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1.发明授权Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US08068209B2
公开(公告)日：2011-11-29
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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2.发明授权Apparatus and method to control vacuum at porous material using multiple porous materials 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US08634055B2
公开(公告)日：2014-01-21
申请号：US12698565
申请日：2010-02-02
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
摘要翻译： 浸没液体限制装置从浸没式光刻系统中的浸没区域中浸没液体从浸没区域中恢复，该浸没区域包括投影系统和曝光对象之间的间隙。 该装置包括限制构件，其包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。 在第一室和向第一室供应低压的真空系统之间提供疏水性多孔构件。
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公开(公告)号：US08289497B2
公开(公告)日：2012-10-16
申请号：US12379419
申请日：2009-02-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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4.发明申请MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开电磁致动器的微通道冷却线圈展示减少的EDDY-CURRENT DRAG公开(公告)号：US20120062866A1
公开(公告)日：2012-03-15
申请号：US13225235
申请日：2011-09-02
申请人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
发明人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface of the coil. Defined in or on each cooling plate is a coolant passageway that conducts a liquid coolant. A primary pattern of the coolant passageway is coextensive with at least part of the main surface of the coil. The primary pattern can have a secondary pattern through which coolant flows in a manner reducing eddy-current losses. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices exhibit reduced eddy-current drag.
摘要翻译： 公开了具有至少一个主动冷却的线圈组件的电磁致动器。 示例性致动器是线性和平面电动机，其中冷却的线圈组件具有具有第一和第二主表面的线圈。 相应的导热冷却板与线圈的至少一个主表面热接触。 在每个冷却板中或每个冷却板上定义的是冷却剂通道，其导通液体冷却剂。 冷却剂通道的主要图案与线圈的主表面的至少一部分共同延伸。 初级图案可以具有二次图案，冷却剂通过该图案以减少涡流损耗的方式流动。 示例性的次要图案是蛇纹石。 示例性的主要图案是径向的或具有径向方面，例如X形图案。 该装置表现出减小的涡流阻力。
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5.发明申请Apparatus and methods for minimizing force variation from immersion liquid in lithography systems 审中-公开用于最小化光刻系统中浸入液体的力变化的装置和方法公开(公告)号：US20080198348A1
公开(公告)日：2008-08-21
申请号：US12068737
申请日：2008-02-11
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic projection apparatus includes an optical assembly that projects an image onto a workpiece, and a containment member disposed adjacent to a lower end of the optical assembly. The containment member has an aperture through which an exposure beam passes from the optical assembly to the workpiece. The lithographic projection apparatus also includes a stage assembly including a workpiece table that supports the workpiece adjacent to the containment member. A space between the containment member and the workpiece is filled with an immersion liquid. The lithographic projection apparatus further includes a liquid collection system that has a recess in the workpiece table that receives immersion liquid that overflows the space between the containment member and the workpiece. At least part of the recess is disposed radially outward of the workpiece. The recess is partially filled with a porous material.
摘要翻译： 光刻投影装置包括将图像投影到工件上的光学组件和邻近光学组件的下端设置的容纳构件。 容纳构件具有孔，曝光光束通过该孔从光学组件通过工件。 平版印刷投影装置还包括台架组件，其包括支撑靠近容纳构件的工件的工件台。 容纳构件和工件之间的空间填充有浸没液体。 光刻投影装置还包括液体收集系统，该液体收集系统在工件台中具有凹部，该凹部接收溢流在容纳构件和工件之间的空间的浸没液体。 凹部的至少一部分设置在工件的径向外侧。 凹部部分地填充有多孔材料。
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6.发明申请Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US20070279608A1
公开(公告)日：2007-12-06
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译： 公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。 该装置包括限定图像的成像元件和被配置为支撑基板的台。 提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。 在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。 使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。 在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。
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公开(公告)号：US08610873B2
公开(公告)日：2013-12-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
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公开(公告)号：US20090002648A1
公开(公告)日：2009-01-01
申请号：US11987788
申请日：2007-12-04
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
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9.发明申请Apparatus, systems and methods for removing liquid from workpiece during workpiece processing 审中-公开在工件加工过程中从工件上清除液体的设备，系统和方法公开(公告)号：US20080225248A1
公开(公告)日：2008-09-18
申请号：US12073865
申请日：2008-03-11
CPC分类号： G03F7/70341
摘要： Apparatus, systems and methods remove liquid from a workpiece. A first station subjects a workpiece to processing that leaves a liquid on a surface of the workpiece. A second station is disposed at a location spaced apart from the first station. A porous member is disposed between the first and second stations. The porous member has a liquid-phyllic surface that faces the workpiece and is spaced from a surface of the workpiece by a gap. The porous member has a length in a direction perpendicular to a movement direction in which the workpiece moves from the first station to the second station, the length being at least as large as a dimension of the workpiece in the direction perpendicular to the movement direction.
摘要翻译： 设备，系统和方法从工件中清除液体。 第一工位对工件进行处理，在工件的表面上留下液体。 第二站设置在与第一站间隔开的位置处。 多孔构件设置在第一和第二站之间。 多孔构件具有面向工件的液态表面，并且与工件的表面间隔开间隙。 多孔构件具有与工件从第一工位移动到第二工位的移动方向垂直的方向上的长度，其长度至少与工件沿与移动方向垂直的方向的尺寸一样大。
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10.发明申请Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US20080225246A1
公开(公告)日：2008-09-18
申请号：US11976898
申请日：2007-10-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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