公开(公告)号：US07136142B2

公开(公告)日：2006-11-14

申请号：US10852686

申请日：2004-05-25

申请人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

发明人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。

公开(公告)号：US09036127B2

公开(公告)日：2015-05-19

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

发明人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US20090262318A1

公开(公告)日：2009-10-22

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

发明人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US06933513B2

公开(公告)日：2005-08-23

申请号：US10140437

申请日：2002-05-08

申请人： Tjarko Adriaan Rudolf Van Empel ,  Raymond Laurentius Johannes Schrijver ,  Johannes Andreas Henricus Maria Jacobs ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars

发明人： Tjarko Adriaan Rudolf Van Empel ,  Raymond Laurentius Johannes Schrijver ,  Johannes Andreas Henricus Maria Jacobs ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars

IPC分类号： G03F7/20 ,  G21G5/00 ,  G03B27/42 ,  G03B27/52 ,  G21G4/00

CPC分类号： G03F7/70983 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70933

摘要： In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

摘要翻译： 在使用相对较短波长的曝光辐射的光刻设备中，例如， 157或126nm，在设备的移动部件中或与其邻近的横梁的横跨两部分提供了N 2层的流动。 可以使用各种结构来提供层流，包括筛网，沉降室，成角度的入口和具有增加的横截面积的流动路径。