公开(公告)号：US20230265576A1

公开(公告)日：2023-08-24

申请号：US18005171

申请日：2021-06-30

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Verena STREMPEL ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Robert BRAENDLE ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38

CPC classification number: C25D3/38

Abstract: Described herein is an acidic aqueous composition for copper electroplating including

(a) copper ions;
(b) bromide ions; and
(c) at least one additive of formula S1






where
XS1 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl;
RS1 is a monovalent

(a) poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group, or
(b) a poly(oxyethylene)-block-poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group;


RS2, RS3, RS4

(a) are selected from the group consisting of H, RS1, RS40, or
(b) RS3 and an adjacent group RS4 or, if n>2, two adjacent groups RS4 may together form a divalent group XS3;


RS40 is selected from the group consisting of (a) linear or branched C1-C20 alkyl, and (b) linear or branched C1-C20 alkenyl;
XS3 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; and
n is an integer of from 1 to 6.

公开(公告)号：US20220298664A1

公开(公告)日：2022-09-22

申请号：US17805144

申请日：2022-06-02

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12 ,  C25D5/02

Abstract: Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20200173029A1

公开(公告)日：2020-06-04

申请号：US16742085

申请日：2020-01-14

Applicant: BASF SE

Inventor： Cornelia ROEGER-GOEPFERT ,  Roman Benedikt RAETHER ,  Charlotte EMNET ,  Alexandra HAAG ,  Dieter MAYER

IPC: C23C18/31 ,  C25D3/38 ,  H01L21/288 ,  C23C18/32 ,  C25D3/58 ,  H01L21/768

Abstract: Composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising at least three active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides.

公开(公告)号：US20190309429A1

公开(公告)日：2019-10-10

申请号：US16468467

申请日：2017-12-19

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexandra HAAG ,  Charlotte EMNET ,  Alexander FLUEGEL

IPC: C25D3/32 ,  C25D3/38 ,  C25D7/12 ,  H01L21/288

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.