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公开(公告)号：US08780321B2
公开(公告)日：2014-07-15
申请号：US12631113
申请日：2009-12-04
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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公开(公告)号：US20110273679A1
公开(公告)日：2011-11-10
申请号：US13187086
申请日：2011-07-20
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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公开(公告)号：US20090262318A1
公开(公告)日：2009-10-22
申请号：US12423528
申请日：2009-04-14
申请人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cedric Desire GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
发明人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cedric Desire GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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公开(公告)号：US20080316441A1
公开(公告)日：2008-12-25
申请号：US11812507
申请日：2007-06-19
申请人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
发明人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
IPC分类号： G03B27/42
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983
摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。
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公开(公告)号：US20080212046A1
公开(公告)日：2008-09-04
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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公开(公告)号：US08681308B2
公开(公告)日：2014-03-25
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。
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7.发明申请公开(公告)号：US20110199592A1
公开(公告)日：2011-08-18
申请号：US12946618
申请日：2010-11-15
申请人： Roelof Frederik De Graff , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
发明人： Roelof Frederik De Graff , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
CPC分类号： C09J7/0217 , B32B2307/546 , B32B2307/56 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/21 , C09J7/385 , G03F7/70341 , G03F7/70808 , G03F7/70916 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
摘要翻译： 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。
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8.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体处理结构，平面设备和设备制造方法公开(公告)号：US20110005603A1
公开(公告)日：2011-01-13
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
IPC分类号： F03B11/00
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。
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9.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：US07361911B2
公开(公告)日：2008-04-22
申请号：US11007579
申请日：2004-12-09
申请人： Johannes Hubertus Josephina Moors , Robertus Nicodemus Jacobus Van Ballegoij , Vadim Yevgenyevich Banine , Gert-Jan Heerens , Frederik Theodorus Elisabeth Heuts , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Hendrik Antony Johannes Neerhof
发明人： Johannes Hubertus Josephina Moors , Robertus Nicodemus Jacobus Van Ballegoij , Vadim Yevgenyevich Banine , Gert-Jan Heerens , Frederik Theodorus Elisabeth Heuts , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Hendrik Antony Johannes Neerhof
IPC分类号： B21D53/84
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908
摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.
摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。
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