公开(公告)号：US07429493B2

公开(公告)日：2008-09-30

申请号：US11184364

申请日：2005-07-18

申请人： Ming Jiang ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Ming Jiang ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： H01L21/00

CPC分类号： G11B5/3163 ,  G11B5/1278

摘要： A method using a CMP resistant hardmask in a process of fabricating a pole piece for a magnetic head is described. A set of layers used as the mask for milling the pole piece preferably includes a CMP resistant hardmask of silicon dioxide, a resist hardmask, an upper hardmask and a photoresist mask respectively. A multi-step reactive-ion etching (RIE) process is preferably used to sequentially remove the excess materials in the layer stack to ultimately define the multilayer mask for the pole piece. The excess pole piece material is then milled away. The wafer is then refilled with a nonmagnetic material such as alumina. A CMP liftoff is used to remove the resist hardmask. The material for the CMP resistant hardmask is selected to have a high resistance to the CMP liftoff process in comparison to the refill material. The CMP resistant hardmask is preferably then removed by a RIE process.

摘要翻译： 描述了在制造用于磁头的极片的工艺中使用CMP耐磨硬掩模的方法。 作为用于研磨极片的掩模的一组层优选分别包括二氧化硅的CMP耐磨硬掩模，抗蚀剂硬掩模，上硬掩模和光致抗蚀剂掩模。 优选使用多步反应离子蚀刻（RIE）工艺来顺序地去除层叠中的多余材料以最终限定极片的多层掩模。 然后将多余的极片材料磨掉。 然后用非磁性材料如氧化铝再填充晶片。 CMP剥离用于去除抗蚀剂硬掩模。 选择用于CMP耐磨硬掩模的材料以与补充材料相比具有对CMP剥离工艺的高抗性。 然后优选通过RIE工艺去除CMP耐磨硬掩模。

公开(公告)号：US20090152234A1

公开(公告)日：2009-06-18

申请号：US11956277

申请日：2007-12-13

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

公开(公告)号：US20070258167A1

公开(公告)日：2007-11-08

申请号：US11411556

申请日：2006-04-25

申请人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

发明人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

IPC分类号： G11B5/147

CPC分类号： G11B5/3116 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

摘要翻译： 用于垂直磁记录的磁写头，具有带有凹后缘的写极。 磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能，例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

公开(公告)号：US07576951B2

公开(公告)日：2009-08-18

申请号：US11411556

申请日：2006-04-25

申请人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

发明人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

摘要翻译： 用于垂直磁记录的磁写头，具有带有凹后缘的写极。 磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能，例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

公开(公告)号：US20090128964A1

公开(公告)日：2009-05-21

申请号：US11944125

申请日：2007-11-21

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49798

摘要： A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.

摘要翻译： 一种用于制造具有围绕磁屏蔽的磁性写入头的方法。 该方法允许使用高精度的短波长（例如193mm光刻）来精确地定义磁屏蔽环绕的放置和临界尺寸。 该方法包括形成磁性写入极，顶部间隙和侧面间隙以及在其上沉积RIEable填充层，并将CMP平坦化。 使用193nm光刻和离子研磨在RIEable层上形成掩模，并且执行一个或多个反应离子蚀刻工艺以通过193nm光刻掩模对RIEable层进行图案化。 然后可以将环绕的护罩电镀到形成在RIEable层中的开口中。

公开(公告)号：US07469467B2

公开(公告)日：2008-12-30

申请号：US11195532

申请日：2005-08-01

申请人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1871 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.

摘要翻译： 垂直写头包括主极，其包括形成在层压层工艺上的Durimide /氧化铝硬掩模，以形成主极，而不使用剥离或化学机械抛光工艺，从而避免极的圆角，主极被控制在 形状，用于改善斜面的轨道宽度和角度的临界尺寸的控制，以避免不期望的相邻轨道写入。

公开(公告)号：US07441325B2

公开(公告)日：2008-10-28

申请号：US11195222

申请日：2005-08-01

申请人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1871 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head including a main pole and a trailing shield, the main pole being made of a diamond-like carbon (DLC) layer as hard mask and a rhodium (Rh) layer as shield gap, both DLC and Rh layers being CMP stop layers so as to avoid corner rounding and damage from chemical mechanical planarization (CMP) process, the DLC layer being removed by reactive ion etching (RIE) to create a trench, the trailing shield being deposited into the trench for self alignment.

摘要翻译： 包括主极和后屏蔽的垂直写头，主极由金刚石碳（DLC）层作为硬掩模和铑（Rh）层作为屏蔽间隙，DLC和Rh层都是CMP停止 层，以避免由化学机械平面化（CMP）工艺引起的角落圆角和损伤，通过反应离子蚀刻（RIE）去除DLC层以产生沟槽，后屏蔽层沉积到沟槽中用于自对准。

公开(公告)号：US20050259355A1

公开(公告)日：2005-11-24

申请号：US11195222

申请日：2005-08-02

申请人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  G11B5/187

CPC分类号： G11B5/1871 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head including a main pole and a trailing shield, the main pole being made of a diamond-like carbon (DLC) layer as hard mask and a rhodium (Rh) layer as shield gap, both DLC and Rh layers being CMP stop layers so as to avoid corner rounding and damage from chemical mechanical planarization (CMP) process, the DLC layer being removed by reactive ion etching (RIE) to create a trench, the trailing shield being deposited into the trench for self alignment.

摘要翻译： 包括主极和后屏蔽的垂直写头，主极由金刚石碳（DLC）层作为硬掩模和铑（Rh）层作为屏蔽间隙，DLC和Rh层都是CMP停止 层，以避免由化学机械平面化（CMP）工艺引起的角落圆角和损伤，通过反应离子蚀刻（RIE）去除DLC层以产生沟槽，后屏蔽层沉积到沟槽中用于自对准。

公开(公告)号：US07743487B2

公开(公告)日：2010-06-29

申请号：US11453681

申请日：2006-06-14

申请人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek ,  Neil Leslie Robertson ,  Sue Siyang Zhang

发明人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek ,  Neil Leslie Robertson ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3169 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.

摘要翻译： 垂直写头包括具有限定轨道宽度并且具有平坦化表面并且在其两侧和下方由氧化铝层封装的角的倾斜主极，所述氧化铝层具有抛光表面并且在其两侧的主极上方延伸 作为步骤。

公开(公告)号：US08066892B2

公开(公告)日：2011-11-29

申请号：US12241751

申请日：2008-09-30

申请人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.

摘要翻译： 一种用于制造用于垂直磁写头的写极的方法。 该方法采用镶嵌工艺构造具有非常精确控制的轨道宽度的写极点。 该方法包括沉积可以通过反应离子蚀刻容易地去除的材料层。 该材料可以称为可分级材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻以在RIEAble材料中形成锥形沟槽。 可以将CMP停止层沉积，并将写入极电镀到沟槽中。 然后可以执行CMP以限定写入极的后沿。 可以执行另一掩模，蚀刻和电镀步骤以形成拖尾的环绕磁屏蔽。