公开(公告)号：US07176593B2

公开(公告)日：2007-02-13

申请号：US11154669

申请日：2005-06-17

申请人： Daniel N. Galburt

发明人： Daniel N. Galburt

IPC分类号： H02K9/00

CPC分类号： G03F7/70858 ,  G03F7/70758 ,  H02K9/19 ,  H02K9/22 ,  H02K41/02

摘要： An actuator coil with a race track winding that generates a magnetic field. A cooling tube has cooling liquid flowing therethrough and is wrapped around a periphery of the race track winding. A plurality of thermal conductive strips are arranged generally transverse to at least portions of the race track winding so as to conduct heat from the racetrack winding to the cooling tube.

摘要翻译： 具有产生磁场的赛道绕组的致动器线圈。 冷却管具有流过其中的冷却液，并缠绕在跑道绕组的周边。 多个导热条通常横贯至赛道绕组的至少部分，以将热量从跑道线圈传导到冷却管。

公开(公告)号：US07042554B2

公开(公告)日：2006-05-09

申请号：US11166392

申请日：2005-06-27

申请人： Daniel N. Galburt

发明人： Daniel N. Galburt

IPC分类号： G03B27/58 ,  G03B27/62 ,  G03F9/00

CPC分类号： G03F1/64 ,  G03F7/70983

摘要： An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling and a pellicle mated to the second opposing surface using magnetic coupling.

摘要翻译： 用于在光刻系统中保持防护薄膜组件和掩模版之间的光学间隙的装置包括限定第一和第二相对表面的框架，使用磁耦合与第一相对表面配合的掩模版，以及使用磁耦合与第二相对表面配合的防护薄膜 。

公开(公告)号：US06912043B2

公开(公告)日：2005-06-28

申请号：US10692822

申请日：2003-10-27

申请人： Daniel N. Galburt

发明人： Daniel N. Galburt

IPC分类号： G03F1/64 ,  G03F7/20 ,  H01L21/027 ,  G03B27/58 ,  G03B27/62 ,  G03F9/00

CPC分类号： G03F1/64 ,  G03F7/70983

摘要： An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling; and a pellicle mated to the second opposing surface using magnetic coupling.

摘要翻译： 用于在光刻系统中保持防护薄膜组件和掩模版之间的光学间隙的装置包括限定第一和第二相对表面的框架，使用磁耦合与第一相对表面配合的掩模版; 以及使用磁耦合与第二相对表面配合的防护薄膜。

公开(公告)号：US6013401A

公开(公告)日：2000-01-11

申请号：US232758

申请日：1999-01-15

申请人： Andrew W. McCullough ,  Pradeep K. Govil ,  Daniel N. Galburt ,  David Callan

发明人： Andrew W. McCullough ,  Pradeep K. Govil ,  Daniel N. Galburt ,  David Callan

IPC分类号： G02B26/02 ,  G03F7/20 ,  G03F7/23 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F7/70066 ,  G03F7/70358 ,  G03F7/70558

摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.

摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。

公开(公告)号：US5285142A

公开(公告)日：1994-02-08

申请号：US15520

申请日：1993-02-09

申请人： Daniel N. Galburt ,  Geoffrey O'Connor

发明人： Daniel N. Galburt ,  Geoffrey O'Connor

IPC分类号： B23Q1/00 ,  B23Q1/62 ,  B23Q5/28 ,  B23Q5/52 ,  B25J9/16 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G05B11/00

CPC分类号： G03F7/70716 ,  B25J9/1615 ,  H01L21/682

摘要： An electromagnetic sub-stage and an electromagnetic monolithic stage coupled such that one follows the other having a single reference surface positioned therebetween. A sub-stage having linear motors for movement in the X-Y direction is mounted by a U bracket to a monolithic stage. The monolithic stage is suspended by flat electromagnetic coils providing precise motion of the body of the monolithic stage in X, Y, Z, and rotation about the Z axis or .theta.. Follow control means links or tracks the movement of the monolithic stage to the sub-stage such that the monolithic stage positioning coils are centered in their respective magnetic structure. Adjustable mechanical stops attached the monolithic stage in combination with air bearings riding on the reference surface limit travel of the monolithic stage in the focus or Z direction. The single reference surface extends over the entire range of motion of the monolithic stage. This improves position accuracy, and cleaning and servicing of the apparatus. The modular nature of the monolithic stage permits easy removal for inspection and repair.

摘要翻译： 电磁子级和电磁单片级耦合，使得一个接一个地具有位于它们之间的单个参考表面。 具有用于在X-Y方向上移动的线性电动机的子级通过U形支架安装到整体级。 整体级由平面电磁线圈悬挂，提供整体级的主体在X，Y，Z以及围绕Z轴或（θ）的旋转的精确运动。 跟随控制装置链接或跟踪单片级到子级的运动，使得单片级定位线圈在它们各自的磁性结构中居中。 可调节的机械止动件将整体式平台与空气轴承相结合，在整体级在焦点或Z方向的参考面极限行程上。 单个参考表面在整体级的整个运动范围上延伸。 这提高了位置精度，以及对设备的清洁和维护。 整体式台架的模块化特性允许拆卸检查和维修。

公开(公告)号：USRE42650E1

公开(公告)日：2011-08-30

申请号：US11831558

申请日：2007-07-31

申请人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

发明人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

IPC分类号： G01B13/08

CPC分类号： G01B13/04

摘要： A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

摘要翻译： 使用流量计接近传感器的系统和方法。 调制的单向或交替流体流的源沿着具有喷嘴和流量或压力传感器的至少一个路径行进。 流体存在于喷嘴和靶之间的间隙处。 传感器输出根据间隙大小而变化的幅度调制信号。 幅度调制信号以数字方式或在模拟设备中进行处理，其可以包括被滤波（例如，带通，频带限制，高通等等滤波器）以包括在该频率的任一侧上的调制频率和足够的带宽， 或者使用以声驱动器调制频率工作的解调器进行解调。 使用该系统和方法可以仅使设备的期望频率范围内的环境声能实际上具有干扰设备操作的机会。 这可以降低设备对外部声学噪声和传感器偏移的总体灵敏度。

公开(公告)号：US07124624B2

公开(公告)日：2006-10-24

申请号：US11198278

申请日：2005-08-08

申请人： Boguslaw F. Gajdeczko ,  Kenneth M. Bogursky ,  Daniel N. Galburt ,  Willy M. Sander ,  Kevin J. Violette

发明人： Boguslaw F. Gajdeczko ,  Kenneth M. Bogursky ,  Daniel N. Galburt ,  Willy M. Sander ,  Kevin J. Violette

IPC分类号： G01B13/08 ,  G01B13/12

CPC分类号： G03F7/709 ,  G01B13/12 ,  G03F7/70341 ,  G03F7/7085 ,  G05D7/0186

摘要： An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.

摘要翻译： 一种用于精确检测测量探头和表面之间非常小距离的装置和方法，更具体地涉及使用恒定气流并感测气动桥中的质量流量以检测非常小的距离的接近传感器。 在该装置内，使用由多孔材料制成的限流器和/或缓冲器和/或质量流量控制器使得能够在纳米至亚纳米范围内检测非常小的距离。 另一实施例，其中接近传感器的测量通道连接到多个测量分支。

公开(公告)号：US07105836B2

公开(公告)日：2006-09-12

申请号：US10273405

申请日：2002-10-18

申请人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

发明人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

IPC分类号： G03F7/20 ,  F25B29/00 ,  H01J37/20

CPC分类号： G03F7/70716 ,  F28F3/048 ,  G03F7/70875

摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.

摘要翻译： 系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。 。 这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量 长时间的阶段。 短行程阶段可以从长行程阶段磁悬浮。 这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。 通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。

公开(公告)号：US06906789B2

公开(公告)日：2005-06-14

申请号：US10449663

申请日：2003-06-02

申请人： Frederick M. Carter ,  Daniel N. Galburt ,  Stephen Roux

发明人： Frederick M. Carter ,  Daniel N. Galburt ,  Stephen Roux

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/62 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

摘要翻译： 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模版掩模片滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US06885435B2

公开(公告)日：2005-04-26

申请号：US10842513

申请日：2004-05-11

申请人： Daniel N. Galburt

发明人： Daniel N. Galburt

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/58 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.