公开(公告)号：US08601407B2

公开(公告)日：2013-12-03

申请号：US13217345

申请日：2011-08-25

Applicant: Hung-Chun Wang ,  Pei-Shiang Chen ,  Tzu-Chin Lin ,  Cheng-Hung Chen ,  Shih-Chi Wang ,  Nian-Fuh Cheng ,  Jeng-Horng Chen ,  Wen-Chun Huang ,  Ru-Gun Liu

Inventor： Hung-Chun Wang ,  Pei-Shiang Chen ,  Tzu-Chin Lin ,  Cheng-Hung Chen ,  Shih-Chi Wang ,  Nian-Fuh Cheng ,  Jeng-Horng Chen ,  Wen-Chun Huang ,  Ru-Gun Liu

IPC: G06F17/50

CPC classification number: G03F7/2059

Abstract: Provided is a method of performing a maskless lithography process. The method includes providing a proximity correction pattern. The method includes generating a deformed pattern based on the proximity correction pattern. The method includes performing a first convolution process to the proximity correction pattern to generate a first proximity correction pattern contour. The method includes processing the first proximity correction pattern contour to generate a second proximity correction pattern contour. The method includes performing a second convolution process to the deformed pattern to generate a first deformed pattern contour. The method includes processing the first deformed pattern contour to generate a second deformed pattern contour. The method includes identifying mismatches between the second proximity correction pattern contour and the second deformed pattern contour. The method includes determining whether the deformed pattern is lithography-ready in response to the identifying.

Abstract translation: 提供了进行无掩模光刻处理的方法。 该方法包括提供接近校正模式。 该方法包括基于接近校正图案生成变形图案。 该方法包括对接近校正图案执行第一卷积处理以产生第一邻近校正图案轮廓。 该方法包括处理第一接近校正图案轮廓以产生第二邻近校正图案轮廓。 该方法包括对变形图案执行第二卷积处理以产生第一变形图案轮廓。 该方法包括处理第一变形图案轮廓以产生第二变形图案轮廓。 该方法包括识别第二接近校正图案轮廓和第二变形图案轮廓之间的不匹配。 该方法包括响应于识别确定变形图案是否是光刻刻画的。

公开(公告)号：US20130162509A1

公开(公告)日：2013-06-27

申请号：US13503374

申请日：2012-01-16

Applicant: Cheng-Hung Chen

Inventor： Cheng-Hung Chen

IPC: G09G3/36 ,  H01L33/44

CPC classification number: H01L29/41733 ,  G09G3/3648 ,  G09G2300/0465 ,  H01L27/124

Abstract: The present invention discloses a thin-film transistor liquid crystal display device, a substrate, and a manufacturing method. The thin-film transistor liquid crystal display device includes: a substrate and a signal line, a scan line, a pixel electrode, and a thin-film transistor that are formed on the substrate. The signal line and the scan line are arranged to intersect each other. The pixel electrode is located in a pixel display zone enclosed by the intersected signal line and scan line. The thin-film transistor includes a gate terminal, a source terminal, and a drain terminal. The gate terminal is electrically connected to the scan line. The drain terminal is electrically connected to the signal line. The source terminal is arranged at a position corresponding to the intersection of the signal line and the scan line and is electrically connected to the pixel electrode. With the above arrangement, the present invention can significantly reduce the amount of area of the pixel electrode occupied, increases the opening ratio of the pixel, and greatly reduces the influence on the alignment of the liquid crystal molecules thereby reducing asymmetry of the pixel quadrant and improving image quality.

Abstract translation: 本发明公开了一种薄膜晶体管液晶显示装置，基板及其制造方法。 薄膜晶体管液晶显示装置包括：基板和形成在基板上的信号线，扫描线，像素电极和薄膜晶体管。 信号线和扫描线被布置成彼此相交。 像素电极位于由交叉的信号线和扫描线包围的像素显示区域中。 薄膜晶体管包括栅极端子，源极端子和漏极端子。 栅极端子与扫描线电连接。 漏极端子与信号线电连接。 源极端子配置在与信号线和扫描线的交叉点对应的位置，与电极连接。 通过上述结构，本发明能够显着地减少像素电极的占用面积，提高像素的开口率，大大降低对液晶分子取向的影响，减少像素象限的不对称性， 提高图像质量。

公开(公告)号：US20110157243A1

公开(公告)日：2011-06-30

申请号：US12892480

申请日：2010-09-28

Applicant: Cheng-Hung Chen ,  Tsung-Cheng Lin ,  Hung-Ju Chang

Inventor： Cheng-Hung Chen ,  Tsung-Cheng Lin ,  Hung-Ju Chang

IPC: G09G5/10 ,  G09G5/00

CPC classification number: G09G3/3659 ,  G09G2300/0426 ,  G09G2320/0252 ,  G09G2340/0435

Abstract: A display apparatus and a method for driving a display panel thereof are provided. The display apparatus comprises a display panel and a gate driver. The display panel comprises two gate lines, two source lines, a pixel and two transistors. The pixel is electrically coupled to the two gate lines and the two source lines through the two transistors respectively. The gate driver is for providing a first pulse to one of the gate lines according to a predetermined frequency and providing a second pulse to another one according to the predetermined frequency. An enabling period of the second pulse is behind an enabling period of the first pulse, and a predetermined time interval is existed between a rising edge of the second pulse and a rising edge of the first pulse. The predetermined time interval is longer than a time length of the enabling period of the first pulse.

Abstract translation: 提供了一种用于驱动显示面板的显示装置和方法。 显示装置包括显示面板和门驱动器。 显示面板包括两条栅极线，两条源极线，一个像素和两个晶体管。 像素分别通过两个晶体管电耦合到两个栅极线和两个源极线。 栅极驱动器用于根据预定频率向其中一条栅极线提供第一脉冲，并且根据预定频率向第二脉冲提供第二脉冲。 第二脉冲的使能周期落后于第一脉冲的使能周期，并且在第二脉冲的上升沿和第一脉冲的上升沿之间存在预定的时间间隔。 预定时间间隔比第一脉冲的使能期间的时间长度长。

公开(公告)号：US07969580B2

公开(公告)日：2011-06-28

申请号：US12266668

申请日：2008-11-07

Applicant: Jia-Yush Yen ,  Shuo-Hung Chang ,  Cheng-Hung Chen ,  Lien-Sheng Chen

Inventor： Jia-Yush Yen ,  Shuo-Hung Chang ,  Cheng-Hung Chen ,  Lien-Sheng Chen

IPC: G01B11/02

CPC classification number: G03B27/42 ,  G03F7/70408 ,  G03F7/70475

Abstract: A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography. Besides, the present invention further provides a system for step-and-align interference lithography, which is capable of compensating the positioning error caused by a stepping movement control used for moving a substrate or the light beams in a stepwise manner to form interference-patterned regions by interference lithography and thus the so-generated interference-patterned regions are accurate aligned with one another on a two-dimensional plane for preparing the same to be stitched together to form a two-dimensional large-area periodic structure.

Abstract translation: 在本发明中提供了一种用于步进和对准干涉光刻的方法，通过该方法，测量与作为干涉光束的源的干涉光束的移动相关的位移误差由载体移动以在载体之前移动 干涉光刻，然后使用位移误差作为参考，以补偿步进和对准干涉光刻期间相邻干涉图案之间的定位误差。 此外，本发明还提供了一种用于步进和对准干涉光刻的系统，其能够以逐步的方式补偿由用于移动衬底或光束的步进移动控制引起的定位误差，以形成干涉图案 通过干涉光刻形成区域，因此如此产生的干涉图案区域在二维平面上彼此准确地对准，以便制造相同的缝合在一起以形成二维大面积周期性结构。

公开(公告)号：US07002880B2

公开(公告)日：2006-02-21

申请号：US10708206

申请日：2004-02-17

Applicant: Jia-Shing Sheu ,  Cheng-Hung Chen

Inventor： Jia-Shing Sheu ,  Cheng-Hung Chen

IPC: G11B7/00

CPC classification number: G11B7/0953

Abstract: An optical disk drive for accessing data stored on a compact disc has a housing, a sled sliding inside the housing, a driving device for driving the sled, an actuator installed on the sled, a servo device for providing a push force to drive the actuator, a control circuitry for controlling operations of the optical disk drive, an adaptive compensator, and an error signal generation circuit. The actuator can move within a predetermined range on the sled, wherein the predetermined range includes a linear region and a non-linear region. It is desirable to keep the actuator within the linear region of the predetermined range. For this, an adaptive compensator is used to provide a supplementary force to the sled when the actuator is near the non-linear region.

公开(公告)号：US20050088925A1

公开(公告)日：2005-04-28

申请号：US10708206

申请日：2004-02-17

Applicant: Jia-Shing Sheu ,  Cheng-Hung Chen

Inventor： Jia-Shing Sheu ,  Cheng-Hung Chen

IPC: G11B7/00 ,  G11B7/095

CPC classification number: G11B7/0953

Abstract: An optical disk drive for accessing data stored on a compact disc has a housing, a sled sliding inside the housing, a driving device for driving the sled, an actuator installed on the sled, a servo device for providing a push force to drive the actuator, a control circuitry for controlling operations of the optical disk drive, an adaptive compensator, and an error signal generation circuit. The actuator can move within a predetermined range on the sled, wherein the predetermined range includes a linear region and a non-linear region. It is desirable to keep the actuator within the linear region of the predetermined range. For this, an adaptive compensator is used to provide a supplementary force to the sled when the actuator is near the non-linear region.

Abstract translation: 用于访问存储在光盘上的数据的光盘驱动器具有壳体，在壳体内滑动的滑动件，用于驱动滑板的驱动装置，安装在滑架上的致动器，用于提供推动力以驱动致动器的伺服装置 ，用于控制光盘驱动器的操作的控制电路，自适应补偿器和误差信号发生电路。 致动器可以在滑架上的预定范围内移动，其中预定范围包括线性区域和非线性区域。 希望将致动器保持在预定范围的线性区域内。 为此，当致动器靠近非线性区域时，使用自适应补偿器来向车把提供辅助力。

公开(公告)号：US09465241B2

公开(公告)日：2016-10-11

申请号：US13703077

申请日：2012-09-26

Applicant: JinJie Wang ,  Cheng-Hung Chen

Inventor： JinJie Wang ,  Cheng-Hung Chen

IPC: G01R31/26 ,  G02F1/13 ,  G02F1/1337

CPC classification number: G02F1/1303 ,  G02F1/133711 ,  G02F2001/133715

Abstract: The present invention discloses an apparatus for applying curing voltages to a liquid crystal substrate. The apparatus includes a plurality of probes, a detecting unit, and an alarm unit. The probes are utilized to apply a voltage to the liquid crystal substrate. The detecting unit is electrically coupled to the probes for determining whether the curing voltages are within a threshold range. The alarm unit is electrically coupled to the detecting unit for giving an alarm prompt when the voltage is not within the threshold range, so as to remind a person without delay. Therefore, the curing voltage applying apparatus of the present invention is capable of increasing product yield, so as to reduce production costs.

Abstract translation: 本发明公开了一种向液晶基板施加固化电压的装置。 该装置包括多个探针，检测单元和报警单元。 利用探针对液晶基板施加电压。 检测单元电耦合到探针，以确定固化电压是否在阈值范围内。 警报单元电耦合到检测单元，用于当电压不在阈值范围内时提供报警提示，以便不延迟地提醒人。 因此，本发明的固化电压施加装置能够提高产品成品率，从而降低生产成本。

公开(公告)号：US08879013B2

公开(公告)日：2014-11-04

申请号：US13503374

申请日：2012-01-16

Applicant: Cheng-Hung Chen

Inventor： Cheng-Hung Chen

IPC: G02F1/136

CPC classification number: H01L29/41733 ,  G09G3/3648 ,  G09G2300/0465 ,  H01L27/124

Abstract: A thin-film transistor liquid crystal display device includes: a substrate and a signal line, a scan line, a pixel electrode, and a thin-film transistor that are formed on the substrate. The signal line and the scan line are arranged to intersect each other. The pixel electrode is located in a pixel display zone enclosed by the intersected signal line and scan line. The thin-film transistor includes a gate terminal, a source terminal, and a drain terminal. The gate terminal is electrically connected to the scan line. The drain terminal is electrically connected to the signal line. The source terminal is arranged at a position corresponding to the intersection of the signal line and the scan line and is electrically connected to the pixel electrode.

Abstract translation: 薄膜晶体管液晶显示装置包括：基板和形成在基板上的信号线，扫描线，像素电极和薄膜晶体管。 信号线和扫描线被布置成彼此相交。 像素电极位于由交叉的信号线和扫描线包围的像素显示区域中。 薄膜晶体管包括栅极端子，源极端子和漏极端子。 栅极端子与扫描线电连接。 漏极端子与信号线电连接。 源极端子配置在与信号线和扫描线的交叉点对应的位置，与电极连接。

公开(公告)号：US20130320243A1

公开(公告)日：2013-12-05

申请号：US13484524

申请日：2012-05-31

Applicant: Cheng-Hung Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen ,  Burn Jeng Lin

Inventor： Cheng-Hung Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen ,  Burn Jeng Lin

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31761

Abstract: The present disclosure provides a method of increasing the wafer throughput by an electron beam lithography system. The method includes scanning a wafer using the maximum scan slit width (MSSW) of the electron beam writer. By constraining the integrated circuit (IC) field size to allow the MSSW to cover a complete field, the MSSW is applied to decrease the scan lanes of a wafer and thereby increase the throughput. When scanning the wafer with the MSSW, the next scan lane data can be rearranged and loaded into a memory buffer. Thus, once one scan lane is finished, the next scan lane data in the memory buffer is read for scanning.

Abstract translation: 本公开提供了一种通过电子束光刻系统增加晶片通过量的方法。 该方法包括使用电子束写入器的最大扫描狭缝宽度（MSSW）扫描晶片。 通过限制集成电路（IC）场尺寸以允许MSSW覆盖整个场，MSSW被应用于减小晶片的扫描通道，从而增加吞吐量。 当用MSSW扫描晶片时，下一个扫描通道数据可以重新排列并加载到存储器缓冲器中。 因此，一旦一个扫描通道完成，读取存储器缓冲器中的下一个扫描通道数据进行扫描。

公开(公告)号：US08563224B1

公开(公告)日：2013-10-22

申请号：US13487850

申请日：2012-06-04

Applicant: Cheng-Hung Chen ,  Pei-Shiang Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen

Inventor： Cheng-Hung Chen ,  Pei-Shiang Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen

IPC: G03C5/00 ,  G03F1/20

CPC classification number: G06F17/50 ,  G03C5/00 ,  G03F1/20 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769 ,  Y10S430/143

Abstract: The present disclosure provides a dithering method of increasing wafer throughput by an electron beam lithography system. The dithering method generates an edge map from a vertex map. The vertex map is generated from an integrated circuit design layout (such as an original pattern bitmap). A gray map (also referred to as a pattern gray map) is also generated from the integrated circuit design layout. By combining the edge map with the gray map, a modified integrated circuit design layout (modified pattern bitmap) is generated for use by the electron beam lithography system.

Abstract translation: 本公开提供了通过电子束光刻系统增加晶片生产量的抖动方法。 抖动方法从顶点图生成边缘图。 顶点图是从集成电路设计布局（如原始图案位图）生成的。 也从集成电路设计布局生成灰色地图（也称为图案灰度图）。 通过将边缘图与灰度图组合，生成修改后的集成电路设计布局（修改图案位图），供电子束光刻系统使用。