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11.发明申请公开(公告)号：US20120257184A1
公开(公告)日：2012-10-11
申请号：US13438491
申请日：2012-04-03
IPC分类号： G03B27/54
CPC分类号： G03F1/70 , G03F1/72 , G03F7/70283 , G03F7/7065
摘要： A lithographic apparatus includes a mask correction system configured to controllably and locally alter a property of a mask, for example transmissivity, transmissivity to a particular polarization state, birefringence and/or geometry. The mask correction system, in an embodiment, directs a beam of radiation onto a spot of the mask, the mask being scanned relative to the mask correction system. The mask correction system may include an arrangement to irradiate multiple spots on the mask substantially simultaneously.
摘要翻译： 光刻设备包括掩模校正系统，其被配置为可控地和局部地改变掩模的性质，例如透射率，对特定偏振状态的透射率，双折射和/或几何形状。 在一个实施例中，掩模校正系统将辐射束引导到掩模的光斑上，掩模相对于掩模校正系统被扫描。 掩模校正系统可以包括基本上同时照射掩模上的多个点的装置。
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公开(公告)号：US20130057841A1
公开(公告)日：2013-03-07
申请号：US13544656
申请日：2012-07-09
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/709
摘要： A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
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13.发明申请公开(公告)号：US20120229786A1
公开(公告)日：2012-09-13
申请号：US13416387
申请日：2012-03-09
申请人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
发明人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
IPC分类号： G03B27/54
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70616
摘要： A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
摘要翻译： 一种控制光刻设备的方法，所述方法包括设置光刻设备的照明系统以实现选择的照明模式，测量光刻设备的第一参数的值，计算投影图像的第二参数的值 使用光刻设备的模型和第一参数的测量值具有多个特征的测试图案的特征，以及参考所计算的第二参数的值来控制光刻设备。
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公开(公告)号：US20090263734A1
公开(公告)日：2009-10-22
申请号：US12493592
申请日：2009-06-29
CPC分类号： G03F7/70341
摘要： In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.
摘要翻译： 在无光掩模光刻中，单个衬底的扫描通常比常规光刻中慢得多。 描述了将浸没式光刻技术应用于无光掩模光刻中的解决方案，并且特别地提供了一种或多种解决方案，以减少在成像期间浸没液体与衬底的顶表面的任何给定部分接触的时间量。
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公开(公告)号：US20090262318A1
公开(公告)日：2009-10-22
申请号：US12423528
申请日：2009-04-14
申请人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cedric Desire GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
发明人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cedric Desire GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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