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公开(公告)号：US6097474A
公开(公告)日：2000-08-01
申请号：US391928
申请日：1999-09-08
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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公开(公告)号：US6013401A
公开(公告)日：2000-01-11
申请号：US232758
申请日：1999-01-15
IPC分类号： G02B26/02 , G03F7/20 , G03F7/23 , H01L21/027 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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3.发明授权
公开(公告)号：US5895737A
公开(公告)日：1999-04-20
申请号：US23407
申请日：1998-02-12
IPC分类号： G02B26/02 , G03F7/20 , H01L21/027 , G03F5/00 , G03F7/00
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The push rods are coupled to a flexure or link pivotally connected to each end of a substantially rectangular blade. The corners of the rectangular blades have a radius providing a smooth transition between blades. A frame holds the push rods in place as the blades are moved into and out of the illumination energy or flux. The push rods may be adjusted by a screw or other equivalent devices or methods. The lateral or sideways forces resulting from the movement of the blades is compensated for by the flexures or links resulting in less stress being placed on the blades. Slots placed at pivot points in the blades may also be used to facilitate movement of the blades. The illumination energy of the rectangular illumination field or slot is adjusted to provide a uniform illumination energy. Also included is a method of adjusting the device to provide a predetermined exposure dose along the length of the illumination field as a function of line width. Different feature types may be imaged separately to optimize control over line width variation.This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，与推杆连接并插入照明能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 推杆联接到枢转地连接到基本上矩形的叶片的每个端部的挠曲件或连杆。 矩形刀片的角部具有提供刀片之间平滑过渡的半径。 当叶片移入和移出照明能量或通量时，框架将推杆保持在适当的位置。 推杆可以通过螺钉或其他等效的装置或方法来调节。 由叶片的运动产生的侧向或侧向力被弯曲或链接补偿，导致较少的应力被放置在叶片上。 放置在叶片中的枢转点处的插槽也可以用于促进叶片的移动。 调整矩形照明场或狭缝的照明能量以提供均匀的照明能量。 还包括一种调节装置以沿着照明场的长度提供作为线宽的函数的预定曝光剂量的方法。 可以分别对不同的特征类型进行成像，以优化对线宽变化的控制。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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4.发明授权公开(公告)号：US07105836B2
公开(公告)日：2006-09-12
申请号：US10273405
申请日：2002-10-18
申请人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
发明人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
CPC分类号： G03F7/70716 , F28F3/048 , G03F7/70875
摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.
摘要翻译： 系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。 。 这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量 长时间的阶段。 短行程阶段可以从长行程阶段磁悬浮。 这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。 通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。
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公开(公告)号：US06967713B2
公开(公告)日：2005-11-22
申请号：US10939328
申请日：2004-09-14
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.
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6.发明授权
公开(公告)号：US5896188A
公开(公告)日：1999-04-20
申请号：US835653
申请日：1997-04-10
申请人： Andrew W. McCullough
发明人： Andrew W. McCullough
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70075 , G03F7/70358
摘要： An illumination system for a scanning lithography system used in the manufacture of semiconductor devices having a multiplex array or multi-image array resulting in pattern noise that is reduced by a spatially frequency modulated multiplex array or frequency modulating the pulse rate of a pulsed laser source. A pulsed laser source is used to illuminate a reticle containing a pattern thereon to be reproduced onto a semiconductor. An illumination system using a multiplex array or multi-image array to obtain macro uniformity of an illumination slot or field introduces micro non-uniformity that results in undesirable pattern noise or fixed pattern noise resulting in undesirable imaging properties. The undesirable effects of the pattern noise are eliminated or substantially reduced by spatially modulating the multiplex array in a scanning direction so that the periodic pattern has a linear magnification dependent on position. In another embodiment the pulse rate of the pulsed laser source is frequency modulated. The present invention improves linewidth control, linewidth variation, and edge roughness.
摘要翻译： 一种用于制造具有多路阵列或多图像阵列的半导体器件的照明系统，其产生通过空间频率调制的多路复用阵列减少的模式噪声或调制脉冲激光源的脉冲频率。 使用脉冲激光源来将包含其上的图案的掩模版照射到半导体上。 使用多重阵列或多图像阵列以获得照明槽或场的宏均匀性的照明系统引入微不均匀性，导致不期望的图案噪声或固定图案噪声，导致不期望的成像性质。 通过在扫描方向上对多路复用阵列进行空间调制，消除或显着减少图案噪声的不良影响，使得周期性图案具有取决于位置的线性放大率。 在另一实施例中，脉冲激光源的脉冲频率被调频。 本发明改进了线宽控制，线宽变化和边缘粗糙度。
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7.发明授权公开(公告)号：US06628370B1
公开(公告)日：2003-09-30
申请号：US09599383
申请日：2000-06-22
IPC分类号： G03B2742
CPC分类号： G03F7/70125
摘要： An illumination system used in photolithography for the manufacture of semiconductors having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive substrate. The array optical element may be a filter, diffractive optical element, or micro lens array having illumination.regions producing different types of illumination properties or characteristics. Each of the illumination regions are matched or correspond to a respective region on the reticle to provide optimized exposure of a photosensitive resist covered wafer. The optical element of the present invention may be used to tailor a conventional illumination system to the unique characteristics of the projection optics used in the photolithographic system, thereby compensating for vertical and horizontal bias or variations in line width for features oriented in the vertical and horizontal direction. This facilitates the manufacture of semiconductor devices with small feature sizes while improving qualify and increasing yield.
摘要翻译： 一种用于制造半导体的照明系统，其具有与在感光基板上印刷的不同线宽度变化对应或匹配的具有不同照明区域的阵列光学元件。 阵列光学元件可以是具有产生不同类型的照明特性或特性的照明区域的滤光器，衍射光学元件或微透镜阵列。 每个照明区域匹配或对应于掩模版上的相应区域，以提供光敏抗蚀剂覆盖晶片的优化曝光。 本发明的光学元件可以用于将常规照明系统定制成在光刻系统中使用的投影光学器件的独特特性，从而补偿垂直和水平偏置或者在垂直和水平方向上取向的特征的线宽变化 方向。 这有助于制造具有小特征尺寸的半导体器件，同时提高合格率并提高产量。
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公开(公告)号：US06292255B1
公开(公告)日：2001-09-18
申请号：US09232756
申请日：1999-01-15
申请人： Andrew W. McCullough
发明人： Andrew W. McCullough
IPC分类号： G03B2754
CPC分类号： G03F7/70358 , G03F7/70066 , G03F7/70558
摘要： In a scanning photolithographic device used in the manufacture of semiconductors, a method and apparatus for varying the exposure dose as a function of distance in the scan direction compensating for the signature of the photolithographic device for reducing linewidth variation in the scan direction. The linewidth in the scan direction may vary for a particular device or tool for a variety of reasons. This variation or signature is used in combination with a photosensitive resist response function to vary the exposure dose as a function of distance in a scan direction, substantially reducing the linewidth variation. A dose control varies the exposure dose as a function of distance in a scan direction to correct linewidth variations caused by characteristics of the photolithographic system. Linewidth variations as a function of distance in the direction of scan are substantially reduced, resulting in more consistent and improved feature or element sizes.
摘要翻译： 在半导体制造中使用的扫描光刻设备中，用于改变作为扫描方向上的距离的函数的曝光剂量的方法和装置来补偿光刻装置的签名以减少扫描方向上的线宽变化。 由于各种原因，扫描方向上的线宽可能因特定设备或工具而异。 该变化或签名与光敏抗蚀剂响应功能组合使用，以将扫描剂量作为扫描方向上的距离的函数来改变，从而显着降低线宽变化。 剂量控制将曝光剂量作为扫描方向上的距离的函数来改变，以校正由光刻系统的特征引起的线宽变化。 作为扫描方向上的距离的函数的线宽变化大大降低，导致更一致和改进的特征或元件尺寸。
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公开(公告)号：US5767523A
公开(公告)日：1998-06-16
申请号：US838549
申请日：1997-04-09
申请人： Andrew W. McCullough
发明人： Andrew W. McCullough
CPC分类号： G03F7/70591 , G03F7/70641 , G03F9/7069 , G03F9/7088
摘要： A positioning, alignment, and image quality system comprising a detector having a photosensitive surface covered with an opaque layer having predetermined openings therein, a matched reticle having predetermined apertures therein is used to project the image of the apertures onto the openings. A plurality of different detectors are thereby formed on a single monolithic substrate for providing positioning, alignment, and image quality information. Different sub-detectors provide general positioning information, fine alignment or position information, and image quality information, such as optimum focus and astigmatism. In one embodiment, a pair of rectangular openings having a predetermined distance therebetween is used. An illumination pattern is projected between the rectangular openings filling a portion of the rectangular openings thereby providing a signal. The signals from the two openings are balanced or made equal to obtain positioning information or alignment of the reticle and the detector, and correspondingly a wafer stage attached to the detector. Different opening configurations in the opaque mask covering the photosensitive layer are used to provide different imaging information. The present invention permits alignment information to be obtained in a non-scanning system, as well as in a system using pulsed illumination sources. Additionally, a plurality of sub-detectors may easily be fabricated onto a monolithic detector providing different functions.
摘要翻译： 一种定位，对准和图像质量系统，其包括具有覆盖有其中具有预定开口的不透明层的感光表面的检测器，其中具有预定孔的匹配掩模版用于将孔的图像投影到开口上。 因此，在单个单片基板上形成多个不同的检测器，以提供定位，对准和图像质量信息。 不同的子检测器提供一般的定位信息，精细对准或位置信息，以及图像质量信息，例如最佳聚焦和散光。 在一个实施例中，使用其间具有预定距离的一对矩形开口。 在填充一部分矩形开口的矩形开口之间投射照明图案，从而提供信号。 来自两个开口的信号被平衡或相等以获得掩模版和检测器的定位信息或对准，以及相应地附接到检测器的晶片台。 使用覆盖感光层的不透明掩模中的不同的开口配置来提供不同的成像信息。 本发明允许在非扫描系统以及使用脉冲照明源的系统中获得对准信息。 此外，可以容易地将多个子检测器制造到提供不同功能的单片检测器上。
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公开(公告)号：US06800408B2
公开(公告)日：2004-10-05
申请号：US10654406
申请日：2003-09-04
IPC分类号： G03F900
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.
摘要翻译： 具有足以扫描至少两个不同掩模版的运动范围的光罩台。 在光刻工艺中，使用具有延伸的运动范围并且包含至少两个掩模版，优选相移掩模版和修剪掩模版的掩模版平台。 标线台通过照明场扫描两个标线。 每个掩模版的图像通过投影光学器件投射到晶片台上的感光基片上。 感光基板上的场用第一掩模版的图像曝光，随后用第二掩模版的图像曝光。 在扫描操作中将第一和第二掩模版的图像投射到相同的场上极大地促进了光刻工具或装置的生产量。 当需要至少两个掩模版以暴露单个场时，掩模版改变被消除。 当使用相移掩模和相关的修剪掩模时，需要使用多个掩模版来暴露单个场。 在另一个实施例中，标线片台具有允许扫描附加校准掩模版的运动范围。 这允许快速的实时系统校准。
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