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11.发明授权Method and system for detecting particle contamination in an immersion lithography tool 有权浸没式光刻工具中检测颗粒污染的方法和系统公开(公告)号：US08605250B2
公开(公告)日：2013-12-10
申请号：US12732751
申请日：2010-03-26
申请人： Rolf Seltmann , Rene Wirtz
发明人： Rolf Seltmann , Rene Wirtz
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085
摘要： In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.
摘要翻译： 在浸没光刻工具中，可以基于产生光学测量数据的在线检测系统来估计浸没罩表面的状态。 例如，可以实现数字成像系统以获得光学测量数据，而不需要将光刻工具的内部暴露于环境空气。 在其他情况下，可以应用其它光学测量技术，例如FTIR等。
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12.发明授权公开(公告)号：US08455864B2
公开(公告)日：2013-06-04
申请号：US12939519
申请日：2010-11-04
申请人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Nikolaus Knorr , Zoi Karipidou , Ameneh Bamedi Zilai
发明人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Nikolaus Knorr , Zoi Karipidou , Ameneh Bamedi Zilai
IPC分类号： H01L51/05
CPC分类号： H01L27/286 , H01L51/0036 , H01L51/0575 , H01L51/102
摘要： Method of manufacture of an electronic device, comprising providing a substrate comprising a semiconductor device stack, depositing a first material layer over the substrate, the first material layer being an insulating layer, depositing an active organic material layer over the first material layer, depositing a second material layer over the active organic material layer, the second material layer being an insulating layer.
摘要翻译： 一种电子设备的制造方法，包括提供包括半导体器件堆叠的衬底，在所述衬底上沉积第一材料层，所述第一材料层是绝缘层，在所述第一材料层上沉积活性有机材料层， 在所述活性有机材料层上方的第二材料层，所述第二材料层是绝缘层。
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13.发明授权公开(公告)号：US08338061B2
公开(公告)日：2012-12-25
申请号：US13158234
申请日：2011-06-10
IPC分类号： G03F1/00
摘要： Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through the fluorine-passivated reticle to the target semiconductor wafer. In another embodiment, a fluorine-passivated reticle comprises a substrate and a patterned fluorine-passivated absorber material layer overlying the substrate. According to another embodiment, a method for fabricating a reticle for use in photolithography comprises providing a substrate and forming a fluorine-passivated absorber material layer overlying the substrate.
摘要翻译： 提供用于光刻的氟钝化的掩模版以及制造和使用这种掩模版的方法。 根据一个实施例，一种用于执行光刻的方法包括在照明源和目标半导体晶片之间放置氟钝化的掩模版，并使电磁辐射从照明源通过氟钝化掩模版到达目标半导体晶片。 在另一个实施例中，氟钝化的掩模版包括衬底和覆盖衬底的图案化的氟钝化吸收材料层。 根据另一实施例，一种用于光刻中使用的掩模版的制造方法包括提供基板并形成覆盖在基板上的氟钝化的吸收材料层。
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14.发明申请公开(公告)号：US20110244377A1
公开(公告)日：2011-10-06
申请号：US13158234
申请日：2011-06-10
IPC分类号： G03F1/14
摘要： Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through the fluorine-passivated reticle to the target semiconductor wafer. In another embodiment, a fluorine-passivated reticle comprises a substrate and a patterned fluorine-passivated absorber material layer overlying the substrate. According to another embodiment, a method for fabricating a reticle for use in photolithography comprises providing a substrate and forming a fluorine-passivated absorber material layer overlying the substrate.
摘要翻译： 提供用于光刻的氟钝化的掩模版以及制造和使用这种掩模版的方法。 根据一个实施例，一种用于执行光刻的方法包括在照明源和目标半导体晶片之间放置氟钝化的掩模版，并使电磁辐射从照明源通过氟钝化掩模版到达目标半导体晶片。 在另一个实施例中，氟钝化的掩模版包括衬底和覆盖衬底的图案化的氟钝化吸收材料层。 根据另一实施例，一种用于光刻中使用的掩模版的制造方法包括提供基板并形成覆盖在基板上的氟钝化的吸收材料层。
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公开(公告)号：US20110127487A1
公开(公告)日：2011-06-02
申请号：US13056508
申请日：2009-07-31
申请人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Bjoern Luessem
发明人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Bjoern Luessem
IPC分类号： H01L27/24 , H01L29/772 , H01L21/02
CPC分类号： H01L51/0591 , G11C13/0007 , G11C13/0014 , G11C13/0016 , G11C13/003 , G11C2213/32 , G11C2213/75 , G11C2213/79 , H01L27/283 , H01L27/285 , H03K19/17784 , H03K19/17792
摘要： The invention relates to an electronic device, comprising a field effect transistor and a resistive switch electrically coupled with each other, wherein the resistive switch is configured to be switched between a state of low resistance and a state of high resistance.
摘要翻译： 本发明涉及一种电子设备，包括电场耦合的场效应晶体管和电阻式开关，其中电阻开关被配置为在低电阻状态和高电阻状态之间切换。
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公开(公告)号：US20110108816A1
公开(公告)日：2011-05-12
申请号：US12939519
申请日：2010-11-04
申请人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Nikolaus Knorr , Zoi Karipidou , Ameneh Bamedi Zilai
发明人： Rene Wirtz , Silvia Rosselli , Gabriele Nelles , Nikolaus Knorr , Zoi Karipidou , Ameneh Bamedi Zilai
CPC分类号： H01L27/286 , H01L51/0036 , H01L51/0575 , H01L51/102
摘要： Method of manufacture of an electronic device, comprising providing a substrate comprising a semiconductor device stack, depositing a first material layer over the substrate, the first material layer being an insulating layer, depositing an active organic material layer over the first material layer, depositing a second material layer over the active organic material layer, the second material layer being an insulating layer.
摘要翻译： 一种电子设备的制造方法，包括提供包括半导体器件堆叠的衬底，在所述衬底上沉积第一材料层，所述第一材料层是绝缘层，在所述第一材料层上沉积活性有机材料层， 在所述活性有机材料层上方的第二材料层，所述第二材料层是绝缘层。
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17.发明申请SELF-CORRECTING SUBSTRATE SUPPORT SYSTEM FOR FOCUS CONTROL IN EXPOSURE SYSTEMS 审中-公开自动校正基板支持系统，用于接触系统中的聚焦控制公开(公告)号：US20100112468A1
公开(公告)日：2010-05-06
申请号：US12575003
申请日：2009-10-07
申请人： Andre Poock , Rene Wirtz
发明人： Andre Poock , Rene Wirtz
CPC分类号： G03F7/707
摘要： A substrate support system for process tools, such as lithography tools, comprises a configuration in which a local height level adjustment may be accomplished. Thus, upon detecting a non-allowable height level, the corresponding portion of the substrate support surface may be re-adjusted. Hence, the focus conditions of advanced exposure processes may be significantly enhanced, thereby providing superior process results and also increasing tool utilization.
摘要翻译： 用于诸如光刻工具的处理工具的衬底支撑系统包括其中可以实现局部高度调节的构造。 因此，在检测到不允许的高度水平时，可以重新调整衬底支撑表面的对应部分。 因此，可以显着增强先进曝光工艺的重点条件，从而提供优异的工艺结果并提高工具利用率。
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