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11.发明公开公开(公告)号：US20240350962A1
公开(公告)日：2024-10-24
申请号：US18136990
申请日：2023-04-20
Applicant: Applied Materials, Inc.
Inventor： Andrea Leoncini , Zhijie Chua
CPC classification number: B01D53/002 , B01D8/00 , B01D53/75 , B01D2221/14 , B01D2257/108 , B01D2257/11 , B01D2258/0216
Abstract: Chemical precursor recovery systems and methods of recovering and reusing semiconductor manufacturing chemistry are disclosed. The recovery systems include a cold trap inlet line in fluid communication with a plurality of cold traps and a cold trap outlet line. The plurality of cold traps is configured to condense the chemical precursors and are arranged based on semiconductor manufacturing process conditions.
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公开(公告)号：US11459347B2
公开(公告)日：2022-10-04
申请号：US17146683
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
IPC: C07F11/00 , C23C16/455 , C23C16/18
Abstract: Molybdenum(IV) and molybdenum(III) coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US11434254B2
公开(公告)日：2022-09-06
申请号：US17146666
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
IPC: C07F11/00 , C23C16/18 , C23C16/455
Abstract: Dinuclear molybdenum coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a dinuclear molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US20220220139A1
公开(公告)日：2022-07-14
申请号：US17146878
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong , Mark Saly , Bhaskar Jyoti Bhuyan
IPC: C07F11/00 , C23C16/455 , C23C16/02 , C23C16/56
Abstract: Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US20240343748A1
公开(公告)日：2024-10-17
申请号：US18743333
申请日：2024-06-14
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong , Mark Saly , Bhaskar Jyoti Bhuyan
IPC: C07F11/00 , C23C16/02 , C23C16/455 , C23C16/56
CPC classification number: C07F11/00 , C23C16/0209 , C23C16/0227 , C23C16/0254 , C23C16/45527 , C23C16/56
Abstract: Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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Patent Agency Ranking
公开(公告)号：US20230129073A1
公开(公告)日：2023-04-27
申请号：US18085006
申请日：2022-12-20
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
Abstract: Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US11530477B2
公开(公告)日：2022-12-20
申请号：US17146890
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
Abstract: Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US20220220607A1
公开(公告)日：2022-07-14
申请号：US17146890
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
Abstract: Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US20220220140A1
公开(公告)日：2022-07-14
申请号：US17146886
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
Abstract: Molybdenum(0) coordination complexes comprising an arene ligand and one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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公开(公告)号：US20220220138A1
公开(公告)日：2022-07-14
申请号：US17146683
申请日：2021-01-12
Applicant: Applied Materials, Inc. , National University of Singapore
Inventor： Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
IPC: C07F11/00 , C23C16/455 , C23C16/18
Abstract: Molybdenum(IV) and molybdenum(III) coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
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