公开(公告)号：US20230259585A1

公开(公告)日：2023-08-17

申请号：US18136488

申请日：2023-04-19

Applicant: Applied Materials, Inc.

Inventor： Jimmy Iskandar ,  Michael D. Armacost

IPC: G06F18/10 ,  G06N3/04 ,  G06F18/25 ,  G06F18/2433

CPC classification number: G06F18/10 ,  G06N3/04 ,  G06F18/251 ,  G06F18/2433

Abstract: Implementations disclosed describe systems and techniques to detect anomalies in a manufacturing operation. The techniques include generating, using a plurality of outlier detection models, a plurality of outlier scores. The outlier scores are representative of a degree of presence, in a plurality of sensor statistics, of an anomaly associated with the manufacturing operation. Individual outlier scores are generated using a respective one of the plurality of outlier detection models. The techniques further include determining, using the outlier scores, a likelihood of the anomaly associated with the manufacturing operation.

公开(公告)号：US20230126028A1

公开(公告)日：2023-04-27

申请号：US17511450

申请日：2021-10-26

Applicant: Applied Materials, Inc.

Inventor： James Robert Moyne ,  Jimmy Iskandar

IPC: G05B19/4099 ,  G06N20/00

Abstract: A method includes receiving one or more fingerprint dimensions to be used to generate a fingerprint. The method further includes receiving trace data associated with a manufacturing process. The method further includes applying the one or more fingerprint dimensions to the trace data to generate at least one feature. The method further includes generating the fingerprint based on the at least one feature. The method further includes causing, based on the fingerprint, performance of a corrective action associated with one or more manufacturing processes.

公开(公告)号：US11610076B2

公开(公告)日：2023-03-21

申请号：US16534828

申请日：2019-08-07

Applicant: Applied Materials, Inc.

Inventor： Jimmy Iskandar ,  James Robert Moyne

IPC: G06K9/62 ,  G05B23/02 ,  G06F11/34 ,  G06F11/30 ,  G06N20/00

Abstract: A method includes receiving, from sensors, current trace data including current sensor values associated with producing products. The method further includes processing the current trace data to identify features of the current trace data and providing the features of the current trace data as input to a trained machine learning model that uses a hyperplane limit for product classification. The method further includes obtaining, from the trained machine learning model, outputs indicative of predictive data associated with the hyperplane limit and processing the predictive data and the hyperplane limit to determine: first products associated with a first product classification and second products associated with a second product classification based exclusively on the subset of the plurality of features; and third products associated with the first product classification or the second product classification based on an additional feature not within the subset.

公开(公告)号：US10140394B2

公开(公告)日：2018-11-27

申请号：US14841365

申请日：2015-08-31

Applicant: Applied Materials, Inc.

Inventor： Subrahmanyam Venkata Rama Kommisetti ,  Haw Jyue Luo ,  Jimmy Iskandar ,  Hsincheng Lai ,  Parris Hawkins

IPC: G06F17/50 ,  H05B37/03 ,  G06F7/556 ,  G05B23/02

Abstract: Embodiments disclosed herein include methods for reducing or eliminating the impact of tuning disturbances during prediction of lamp failure. In one embodiment, the method comprises monitoring data of a lamp module for a process chamber using one or more physical sensors disposed at different locations within the lamp module, creating virtual sensors based on monitoring data of the lamp module, and providing a prediction model for the lamp module using the virtual sensors as inputs.

公开(公告)号：US20240427324A1

公开(公告)日：2024-12-26

申请号：US18341650

申请日：2023-06-26

Applicant: Applied Materials, Inc.

Inventor： Jimmy Iskandar ,  Fei LI ,  Arvind Shankar Raman ,  James Robert Moyne ,  Eda Tuncel ,  Michael Armacost

IPC: G05B23/02

Abstract: Implementations relate to techniques of monitoring conditions of tools used in device manufacturing systems. The techniques include storing a failure index (FI) model generated using run-time sensor data that was collected during operations of a tool that occurred prior to a low number of failures of the tool or even before any such failures occur. The FI model includes an FI function of the run-time sensor data and FI threshold value(s) associated with conditions of the tool. The techniques further include collecting new run-time sensor data and applying the FI model to the new run-time sensor data to identify one or more conditions associated with the tool. The techniques further include updating the FI model responsive to one or more tool failures.

公开(公告)号：US12019507B2

公开(公告)日：2024-06-25

申请号：US17748780

申请日：2022-05-19

Applicant: Applied Materials, Inc.

Inventor： Fei Li ,  Jimmy Iskandar ,  James Robert Moyne

IPC: G06F11/00 ,  G06F11/07 ,  G06F11/34

CPC classification number: G06F11/0793 ,  G06F11/0721 ,  G06F11/3495

Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates having property values that meet threshold values. The method further includes generating, based on the trace data and a plurality of allowable types of variance, a guardband including an upper limit and a lower limit for fault detection. The method further includes causing, based on the guardband, performance of a corrective action associated with the substrate processing system.

公开(公告)号：US20230376373A1

公开(公告)日：2023-11-23

申请号：US17748780

申请日：2022-05-19

Applicant: Applied Materials, Inc.

Inventor： Fei Li ,  Jimmy Iskandar ,  James Robert Moyne

IPC: G06F11/07 ,  G06F11/34

CPC classification number: G06F11/0793 ,  G06F11/0721 ,  G06F11/3495

Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates having property values that meet threshold values. The method further includes generating, based on the trace data and a plurality of allowable types of variance, a guardband including an upper limit and a lower limit for fault detection. The method further includes causing, based on the guardband, performance of a corrective action associated with the substrate processing system.

公开(公告)号：US11657122B2

公开(公告)日：2023-05-23

申请号：US16947052

申请日：2020-07-16

Applicant: Applied Materials, Inc.

Inventor： Jimmy Iskandar ,  Michael D. Armacost

IPC: G06K9/62 ,  G06N3/04

CPC classification number: G06K9/6298 ,  G06K9/6284 ,  G06K9/6289 ,  G06N3/04

Abstract: Implementations disclosed describe a method and a system to perform the method of obtaining a reduced representation of a plurality of sensor statistics representative of data collected by a plurality of sensors associated with a device manufacturing system performing a manufacturing operation. The method further includes generating, using a plurality of outlier detection models, a plurality of outlier scores, each of the plurality of outlier scores generated based on the reduced representation of the plurality of sensor statistics using a respective one of the plurality of outlier detection models. The method further includes processing the plurality of outlier scores using a detector neural network to generate an anomaly score indicative of a likelihood of an anomaly associated with the manufacturing operation.

公开(公告)号：US20210116898A1

公开(公告)日：2021-04-22

申请号：US17137679

申请日：2020-12-30

Applicant: Applied Materials, Inc.

Inventor： James Robert Moyne ,  Jimmy Iskandar

IPC: G05B19/418 ,  G05B13/04 ,  G03F7/20 ,  F27B17/00 ,  H05K3/00 ,  H01L21/67 ,  H01L21/66

Abstract: A method includes identifying first parameters of a first processing chamber of a semiconductor fabrication facility. The first parameters include first input parameters and first output parameters. The method further includes identifying second parameters of a second processing chamber of the semiconductor fabrication facility. The second parameters include second input parameters and second output parameters. The method further includes generating, by a processing device based on the first parameters and the second parameters, composite parameters comprising composite input parameters and composite output parameters. Semiconductor fabrication is based on the composite parameters.

公开(公告)号：US20210042570A1

公开(公告)日：2021-02-11

申请号：US16534828

申请日：2019-08-07

Applicant: Applied Materials, Inc.

Inventor： Jimmy Iskandar ,  James Robert Moyne

IPC: G06K9/62 ,  G05B23/02 ,  G06N20/00 ,  G06F11/30 ,  G06F11/34

Abstract: A method includes receiving, from sensors, current trace data including current sensor values associated with producing products. The method further includes processing the current trace data to identify features of the current trace data and providing the features of the current trace data as input to a trained machine learning model that uses a hyperplane limit for product classification. The method further includes obtaining, from the trained machine learning model, outputs indicative of predictive data associated with the hyperplane limit and processing the predictive data and the hyperplane limit to determine: first products associated with a first product classification and second products associated with a second product classification based exclusively on the subset of the plurality of features; and third products associated with the first product classification or the second product classification based on an additional feature not within the subset.