开(公告)日：2008-09-25
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地面积”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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